Patents by Inventor Keisuke Shuto

Keisuke Shuto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10899891
    Abstract: A polymerizable composition includes 100 parts by mass of a reactive polysiloxane being a polycondensation product of an alkoxy silicon compound including at least an alkoxy silicon compound of formula [1], and 10 to 500 parts by mass of a polymerizable compound having at least one polymerizable double bond. (X is a phenyl group having at least one substituent having a polymerizable double bond, a naphthyl group having at least one substituent having a polymerizable double bond, a biphenyl group having at least one substituent having a polymerizable double bond, or a phenanthryl group having at least one substituent having a polymerizable double bond, Ar1 is a condensed ring hydrocarbon group having two or more benzene ring structures, or a hydrocarbon ring assembly group in which two or more aromatic rings are directly bonded through a single bond, and R1 is methyl group, ethyl group, or isopropyl group).
    Type: Grant
    Filed: May 24, 2017
    Date of Patent: January 26, 2021
    Assignee: NISSAN CHEMICAL CORPORATION
    Inventors: Takehiro Nagasawa, Taku Kato, Keisuke Shuto
  • Patent number: 10894800
    Abstract: A polymerizable silane compound that yields a cured product exhibiting a high refractive index and a low Abbe number, used in a polymerizable composition for preparing a molded article having higher transparency. A polysiloxane being a polycondensation product of the compound of formula [1]: (wherein X is a phenyl group having at least one substituent having a polymerizable double bond, a naphthyl group having at least one substituent having a polymerizable double bond, a biphenyl group having at least one substituent having a polymerizable double bond, or a phenanthryl group having at least one group having a polymerizable double bond, Ar1 is a condensed polycyclic hydrocarbon group (optionally substituted with a C1-6 alkyl group), or a hydrocarbon ring assembly group wherein two or more aromatic rings are directly bonded through a single bond (optionally substituted with a C1-6 alkyl group), and R1 is a methyl, ethyl, or isopropyl group).
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: January 19, 2021
    Assignee: NISSAN CHEMICAL CORPORATION
    Inventors: Keisuke Shuto, Taku Kato, Takehiro Nagasawa
  • Patent number: 10787535
    Abstract: A polymerizable composition which can be cured into a cured product exhibiting a low Abbe's number and is suitable for producing a molded article having a further high transparency. A polymerizable composition including 100 parts by mass of a reactive silsesquioxane compound containing a phenanthrene ring (a), and 10 to 500 parts by mass of a polymerizable compound having at least one polymerizable double bond (b), a cured product of the polymerizable composition, and a method for producing a molded article by using of the polymerizable composition.
    Type: Grant
    Filed: March 30, 2017
    Date of Patent: September 29, 2020
    Assignee: NISSAN CHEMICAL CORPORATION
    Inventors: Takehiro Nagasawa, Taku Kato, Keisuke Shuto
  • Patent number: 10703863
    Abstract: There is provided a polymerizable composition suitable to produce a molded product in which high refractive index is maintained, and dimensional change and a transmittance change further caused by a high-temperature heat history can be suppressed. A polymerizable composition comprising (a) 100 parts by mass of a specific reactive silsesquioxane compound and (b) 10 to 2,000 parts by mass of a specific fluorene compound, and a cured product obtained by curing the polymerizable composition, and a resin lens manufactured from the polymerizable composition.
    Type: Grant
    Filed: September 1, 2016
    Date of Patent: July 7, 2020
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Kei Yasui, Takehiro Nagasawa, Taku Kato, Keisuke Shuto
  • Patent number: 10450418
    Abstract: A polymerizable composition suitable for producing a molded article that can maintain a high refractive index and a low Abbe's number and can be restrained from dimensional changes due to a high-temperature thermal history has (a) 100 parts by mass of a specific reactive silsesquioxane compound, (b) 10 to 500 parts by mass of a specific fluorene compound and (c) 1 to 100 parts by mass of a specific aromatic vinyl compound. A cured product can be obtained by curing the polymerizable composition.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: October 22, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takehiro Nagasawa, Taku Kato, Kentaro Ohmori, Keisuke Shuto, Kenji Takase
  • Publication number: 20190292324
    Abstract: A polymerizable composition suitable for producing a molded article that can maintain a high refractive index and a low Abbe's number and can be restrained from dimensional changes due to a high-temperature thermal history has (a) 100 parts by mass of a specific reactive silsesquioxane compound, (b) 10 to 500 parts by mass of a specific fluorene compound and (c) 1 to 100 parts by mass of a specific aromatic vinyl compound. A cured product can be obtained by curing the polymerizable composition.
