Abstract: According to one embodiment, a manufacturing data analysis device includes processing circuitry. The processing circuitry acquires, from manufacturing data related to a plurality of products, first manufacturing data under a first acquisition condition. The first manufacturing data includes manufacturing condition data related to a manufacturing condition for each of the products and quality data related to quality for each of the products. The processing circuitry determines a second acquisition condition different from the first acquisition condition based on the first manufacturing data. The processing circuitry acquires second manufacturing data including the manufacturing condition data and the quality data from the manufacturing data under the second acquisition condition. The processing circuitry calculates an analysis result of a relationship between the manufacturing condition data and the quality data by analyzing the second manufacturing data.

Abstract: According to one embodiment, a manufacturing data analysis device includes processing circuitry. The processing circuitry acquires manufacturing data including a manufacturing condition data group and a quality data group. The processing circuitry calculates one or more degrees of influence exerted by first manufacturing condition data included in the manufacturing condition data group on respective pieces of quality data included in the quality data group by analyzing the manufacturing data. The processing circuitry, in a case where one or more degrees of influence satisfy a determination condition, generates output data related to at least one of the first manufacturing condition data, one or more pieces of quality data on which the first manufacturing condition data has exerted the degrees of influence satisfying the determination condition, or the degrees of influence satisfying the determination condition.

Abstract: According to one embodiment, a data analysis apparatus includes processing circuitry. The processing circuitry acquires first factor data indicative of first manufacturing conditions of a first product, and acquires second factor data indicative of second manufacturing conditions of a second product. The processing circuitry computes, based on the first factor data, a first index value relating to a degree by which each of the first manufacturing conditions contributes to an abnormality, and computes, based on the second factor data, a second index value relating to a degree by which each of the second manufacturing conditions contributes to an abnormality. The processing circuitry computes a similarity between the first index value and the second index value.

Abstract: According to one embodiment, a data analysis apparatus includes a processor. The processor acquires, for a plurality of products as analysis targets, manufacturing data including at least one manufacturing condition for each product. The processor calculates, based on a bias of state data representing a degree that the product is in a specific state in at least one item that can be taken concerning one manufacturing condition extracted from the manufacturing data, an index value representing a degree that a cause of the specific state of the product is the manufacturing condition.

Abstract: In general, according to one embodiment, a data processing apparatus includes a processor including hardware. The processor acquires state data related to a state of each product and order data related to order related to manufacturing of each product. The processor calculates a first score by using the acquired state data and the acquired order data. The first score regards a change in the acquired state data and is based on a first change model. The first change model represents the change in the state data using the order data. The processor outputs the first score.

Abstract: According to one embodiment, a data analysis apparatus includes processing circuitry. The processing circuitry acquires a data element group composed of a plurality of data elements, calculates, in regard to a first data element in the data element group, an index value indicative of a conditional dispersion from another data element in the data element group, extracts, based on the index value, a parent element having a high association with the first data element from the data element group, and outputs an analysis result including first information relating to the first data element and the parent element.

Abstract: A data processing apparatus includes a processor. The processor generates visualization data for displaying estimation results of manufacturing conditions based on estimation results and relationship data. The relationship data includes first relationship data as a relationship between first manufacturing conditions recorded during an analysis, and second relationship data as a relationship between second manufacturing conditions corresponding. The processor divides the estimation results of the manufacturing conditions into a first group based on the first relationship data, and into a second group based on the second relationship data. The processor generates the visualization data based on a change in manufacturing condition relationship between the first group and the second group.

Abstract: According to one embodiment, a data analysis apparatus includes a processor. The processor acquires, for a plurality of products as analysis targets, manufacturing data including at least one manufacturing condition for each product. The processor calculates, based on a bias of state data representing a degree that the product is in a specific state in at least one item that can be taken concerning one manufacturing condition extracted from the manufacturing data, an index value representing a degree that a cause of the specific state of the product is the manufacturing condition.