Abstract: An information processing device includes a control unit. The control unit of the information processing device acquires the number of times of maintenance performed at a predetermined station during a predetermined period of time for the leased vehicle including the maintenance. The control unit of the information processing device determines a larger amount of reward to be provided to the user of the leased vehicle as the number of times of maintenance performed at a predetermined station during a predetermined period of time is smaller. The control unit of the information processing device outputs information of the determined reward.

Abstract: A power control system includes: an acquisition unit configured to acquire supply information relating to supply of power to electric lines by a power generator for generating power and supplying the power to the electric lines; and a control unit configured to control, according to the supply information acquired by the acquisition unit, supply of reactive power to the electric lines by a load device including a compensating power supply unit capable of supplying reactive power to the electric lines.

Abstract: A photocurable composition contains: a component (A): (meth)acrylic acid ester having 2 to 6 (meth)acryloyl groups in one molecule, a component (B): a thiol compound having 2 to 4 thiol groups in one molecule, and a component (C): a photobase generator, in which a mass ratio of the component (A) to the component (B) is 66:34 to 33:67, inclusive, a functional group equivalent of the component (A) is 96 g/eq to 180 g/eq, inclusive, a functional group equivalent of the component (B) is 95 g/eq to 190 g/eq, inclusive, and a content of the component (C) is 0.5 parts by mass to 2 parts by mass with respect to 100 parts by mass of a total of the component (A), the component (B), and the component (C).

Abstract: A material for forming an underlayer film according to the present invention is a material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the material including a cyclic olefin polymer which has a repeating structural unit [A] represented by Formula (1) and a repeating structural unit [B] represented by Formula (2), in which a molar ratio [A]/[B] of the structural unit [A] to the structural unit [B] in the cyclic olefin polymer is greater than or equal to 5/95 and less than or equal to 95/5.

Abstract: There is provided a photocurable composition including Component (A): epoxy compound, Component (B): acrylic ester compound, Component (C): isocyanate compound, Component (D): photobase generator, and Component (E): compound having a thiol group, in which Component (A) has two or more epoxy groups in one molecule, Component (B) has two or more acryloyl groups in one molecule, Component (C) has two or more isocyanate groups in one molecule, and Component (E) has two or more thiol groups in one molecule, and a ratio of a total mass of Component (A), Component (B), Component (C), and Component (D) to a mass of Component (E) is (Component (A)+Component (B)+Component (C)+Component (D)):Component (E)=74:26 to 20:80.

Abstract: A material for forming an underlayer film according to the present invention is a material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the material including a cyclic olefin polymer which has a repeating structural unit [A] represented by Formula (1) and a repeating structural unit [B] represented by Formula (2), in which a molar ratio [A]/[B] of the structural unit [A] to the structural unit [B] in the cyclic olefin polymer is greater than or equal to 5/95 and less than or equal to 95/5.

Abstract: Provided is a resin material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the resin material including a cyclic olefin polymer (I), in which a temperature at an intersection between a storage modulus (G?) curve and a loss modulus (G?) curve in a solid viscoelasticity of the resin material for forming an underlayer film which is as measured under conditions of a measurement temperature range of 30° C. to 300° C., a heating rate of 3° C./min, and a frequency of 1 Hz in a nitrogen atmosphere in a shear mode using a rheometer is higher than or equal to 40° C. and lower than or equal to 200°.

Abstract: A photocurable composition contains: a component (A): (meth)acrylic acid ester having 2 to 6 (meth)acryloyl groups in one molecule, a component (B): a thiol compound having 2 to 4 thiol groups in one molecule, and a component (C): a photobase generator, in which a mass ratio of the component (A) to the component (B) is 66:34 to 33:67, inclusive, a functional group equivalent of the component (A) is 96 g/eq to 180 g/eq, inclusive, a functional group equivalent of the component (B) is 95 g/eq to 190 g/eq, inclusive, and a content of the component (C) is 0.5 parts by mass to 2 parts by mass with respect to 100 parts by mass of a total of the component (A), the component (B), and the component (C).

Abstract: Provided is a tire having excellent rolling resistance and improved pass-by noise performance. The tire is a pneumatic tire comprising a side rubber provided on an outer side of a carcass in a tire width direction, in a sidewall portion, wherein a thickness of the side rubber in the tire width direction at a tire maximum width position is 1 mm or more, and a ratio 0° C. tan ?/30° C. tan ? of 0° C. tan ? to 30° C. tan ? of the side rubber is 2.00 or more, where the 0° C. tan ? is tan ? at 10 Hz and 0° C., and the 30° C. tan ? is tan ? at 10 Hz and 30° C.

Abstract: Provided is a tire having excellent rolling resistance and improved pass-by noise performance. A tire comprises a tread portion that includes a base rubber and a cap rubber located on an outer side of the base rubber in a tire radial direction, wherein a thickness of the base rubber in the tire radial direction is 1 mm or more, 30° C. tan ? of the base rubber is 0.20 or less, and a ratio 0° C. tan ?/30° C. tan ? of 0° C. tan ? to 30° C. tan ? of the base rubber is 2.90 or more, where the 30° C. tan ? is tan ? at 10 Hz and 30° C., and the 0° C. tan ? is tan ? at 10 Hz and 0° C.