    Type: Application
    Filed: August 12, 2016
    Publication date: September 26, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takehiro NAGASAWA, Taku KATO, Kentaro OHMORI, Keisuke SHUTO, Kenji TAKASE
  • Publication number: 20190256533
    Abstract: A polymerizable silane compound that yields a cured product exhibiting a high refractive index and a low Abbe number, used in a polymerizable composition for preparing a molded article having higher transparency. A polysiloxane being a polycondensation product of the compound of formula [1]: (wherein X is a phenyl group having at least one substituent having a polymerizable double bond, a naphthyl group having at least one substituent having a polymerizable double bond, a biphenyl group having at least one substituent having a polymerizable double bond, or a phenanthryl group having at least one group having a polymerizable double bond, Ar1 is a condensed polycyclic hydrocarbon group (optionally substituted with a C1-6 alkyl group), or a hydrocarbon ring assembly group wherein two or more aromatic rings are directly bonded through a single bond (optionally substituted with a C1-6 alkyl group), and R1 is a methyl, ethyl, or isopropyl group).
    Type: Application
    Filed: May 9, 2017
    Publication date: August 22, 2019
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Keisuke SHUTO, Taku KATO, Takehiro NAGASAWA
  • Publication number: 20190256664
    Abstract: A polymerizable composition includes 100 parts by mass of a reactive polysiloxane being a polycondensation product of an alkoxy silicon compound including at least an alkoxy silicon compound of formula [1], and 10 to 500 parts by mass of a polymerizable compound having at least one polymerizable double bond. (X is a phenyl group having at least one substituent having a polymerizable double bond, a naphthyl group having at least one substituent having a polymerizable double bond, a biphenyl group having at least one substituent having a polymerizable double bond, or a phenanthryl group having at least one substituent having a polymerizable double bond, Ar1 is a condensed ring hydrocarbon group having two or more benzene ring structures, or a hydrocarbon ring assembly group in which two or more aromatic rings are directly bonded through a single bond, and R1 is methyl group, ethyl group, or isopropyl group).
    Type: Application
    Filed: May 24, 2017
    Publication date: August 22, 2019
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Takehiro NAGASAWA, Taku KATO, Keisuke SHUTO
  • Patent number: 10351651
    Abstract: A imprint material is provided, and a film that is prepared from the material and to which the pattern is transferred. An imprint material including: (A), (B), (C) and (D) components; a ratio of the amount of the (B) component to a total amount of the (A) component and the (B) component of 100% by mass is 5% by mass or more and 25% by mass or less: (A) a silsesquioxane compound having a repeating unit of Formula (1) and having two or more polymerizable groups of X0 in Formula (1); (B) a silicone compound having a repeating unit of Formula (2) and having two polymerizable groups at ends thereof; (C) a photopolymerization initiator; and (D) a solvent wherein the formulae, R1 and R2 are each independently a C1-3 alkyl group; R0 is a C1-3 alkylene group; and k is an integer of 0 to 3.
    Type: Grant
    Filed: October 6, 2014
    Date of Patent: July 16, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Junpei Kobayashi, Taku Kato, Keisuke Shuto, Masayoshi Suzuki
  • Patent number: 10331030
    Abstract: A novel imprint material and film produced from the material, on which a pattern is transferred. An imprint material having: a component (A); a component (B); a component (C); and a component (D), wherein, (A): a compound of Formula (1), Formula (2), or Formula (3): wherein, X is C1-5 linear alkylene, R1 is H or CH3; each of R2, R3, and R4 is independently H, CH3, or C2H5; and the sum of the number of carbon atoms on R2, R3, and R4 is 0 to 2; (B): a silsesquioxane compound having a repeating unit of Formula (4), and having two or more polymerizable groups of Y; (C): a silicone compound having a repeating unit of Formula (5), and having two polymerizable groups on its ends: wherein, each of R6 and R7 is independently C1-3 alkyl; R5 is C1-3 alkylene; and k is 0 to 3; and (D): photopolymerization initiator.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: June 25, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Junpei Kobayashi, Taku Kato, Keisuke Shuto, Masayoshi Suzuki
  • Publication number: 20190169345
    Abstract: A polymerizable composition which can be cured into a cured product exhibiting a low Abbe's number and is suitable for producing a molded article having a further high transparency. A polymerizable composition including 100 parts by mass of a reactive silsesquioxane compound containing a phenathrene ring (a), and 10 to 500 parts by mass of a polymerizable compound having at least one polymerizable double bond (b), a cured product of the polymerizable composition, and a method for producing a molded article by using of the polymerizable composition.
