Patents by Inventor Keisuke OKU

Keisuke OKU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200347198
    Abstract: A molding device produces a porous film from a molding material which is an emulsion. In a case where a volume of a dispersed phase is X1 and a volume of a continuous phase is X2, the molding material has a value of X1/(X1+X2) within a range of 0.5 or more and 0.9 or less. In the molding material, a specific gravity of the dispersed phase is greater than a specific gravity of the continuous phase. The molding material includes a water phase containing a curable compound as the continuous phase, and forms a liquid film on a support. Thereafter, the curable compound in the liquid film is cured. After curing, the dispersed phase is removed.
    Type: Application
    Filed: July 22, 2020
    Publication date: November 5, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Keisuke OKU, Koju ITO, Hiroshi YABU, Yoshiaki UCHIDA
  • Publication number: 20200347199
    Abstract: A molded body is produced from a molding material including a continuous phase and a dispersed phase by a three-dimensionalization step, a curing step, and a peeling step. The continuous phase of the molding material is a water phase containing a curable compound. In the three-dimensionalization step, the molding material is placed in a container. In the curing step, the curable compound is cured to form a cured product after the three-dimensionalization step. In the peeling step, the container and the cured product are separated after the curing step. In the dispersed phase removal step, the dispersed phase of the cured product is removed after the curing step.
    Type: Application
    Filed: July 22, 2020
    Publication date: November 5, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Keisuke OKU, Koju ITO, Hiroshi YABU, Yoshiaki UCHIDA
  • Patent number: 10479908
    Abstract: An aspect of the present invention relates to method of manufacturing a hard coat film, wherein the hard coat film comprises a plastic substrate and a hard coat layer, the method comprises forming the hard coat layer by subjecting a photopolymerizable hard coating composition to photopolymerization processing, and the photopolymerizable hard coating composition comprises a radical polymerizable compound having two or more radical polymerizable groups selected from the group consisting of acryloyloxy groups, acryloyl groups, methacryloyloxy groups, and methacryloyl groups per molecule, a cationic polymerizable compound, a radical photopolymerization initiator, and a cationic photopolymerization initiator.
    Type: Grant
    Filed: October 12, 2017
    Date of Patent: November 19, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Akio Tamura, Katsuyuki Takada, Takayasu Yamazaki, Keisuke Oku, Keigo Ueki
  • Patent number: 10366876
    Abstract: Provided are a phosphor-containing capable of suppressing deterioration of phosphors and can be manufactured with high efficiency and a backlight unit. Specifically, provided is a phosphor-containing film, including a first substrate film; and a phosphor-containing layer at which a plurality of regions containing phosphors, which, if exposed to oxygen, deteriorate by reacting with the oxygen, are discretely disposed on the first substrate film, and at which a resin layer having an impermeability to oxygen is disposed between the discretely disposed regions containing phosphors, in which a width S of the resin layer between the regions containing phosphors is 0.01?S<0.5 mm, and wherein a ratio of a volume Vp of the regions containing phosphors, to a sum of the volume Vp and a volume Vb of the resin layer in the phosphor-containing layer, is 0.1?Vp/(Vp+Vb)<0.9.
    Type: Grant
    Filed: November 6, 2018
    Date of Patent: July 30, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Keisuke Oku, Kenichi Kakishita, Tatsuya Oba
  • Publication number: 20190080897
    Abstract: Provided are a phosphor-containing capable of suppressing deterioration of phosphors and can be manufactured with high efficiency and a backlight unit. Specifically, provided is a phosphor-containing film, including a first substrate film; and a phosphor-containing layer at which a plurality of regions containing phosphors, which, if exposed to oxygen, deteriorate by reacting with the oxygen, are discretely disposed on the first substrate film, and at which a resin layer having an impermeability to oxygen is disposed between the discretely disposed regions containing phosphors, in which a width S of the resin layer between the regions containing phosphors is 0.01?S<0.5 mm, and wherein a ratio of a volume Vp of the regions containing phosphors, to a sum of the volume Vp and a volume Vb of the resin layer in the phosphor-containing layer, is 0.1?Vp/(Vp+Vb)<0.9.
    Type: Application
    Filed: November 6, 2018
    Publication date: March 14, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Keisuke OKU, Kenichi KAKISHITA, Tatsuya OBA
  • Patent number: 10153151
    Abstract: Provided are a phosphor-containing capable of suppressing deterioration of phosphors and can be manufactured with high efficiency and a backlight unit. Specifically, provided is a phosphor-containing film 1, including a first substrate film 10; and a phosphor-containing layer 30 at which a plurality of regions 35 containing phosphors 31, which, if exposed to oxygen, deteriorate by reacting with the oxygen, are discretely disposed on the first substrate film 10, and at which a resin layer 38 having an impermeability to oxygen is disposed between the discretely disposed regions 35 containing phosphors 31, in which a width S of the resin layer 38 between the regions 35 containing phosphors 31 is 0.01?S<0.5 mm, and wherein a ratio of a volume Vp of the regions containing phosphors, to a sum of the volume Vp and a volume Vb of the resin layer in the phosphor-containing layer, is 0.1?Vp/(Vp+Vb)<0.9.
