Patents by Inventor Keisuke Katou

Keisuke Katou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11921369
    Abstract: An object of the present invention is to provide a polarizer having a high degree of alignment and an image display device including the polarizer. A polarizer of the present invention is a polarizer formed of a polarizer-forming composition containing a liquid crystal compound, a first dichroic material, and a second dichroic material, in which the polarizer has an array structure formed of the first dichroic material and the second dichroic material.
    Type: Grant
    Filed: September 22, 2020
    Date of Patent: March 5, 2024
    Assignee: FUJIFILM Corporation
    Inventors: Wataru Hoshino, Yoshiaki Takada, Yuzo Fujiki, Kengo Saito, Yasuhiro Ishiwata, Takashi Katou, Keisuke Ushirogata
  • Patent number: 9296842
    Abstract: A copolymer obtained by polymerizing two or more types of monomers, wherein among fractions obtained by dividing an eluate showing peaks relative to the copolymer, in an elution curve obtained by gel permeation chromatography (GPC), into eight fractions in order of fractionation, such that each fraction has the same volume, a difference between a monomer composition ratio of a copolymer contained in a first eluted fraction and a monomer composition ratio of all copolymers is ?3 mol % to +3 mol % in any of the constitutional units derived from the respective monomers.
    Type: Grant
    Filed: August 15, 2013
    Date of Patent: March 29, 2016
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Atsushi Yasuda, Tomoya Oshikiri, Daisuke Matsumoto, Keisuke Katou, Shinichi Maeda
  • Patent number: 9109060
    Abstract: A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.
    Type: Grant
    Filed: July 7, 2010
    Date of Patent: August 18, 2015
    Assignee: Mitsubishi Rayon, Co., Ltd.
    Inventors: Atsushi Yasuda, Tomoya Oshikiri, Daisuke Matsumoto, Keisuke Katou, Shinichi Maeda
  • Patent number: 9023578
    Abstract: The present invention provides a method for evaluating lithographic characteristics of a lithographic composition containing a copolymer for lithography without actually preparing the composition. The method comprises the steps of: dissolving the copolymer for lithography in a solvent to prepare a test solution; separating a gel-like substance from the test solution; determining a rate of change of a composition ratio, wherein the rate of change of the composition ratio rate refers to a ratio of a difference obtained by subtracting a composition ratio of constitutional units in the copolymer for lithography from a composition ratio of constitutional units in a gel-like substance to the composition ratio of the constitutional units in the copolymer for lithography.
    Type: Grant
    Filed: July 5, 2010
    Date of Patent: May 5, 2015
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Keisuke Katou, Shinichi Maeda, Daisuke Matsumoto
  • Publication number: 20130331533
    Abstract: A copolymer obtained by polymerizing two or more types of monomers, wherein among fractions obtained by dividing an eluate showing peaks relative to the copolymer, in an elution curve obtained by gel permeation chromatography (GPC), into eight fractions in order of fractionation, such that each fraction has the same volume, a difference between a monomer composition ratio of a copolymer contained in a first eluted fraction and a monomer composition ratio of all copolymers is ?3 mol % to +3 mol % in any of the constitutional units derived from the respective monomers.
    Type: Application
    Filed: August 15, 2013
    Publication date: December 12, 2013
    Applicant: MITSUBISHI RAYON CO., LTD.
    Inventors: Atsushi YASUDA, Tomoya Oshikiri, Daisuke Matsumoto, Keisuke Katou, Shinichi Maeda
  • Publication number: 20130241282
    Abstract: Objects of the present invention are to avoid effects on a high voltage cable as much as possible even in the case in which a vehicle is damage by an external force, to keep the number of fitting parts for protecting the high voltage cable small, and to make a front chamber as compact as possible.
    Type: Application
    Filed: February 23, 2011
    Publication date: September 19, 2013
    Applicant: SUZUKI MOTOR CORPORATION
    Inventors: Masayuki Ikeno, Keisuke Katou, Junka Iwasaki
  • Publication number: 20120115086
    Abstract: A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.
    Type: Application
    Filed: July 7, 2010
    Publication date: May 10, 2012
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Atsushi Yasuda, Tomoya Oshikiri, Daisuke Matsumoto, Keisuke Katou, Shinichi Maeda
  • Publication number: 20120111099
    Abstract: The present invention provides a method for evaluating lithographic characteristics of a lithographic composition containing a copolymer for lithography without actually preparing the composition. The method comprises the steps of: dissolving the copolymer for lithography in a solvent to prepare a test solution; separating a gel-like substance from the test solution; determining a rate of change of a composition ratio, wherein the rate of change of the composition ratio rate refers to a ratio of a difference obtained by subtracting a composition ratio of constitutional units in the copolymer for lithography from a composition ratio of constitutional units in a gel-like substance to the composition ratio of the constitutional units in the copolymer for lithography.
    Type: Application
    Filed: July 5, 2010
    Publication date: May 10, 2012
    Applicant: MITSUBISHI RAYON CO., LTD.
    Inventors: Keisuke Katou, Shinichi Maeda, Daisuke Matsumoto