    Type: Application
    Filed: March 30, 2017
    Publication date: June 6, 2019
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Takehiro NAGASAWA, Taku KATO, Keisuke SHUTO
  • Publication number: 20180371136
    Abstract: A novel imprint material including: (A) a compound of formula (1); (B) a compound of formula (2); (C) a compound of formula (3); (D) a compound of formula (4); and (E) a photopolymerization initiator: wherein each R1 is independently a hydrogen atom or methyl group; R2 is a divalent or trivalent hydrocarbon group; j is 0 or 1; k is 2 or 3; X is a divalent linking group having an ethylene oxide and/or a propylene oxide unit; R3 is a hydrogen atom or alkyl group; m is 1 or 2; R5 is a trivalent, tetravalent, pentavalent, or hexavalent organic group, which optionally has at least one hetero atom; n is an integer from 3 to 6; where m is 1, R4 is an alkyl group optionally substituted with at least one substituent; and where m is 2, R4 is an alkylene group optionally substituted with at least one substituent.
    Type: Application
    Filed: December 16, 2016
    Publication date: December 27, 2018
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Junpei KOBAYASHI, Keisuke SHUTO, Taku KATO, Masayoshi SUZUKI
  • Patent number: 10066059
    Abstract: A sealing material composition for LED has excellent heat-resistant transparency, adhesion, and crack resistance, and low sulfur gas permeability. A sealing material composition for LED has the following (A), (B), (C), and (D): (A): polysiloxane containing units (1-1), (1-2), and (1-3): wherein R1 is C1-12 alkyl or C6-20 aryl, R2 is hydrogen, C1-12 alkyl, or Si constituting main chain of polysiloxane as (A); (B): polysiloxane containing units (2-1), (2-2), and (2-3): wherein R3 and R4 are each hydrogen, C1-12 alkyl, or Si constituting main chain of polysiloxane as (B); (C): adhesive; and (D): condensation catalyst for silanol group.
    Type: Grant
    Filed: September 8, 2015
    Date of Patent: September 4, 2018
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Keisuke Shuto, Taku Kato, Junpei Kobayashi, Masayoshi Suzuki
  • Publication number: 20180244852
    Abstract: There is provided a polymerizable composition suitable to produce a molded product in which high refractive index is maintained, and dimensional change and a transmittance change further caused by a high-temperature heat history can be suppressed. A polymerizable composition comprising (a) 100 parts by mass of a specific reactive silsesquioxane compound and (b) 10 to 2,000 parts by mass of a specific fluorene compound, and a cured product obtained by curing the polymerizable composition, and a resin lens manufactured from the polymerizable composition.
    Type: Application
    Filed: September 1, 2016
    Publication date: August 30, 2018
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Kei YASUI, Takehiro NAGASAWA, Taku KATO, Keisuke SHUTO
  • Publication number: 20180180999
    Abstract: A novel imprint material including a component (A); a component (B); a component (C); and a component (D) below. (A): a compound of Formula (1) below, (B): a compound of Formula (2) below, (C): a compound of Formula (3) below, and (D): a photopolymerization initiator, wherein, each R1 is independently a hydrogen atom or a methyl group, R2 is a C1-5 hydrocarbon group that optionally has a hydroxy group as a substituent, m is 2 or 3, X is a divalent linking group having an ethylene oxide unit and/or a propylene oxide unit, R3 is a hydrogen atom or a C1-3 alkyl group, n is 1 or 2, and when n is 1, R4 is a C1-12 alkyl group that is optionally substituted with at least one substituent, and when n is 2, R4 is a C1-12 alkylene group that is optionally substituted with at least one substituent.
