Patents by Inventor Keisuke Utani

Keisuke Utani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8020458
    Abstract: In a sample introducing system that can be easily adapted to a variety of analytical conditions without being affected by a flow rate of gas introduced into an analytical device, can introduce an analytical sample into the analytical device without loss, and can contribute to a simple and highly accurate high-sensitivity analysis, a pretreatment device removes unnecessary components from an untreated sample gas containing the analytical sample. A treated sample gas that has been pretreated by the pretreatment device is introduced into the analytical device via a connection gas flow channel. A gas addition device that adds a carrier gas to the treated sample gas flowing toward the analytical device in the connection gas flow channel has a means for changing the addition flow rate of the carrier gas. Pressure fluctuations of the gas containing the analytical sample are restricted by a pressure adjusting device upstream of the gas addition device.
    Type: Grant
    Filed: March 30, 2007
    Date of Patent: September 20, 2011
    Assignee: Sumitomo Seika Chemicals Co., Ltd
    Inventors: Keisuke Utani, Kohei Nishiguchi
  • Publication number: 20110133074
    Abstract: Analytical method and analytical system are presented, wherein properties of the carrier gas conveying fine particles and gas components generated by laser ablation can be prevented from inhibiting the optimization of analysis conditions, and plural kinds of elements can be stably measured with high sensitivity and good accuracy without losing operability, speed, and convenience when fine particles generated by laser ablation are plasma-analyzed. A sample ? is converted into fine particles by a laser ablation device in the atmosphere of a first gas. The fine particles are conveyed from the laser ablation device to a gas replacement device by using the first gas as a carrier gas. The first gas of at least part of the carrier gas conveying the fine particles is replaced with a second gas by means of the gas replacement device. The fine particles are conveyed from the gas replacement device to the plasma analyzer by the carrier gas that has been subjected to the gas replacement.
    Type: Application
    Filed: July 22, 2009
    Publication date: June 9, 2011
    Inventors: Hideki Nakanishi, Keisuke Utani, Kohei Nishiguchi
  • Publication number: 20090173171
    Abstract: In a sample introducing system that can be easily adapted to a variety of analytical conditions without being affected by a flow rate of gas introduced into an analytical device, can introduce an analytical sample into the analytical device without loss, and can contribute to a simple and highly accurate high-sensitivity analysis, a pretreatment device removes unnecessary components from an untreated sample gas containing the analytical sample. A treated sample gas that has been pretreated by the pretreatment device is introduced into the analytical device via a connection gas flow channel. A gas addition device that adds a carrier gas to the treated sample gas flowing toward the analytical device in the connection gas flow channel has a means for changing the addition flow rate of the carrier gas. Pressure fluctuations of the gas containing the analytical sample are restricted by a pressure adjusting device upstream of the gas addition device.
    Type: Application
    Filed: March 30, 2007
    Publication date: July 9, 2009
    Applicant: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Keisuke Utani, Kohei Nishiguchi