Patents by Inventor Keisuke Kanayama

Keisuke Kanayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition form forming anti-reflective coating for use in lithography
    Publication number: 20060290429
    Abstract: There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.
    Type: Application
    Filed: October 8, 2003
    Publication date: December 28, 2006
    Applicant: Nissan Chemical Industries, Ltd.
    Inventors: Takahiro Kishioka, Ken-ichi Mizusawa, Tomoyuki Enomoto, Rikimaru Sakamoto, Keisuke Kanayama, Yasuo Kawamura