    Type: Application
    Filed: May 31, 2016
    Publication date: June 28, 2018
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Junpei KOBAYASHI, Taku KATO, Keisuke SHUTO, Masayoshi SUZUKI
  • Publication number: 20170306095
    Abstract: A sealing material composition for LED has excellent heat-resistant transparency, adhesion, and crack resistance, and low sulfur gas permeability. A sealing material composition for LED has the following (A), (B), (C), and (D): (A): polysiloxane containing units (1-1), (1-2), and (1-3): wherein R1 is C1-12 alkyl or C6-20 aryl, R2 is hydrogen, C1-12 alkyl, or Si constituting main chain of polysiloxane as (A); (B): polysiloxane containing units (2-1), (2-2), and (2-3): wherein R3 and R4 are each hydrogen, C1-12 alkyl, or Si constituting main chain of polysiloxane as (B); (C): adhesive; and (D): condensation catalyst for silanol group.
    Type: Application
    Filed: September 8, 2015
    Publication date: October 26, 2017
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Keisuke SHUTO, Taku KATO, Junpei KOBAYASHI, Masayoshi SUZUKI
  • Publication number: 20170269474
    Abstract: A novel imprint material and film produced from the material, on which a pattern is transferred. An imprint material having: a component (A); a component (B); a component (C); and a component (D), wherein, (A): a compound of Formula (1), Formula (2), or Formula (3): wherein, X is C1-5 linear alkylene, R1 is H or CH3; each of R2, R3, and R4 is independently H, CH3, or C2H5; and the sum of the number of carbon atoms on R2, R3, and R4 is 0 to 2; (B): a silsesquioxane compound having a repeating unit of Formula (4), and having two or more polymerizable groups of Y; (C): a silicone compound having a repeating unit of Formula (5), and having two polymerizable groups on its ends: wherein, each of R6 and R7 is independently C1-3 alkyl; R5 is C1-3 alkylene; and k is 0 to 3; and (D): photopolymerization initiator.
    Type: Application
    Filed: July 24, 2015
    Publication date: September 21, 2017
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Junpei KOBAYASHI, Taku KATO, Keisuke SHUTO, Masayoshi SUZUKI
  • Patent number: 9631081
    Abstract: An imprint material which is in a transparent and homogeneous varnish form, is not peeled off in cross-cut tests, in which the adhesion of coating films is evaluated, and forms films that can have a mold release force of 0.5 g/cm or less. An imprint material including: a component (A): a compound containing at least one alkylene oxide unit having carbon atom number of 2, 3 or 4 and at least two polymerizable groups; a component (B): a photopolymerization initiator; a component (C): a solvent that swells or dissolves a surface portion of a film base material to which the imprint material is applied; and a component (D): a silicone compound.
    Type: Grant
    Filed: April 16, 2013
    Date of Patent: April 25, 2017
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Taku Kato, Junpei Kobayashi, Keisuke Shuto, Masayoshi Suzuki
  • Patent number: 9533467
    Abstract: There is provided an imprint material that allows a resin film to be readily released from a mold at the time of mold release after curing, that is, an imprint material that forms a film having a low mold release property as well as high transparency, high scratch resistance, and a high fingerprint wiping-off property; and a film which is formed from the material and to which a pattern is transferred. An imprint material including: a (A) component: a compound having a propylene oxide unit and two polymerizable groups or a compound having a propylene oxide unit, an ethylene oxide unit, and two polymerizable groups; a (B) component: a silicone compound; and a (C) component: a photopolymerization initiator.
    Type: Grant
    Filed: April 16, 2013
    Date of Patent: January 3, 2017
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Junpei Kobayashi, Taku Kato, Keisuke Shuto, Masayoshi Suzuki
  • Publication number: 20160251469
    Abstract: A imprint material is provided, and a film that is prepared from the material and to which the pattern is transferred. An imprint material including: (A), (B), (C) and (D) components; a ratio of the amount of the (B) component to a total amount of the (A) component and the (B) component of 100% by mass is 5% by mass or more and 25% by mass or less: (A) a silsesquioxane compound having a repeating unit of Formula (1) and having two or more polymerizable groups of X0 in Formula (1); (B) a silicone compound having a repeating unit of Formula (2) and having two polymerizable groups at ends thereof; (C) a photopolymerization initiator; and (D) a solvent wherein the formulae, R1 and R2 are each independently a C1-3 alkyl group; R0 is a C1-3 alkylene group; and k is an integer of 0 to 3.
    Type: Application
    Filed: October 6, 2014
    Publication date: September 1, 2016
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Junpei KOBAYASHI, Taku KATO, Keisuke SHUTO, Masayoshi SUZUKI