Patents by Inventor Keita HIROKAWA

Keita HIROKAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250028272
    Abstract: A CO2 emission estimation system includes a CO2 emission estimator. The CO2 emission estimator calculates an estimated value of CO2 emissions from an image forming apparatus when performing a job, using a CO2 emission estimation model as a formula for estimating the CO2 emissions and settings for the job. The CO2 emission estimation model is a formula where a multiple regression expression for determining an estimated value of a power consumption of the image forming apparatus when performing the job is multiplied by a CO2 emission factor. The CO2 emission estimation model has a plurality of explanatory variables each according to a different type of setting for the job.
    Type: Application
    Filed: July 16, 2024
    Publication date: January 23, 2025
    Applicant: KYOCERA Document Solutions Inc.
    Inventors: Naoki TAKEUCHI, Osamu HIROKAWA, Akira YUKI, Keita MIYAMOTO, Ryota YAGANE, Miyuki HARA
  • Patent number: 12091583
    Abstract: The present invention provides a polymer compound peeling agent usable for peeling as many types of polymer compounds as possible and capable of reducing a burden required for a peeling treatment when a polymer compound having adhered to an adhesion object is peeled. The polymer compound peeling agent for peeling a polymer compound having adhered to an adhesion object contains a photoresponsive liquid crystal material having a phase structure reversibly transitioning between an isotropic phase and a liquid crystal phase due to photoisomerization based on irradiation lights of different wavelengths. When the polymer compound is adhered to the adhesion object, the photoresponsive liquid crystal material is contained in the polymer compound with the phase structure set to the isotropic phase, and the phase structure of the photoresponsive liquid crystal material is allowed to transition from the isotropic phase to the liquid crystal phase by photoisomerization based on the light irradiation.
    Type: Grant
    Filed: May 8, 2020
    Date of Patent: September 17, 2024
    Assignees: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, TAT INC.
    Inventors: Takahiro Yamamoto, Kyohei Takuno, Keita Hirokawa
  • Publication number: 20210261830
    Abstract: The present invention provides a polymer compound peeling agent usable for peeling as many types of polymer compounds as possible and capable of reducing a burden required for a peeling treatment when a polymer compound having adhered to an adhesion object is peeled. The polymer compound peeling agent for peeling a polymer compound having adhered to an adhesion object contains a photoresponsive liquid crystal material having a phase structure reversibly transitioning between an isotropic phase and a liquid crystal phase due to photoisomerization based on irradiation lights of different wavelengths. When the polymer compound is adhered to the adhesion object, the photoresponsive liquid crystal material is contained in the polymer compound with the phase structure set to the isotropic phase, and the phase structure of the photoresponsive liquid crystal material is allowed to transition from the isotropic phase to the liquid crystal phase by photoisomerization based on the light irradiation.
    Type: Application
    Filed: May 8, 2020
    Publication date: August 26, 2021
    Applicants: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, TAT INC.
    Inventors: Takahiro YAMAMOTO, Kyohei TAKUNO, Keita HIROKAWA