Abstract: A ceramic heater includes: a ceramic plate having a wafer placement surface on its upper surface; two or more resistance heating elements embedded in the ceramic plate and provided for corresponding two or more divided zones of the wafer placement surface; a tubular shaft supporting the ceramic plate from a lower surface of the ceramic plate; a thermocouple insert hole provided in a shaft inner region that is a portion of the lower surface of the ceramic plate defined by the tubular shaft; and four or more resistance heating element terminal holes provided in the shaft inner region and corresponding to both ends of the two or more resistance heating elements. At least one of the two or more resistance heating elements is located above a bottom of the thermocouple insert hole and has a portion overlapping the thermocouple insert hole in plan view.

Abstract: A multi-zone heater capable of heating a wafer mounted on a disc-shaped ceramic substrate includes: a plurality of lift pin holes which are provided in the substrate; an inner zone heater embedded in an inner zone of the ceramic substrate; an outer zone heater embedded in an outer zone outside the inner zone; first and second feed terminals to which opposite ends of the inner zone heater are connected; first and second leads to which opposite ends of the outer zone heater are connected; and third and fourth feed terminals to which the first and second leads are respectively connected, the plurality of lift pin holes, the inner zone heater, and the outer zone heater are arranged to be symmetric with respect to a common axis of symmetry, and the first and second leads are arranged along the axis of symmetry to be symmetric to each other.

Abstract: A plant disease resistance inducing method and a plant disease resistance inducing device, as well as a plant disease resistance inducing agent, which can induce a systemic resistance without inhibiting the plant growth in a relatively easy and inexpensive manner and with little environmental loads. A plant is exposed to a gas containing dinitrogen pentoxide to induce the disease resistance. It is particularly preferable that dinitrogen pentoxide is produced using a plasma generated with air as a source gas, and a plant is exposed to a gas containing dinitrogen pentoxide.

Abstract: A multi-zone heater capable of heating a wafer mounted on a disc-shaped ceramic substrate includes: a plurality of lift pin holes which are provided in the substrate; an inner zone heater embedded in an inner zone of the ceramic substrate; an outer zone heater embedded in an outer zone outside the inner zone; first and second feed terminals to which opposite ends of the inner zone heater are connected; first and second leads to which opposite ends of the outer zone heater are connected; and third and fourth feed terminals to which the first and second leads are respectively connected, the plurality of lift pin holes, the inner zone heater, and the outer zone heater are arranged to be symmetric with respect to a common axis of symmetry, and the first and second leads are arranged along the axis of symmetry to be symmetric to each other.

Abstract: A dinitrogen pentoxide generating device and a method for generating dinitrogen pentoxide. An NOx generating unit is able to use, as a raw material gas, a gas containing nitrogen and oxygen and produce a plasma to generate a nitrogen oxide. An ozone generating unit is able to use, as a raw material gas, the gas containing nitrogen and oxygen or a gas obtained after the plasma has been produced by the NOx generating unit and produce a plasma to generate ozone. A mixing unit is able to hold the nitrogen oxide generated by the NOx generating unit and the ozone generated by the ozone generating unit in the same space for a predetermined time to generate dinitrogen pentoxide.

Abstract: A flow control method is a flow control method of controlling flow around a blade of a rotary wing, a plasma actuator being disposed at the blade. The flow control method includes: determining a characteristic frequency ratio that is a characteristic value among frequency ratios, each of the frequency ratios being a ratio between an actuator driving frequency and an angle of attack changing frequency, the actuator driving frequency being a frequency of an applied voltage applied to the plasma actuator, the angle of attack changing frequency being a frequency at which an angle of attack of the blade changes in accordance with a rotation angle of the blade; setting the actuator driving frequency such that the frequency ratio becomes the characteristic frequency ratio; and applying a voltage of the set actuator driving frequency to the plasma actuator to control the flow around the blade.

Abstract: A flow control method is a flow control method of controlling flow around a blade of a rotary wing, a plasma actuator being disposed at the blade. The flow control method includes: determining a characteristic frequency ratio that is a characteristic value among frequency ratios, each of the frequency ratios being a ratio between an actuator driving frequency and an angle of attack changing frequency, the actuator driving frequency being a frequency of an applied voltage applied to the plasma actuator, the angle of attack changing frequency being a frequency at which an angle of attack of the blade changes in accordance with a rotation angle of the blade; setting the actuator driving frequency such that the frequency ratio becomes the characteristic frequency ratio; and applying a voltage of the set actuator driving frequency to the plasma actuator to control the flow around the blade.

Abstract: A flow control method is a flow control method of controlling flow around a blade of a rotary wing, a plasma actuator being disposed at the blade. The flow control method includes: determining a characteristic frequency ratio that is a characteristic value among frequency ratios, each of the frequency ratios being a ratio between an actuator driving frequency and an angle of attack changing frequency, the actuator driving frequency being a frequency of an applied voltage applied to the plasma actuator, the angle of attack changing frequency being a frequency at which an angle of attack of the blade changes in accordance with a rotation angle of the blade; setting the actuator driving frequency such that the frequency ratio becomes the characteristic frequency ratio; and applying a voltage of the set actuator driving frequency to the plasma actuator to control the flow around the blade.

Abstract: A pathogen and pest exterminating device that can efficiently exterminate pathogens and pests in a shorter time. One electrode includes a part to be inserted into a reaction vessel, and other electrode is arranged in a position that opposes the insertion part. A water supply unit is provided to supply water to the reaction vessel through the insertion part, and a gas supply unit provided of supplying gas, which will become plasma, to the reaction vessel. A power supply unit is provided to be capable of applying voltage between the insertion part and the other electrode such that OH radicals are generated inside the reaction vessel to which the water and the gas are supplied. The insertion part is formed in a shape that restricts, between itself and the other electrode, a flow rate of water from the water supply unit such as a coil, waveform, or mesh shape.

Abstract: A pathogen and pest exterminating device that can efficiently exterminate pathogens and pests in a shorter time. One electrode includes a part to be inserted into a reaction vessel, and other electrode is arranged in a position that opposes the insertion part. A water supply unit is provided to supply water to the reaction vessel through the insertion part, and a gas supply unit provided of supplying gas, which will become plasma, to the reaction vessel. A power supply unit is provided to be capable of applying voltage between the insertion part and the other electrode such that OH radicals are generated inside the reaction vessel to which the water and the gas are supplied. The insertion part is formed in a shape that restricts, between itself and the other electrode, a flow rate of water from the water supply unit such as a coil, waveform, or mesh shape.