    Type: Grant
    Filed: January 12, 2018
    Date of Patent: December 11, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Keisuke Oku, Kenichi Kakishita, Tatsuya Oba
  • Publication number: 20180138027
    Abstract: Provided are a phosphor-containing capable of suppressing deterioration of phosphors and can be manufactured with high efficiency and a backlight unit. Specifically, provided is a phosphor-containing film 1, including a first substrate film 10; and a phosphor-containing layer 30 at which a plurality of regions 35 containing phosphors 31, which, if exposed to oxygen, deteriorate by reacting with the oxygen, are discretely disposed on the first substrate film 10, and at which a resin layer 38 having an impermeability to oxygen is disposed between the discretely disposed regions 35 containing phosphors 31, in which a width S of the resin layer 38 between the regions 35 containing phosphors 31 is 0.01?S<0.5 mm, and wherein a ratio of a volume Vp of the regions containing phosphors, to a sum of the volume Vp and a volume Vb of the resin layer in the phosphor-containing layer, is 0.1?Vp/(Vp+Vb)<0.9.
    Type: Application
    Filed: January 12, 2018
    Publication date: May 17, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Keisuke OKU, Kenichi KAKISHITA, Tatsuya OBA
  • Patent number: 9958727
    Abstract: The wavelength conversion member includes: a first substrate; a second substrate; and a wavelength conversion layer disposed between the first substrate and the second substrate and including quantum dots which are excited by excitation light to emit fluorescence. The wavelength conversion layer is a cured layer obtained by curing a polymerizable composition which includes the quantum dots and a polymerizable compound having a molecular weight of 200 or lower, and the number of bubble-shaped defects having a diameter of 0.1 mm or more in the wavelength conversion layer is less than 10 per 100 cm2.
    Type: Grant
    Filed: May 12, 2017
    Date of Patent: May 1, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Tatsuya Oba, Tomonari Ogawa, Keisuke Oku
  • Publication number: 20180044547
    Abstract: An aspect of the present invention relates to method of manufacturing a hard coat film, wherein the hard coat film comprises a plastic substrate and a hard coat layer, the method comprises forming the hard coat layer by subjecting a photopolymerizable hard coating composition to photopolymerization processing, and the photopolymerizable hard coating composition comprises a radical polymerizable compound having two or more radical polymerizable groups selected from the group consisting of acryloyloxy groups, acryloyl groups, methacryloyloxy groups, and methacryloyl groups per molecule, a cationic polymerizable compound, a radical photopolymerization initiator, and a cationic photopolymerization initiator.
    Type: Application
    Filed: October 12, 2017
    Publication date: February 15, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Akio TAMURA, Katsuyuki TAKADA, Takayasu YAMAZAKI, Keisuke OKU, Keigo UEKI
  • Publication number: 20170248809
    Abstract: The wavelength conversion member includes: a first substrate; a second substrate; and a wavelength conversion layer disposed between the first substrate and the second substrate and including quantum dots which are excited by excitation light to emit fluorescence. The wavelength conversion layer is a cured layer obtained by curing a polymerizable composition which includes the quantum dots and a polymerizable compound having a molecular weight of 200 or lower, and the number of bubble-shaped defects having a diameter of 0.1 mm or more in the wavelength conversion layer is less than 10 per 100 cm2.
    Type: Application
    Filed: May 12, 2017
    Publication date: August 31, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Tatsuya OBA, Tomonari OGAWA, Keisuke OKU
  • Publication number: 20150275028
    Abstract: An aspect of the present invention relates to method of manufacturing a hard coat film, wherein the hard coat film comprises a plastic substrate and a hard coat layer, the method comprises forming the hard coat layer by subjecting a photopolymerizable hard coating composition to photopolymerization processing, and the photopolymerizable hard coating composition comprises a radical polymerizable compound having two or more radical polymerizable groups selected from the group consisting of acryloyloxy groups, acryloyl groups, methacryloyloxy groups, and methacryloyl groups per molecule, a cationic polymerizable compound, a radical photopolymerization initiator, and a cationic photopolymerization initiator.
    Type: Application
    Filed: March 30, 2015
    Publication date: October 1, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Akio TAMURA, Katsuyuki TAKADA, Takayasu YAMAZAKI, Keisuke OKU, Keigo UEKI