Patents by Inventor Keisuke Okushiro

Keisuke Okushiro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210170669
    Abstract: An ink set for stereolithography according to the present invention is an ink set for stereolithography to be used in ink-jet stereolithography, and the ink set for stereolithography includes a composition for a support material to be used to shape a support material and a composition for a model material to be used to shape a model material. When the composition for a support material is ejected onto a support material cured article, which is a cured article of the composition for a support material, a contact angle of the composition for a support material with respect to the support material cured article at 0.3 seconds after the composition for a support material hits the support material cured article is taken as a contact angle SS. When the composition for a model material is ejected onto a support material cured article, which is a cured article of the composition for a support material, a contact angle of the composition for a model material with respect to the support material cured article at 0.
    Type: Application
    Filed: December 12, 2017
    Publication date: June 10, 2021
    Applicant: MAXELL HOLDINGS, LTD.
    Inventors: Hiroshi OTA, Keisuke OKUSHIRO
  • Patent number: 10557032
    Abstract: A composition for a support material according to the present invention is to be used in a support material for supporting a model material used to form a shaped article through ink-jet stereolithography and contains polyalkylene glycol having an oxybutylene group, a water-soluble monofunctional ethylenic unsaturated monomer, and a photopolymerization initiator, and the content of the polyalkylene glycol having an oxybutylene group is 15 parts by mass or more and 75 parts by mass or less with respect to the total mass of the composition for a support material taken as 100 parts by mass.
    Type: Grant
    Filed: November 29, 2017
    Date of Patent: February 11, 2020
    Assignee: MAXELL HOLDINGS, LTD.
    Inventors: Hiroshi Ota, Keisuke Okushiro
  • Publication number: 20190233634
    Abstract: A composition for a support material according to the present invention is to be used in a support material for supporting a model material used to form a shaped article through ink-jet stereolithography and contains polyalkylene glycol having an oxybutylene group, a water-soluble monofunctional ethylenic unsaturated monomer, and a photopolymerization initiator, and the content of the polyalkylene glycol having an oxybutylene group is 15 parts by mass or more and 75 parts by mass or less with respect to the total mass of the composition for a support material taken as 100 parts by mass.
    Type: Application
    Filed: November 29, 2017
    Publication date: August 1, 2019
    Applicant: MAXELL HOLDINGS, LTD.
    Inventors: Hiroshi OTA, Keisuke OKUSHIRO
  • Patent number: 4948833
    Abstract: An olefinic resin composition for molding, which comprises an olefinic resin, inorganic particles in rod shape and inorganic particles of planar crystalline structure respectively in 10 to 90% by volume, 3 to 60% by volume and 5 to 55% by volume based on the composition. A molded article made of such a composition is low in friction coefficient and high in mechanical strength. When this composition is incorporated with a synthetic resin having a higher hardness than the olefinic resin, the resultant molded article is enhanced in endurance on sliding. The resulting composition is suitable for manufacturing of a sliding member such as a tape guide.
    Type: Grant
    Filed: May 17, 1989
    Date of Patent: August 14, 1990
    Assignee: Hitachi Maxell, Ltd.
    Inventors: Tatsuo Araki, Keisuke Okushiro