Abstract: OD is defined by an outer diameter of the pneumatic tire, RW is defined by a rim width of a rim wheel assembled to the pneumatic tire, SW is defined by a tire width of the pneumatic tire, and RD is defined by a rim diameter of the pneumatic tire, the OD is 350 mm or more and 600 mm or less, the relation of 0.78?RW/SW?0.99; and the relation of 0.56?RD/OD?0.75 are satisfied.

Abstract: A material for forming an underlayer film used in a multi-layer resist process satisfies: (i) an elemental composition ratio Re defined by the following mathematical formula (1) is 1.5 to 2.8; (ii) a glass transition temperature is 30° C. to 250° C.; and (iii) the material contains at least one (preferably two or more) resin having a specific structural unit. In the mathematical formula (1), NH is the number of hydrogen atoms in the solid content of the material for forming an underlayer film, NC is the number of carbon atoms in the solid content of the material for forming an underlayer film, and NO is the number of oxygen atoms in the solid content of the material for forming an underlayer film.

Abstract: A tire including a land part partitioned between two main grooves extending in the tire circumferential direction S of the tire and resonators formed in the land part. A resonator has a cavity part separated from the two main grooves and is opened at the surface of the land part, a 1st sipe that is opened at one main groove and the cavity part, and a 2nd sipe that is opened at the other main groove and the cavity part. Depths of the main grooves are 3 mm or more and 6.5 mm or less. A volume value of the cavity part is more than 3 times or more and 5 times or less a sum of the cross-sectional areas of the two main grooves with the land part in between, and lengths of the 1st sipe and the 2nd sipe are 10 mm or more and 25 mm or less.

Abstract: An outer diameter of the pneumatic tire is 350 mm or more and 600 mm or less, and as RW is defined by a rim width of a rim wheel assembled to the pneumatic tire and SW is defined by a tire width of the pneumatic tire, the relation of 0.78?RW/SW?0.99 is satisfied, and at least two circumferential main grooves extending to the tire circumferential direction are formed in the tread. The circumferential main groove is formed closer to a tire equatorial line than an outer end in the tire width direction of the belt layer.

Abstract: There is provided a photocurable composition including Component (A): epoxy compound, Component (B): acrylic ester compound, Component (C): isocyanate compound, Component (D): photobase generator, and Component (E): compound having a thiol group, in which Component (A) has two or more epoxy groups in one molecule, Component (B) has two or more acryloyl groups in one molecule, Component (C) has two or more isocyanate groups in one molecule, and Component (E) has two or more thiol groups in one molecule, and a ratio of a total mass of Component (A), Component (B), Component (C), and Component (D) to a mass of Component (E) is (Component (A)+Component (B)+Component (C)+Component (D)):Component (E)=74:26 to 20:80.

Abstract: Provided is a photocurable composition including a component (A) which is an acrylic ester compound containing one or more acryloyl groups in one molecule; a component (B) which is an acrylic ester compound containing one or more acryloyl groups and one or more epoxy groups in one molecule; a component (C) which is a compound containing two or more thiol groups in one molecule; a component (D) which is a photoradical generator; and a component (E) which is a photobase generator, in which a ratio between a total mass of the component (A) and the component (B) and a mass of the component (C) is in a range of 67.8:32.2 to 88.0:12.0, inclusive.

Abstract: Provided is a photocurable composition including a component (A) which is an acrylic ester compound containing one or more acryloyl groups in one molecule; a component (B) which is an acrylic ester compound containing one or more acryloyl groups and one or more epoxy groups in one molecule; a component (C) which is a compound containing two or more thiol groups in one molecule; a component (D) which is a photoradical generator; and a component (E) which is a photobase generator, in which a ratio between a total mass of the component (A) and the component (B) and a mass of the component (C) is in a range of 67.8:32.2 to 88.0:12.0, inclusive.

Abstract: Provided is a tire having good fuel efficiency that, even though a resin material is used therein, has improved ride comfort and dry handling performance without wet performance deterioration. The tire includes an annular tire frame (10), a reinforcement layer (20) outward of the tire frame (10) in a tire radial direction, and tread rubber (30) outward of the reinforcement layer (20) in the tire radial direction. The reinforcement layer (20) includes a reinforcement member (21) coated with a resin composition containing 50-100 mass % of a resin material. For the tread rubber (30), a storage modulus (E?0° C.) and loss tangent (tan ?0° C.) during 1% strain at 0° C. are no greater than 30 MPa and 0.5, respectively, and a value (tan ?30° C.-tan ?60° C.) obtained by subtracting a loss tangent during 1% strain at 60° C. from a loss tangent during 1% strain at 30° C. is no greater than 0.08.

Abstract: A material for forming an underlayer film according to the present invention is a material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the material including a cyclic olefin polymer which has a repeating structural unit [A] represented by Formula (1) and a repeating structural unit [B] represented by Formula (2), in which a molar ratio [A]/[B] of the structural unit [A] to the structural unit [B] in the cyclic olefin polymer is greater than or equal to 5/95 and less than or equal to 95/5.

Abstract: Provided is a resin material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the resin material including a cyclic olefin polymer (I), in which a temperature at an intersection between a storage modulus (G?) curve and a loss modulus (G?) curve in a solid viscoelasticity of the resin material for forming an underlayer film which is as measured under conditions of a measurement temperature range of 30° C. to 300° C., a heating rate of 3° C./min, and a frequency of 1 Hz in a nitrogen atmosphere in a shear mode using a rheometer is higher than or equal to 40° C. and lower than or equal to 200°.