Patents by Inventor Keita IIMURA

Keita IIMURA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • MULTILAYER BODY FOR IMAGE DISPLAY DEVICE AND IMAGE DISPLAY DEVICE
    Publication number: 20240121999
    Abstract: A multilayer body for an image display device includes a wiring substrate including a substrate having transparency, and a mesh wiring layer disposed on the substrate; and a dielectric layer stacked on the wiring substrate. The dielectric layer and the substrate have a total thickness of 50 ?m or more and 500 ?m or less.
    Type: Application
    Filed: April 4, 2022
    Publication date: April 11, 2024
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Keita IIMURA, Shuji KAWAGUCHI, Kazuki KINOSHITA, Hidetoshi IIOKA, Seiji TAKE
  • WIRING BOARD AND METHOD OF MANUFACTURING WIRING BOARD
    Publication number: 20230318203
    Abstract: A wiring board includes a substrate, a wiring pattern area arranged on the substrate and including pieces of wiring, and a plurality of dummy pattern areas arranged around the wiring pattern area and electrically independent of the wiring. An aperture ratio of a first dummy pattern area, which is located next to the wiring pattern area, is not lower than an aperture ratio of the wiring pattern area. In addition, an aperture ratio of a second dummy pattern area, which is located next to the first dummy pattern area and farther from the wiring pattern area than the first dummy pattern area is, is higher than the aperture ratio of the first dummy pattern area.
    Type: Application
    Filed: October 4, 2021
    Publication date: October 5, 2023
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Kazuki KINOSHITA, Keita IIMURA, Seiji TAKE, Shuji KAWAGUCHI, Masashi SAKAKI
  • Imprint mold, imprint method, wire grid polarizer, and method for manufacturing wire grid polarizer
    Patent number: 10088617
    Abstract: A configuration including a main pattern region and a measurement pattern region which are set on one surface of a substrate having flexibility, wherein the measurement pattern region has at least a region disposed inside the contour line of the main pattern region, a main pattern, in which a plurality of line-shaped main convex patterns are arrayed with desired intervals, is disposed in the main pattern region, a measurement pattern, in which a plurality of line-shaped unit convex patterns are arrayed with desired intervals, is disposed in the measurement pattern region, and the line direction of the main pattern and the line direction of the measurement pattern are the same.
    Type: Grant
    Filed: July 30, 2015
    Date of Patent: October 2, 2018
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Yasuhiro Ookawa, Keita Iimura, Naoko Nakata
  • IMPRINT MOLD, IMPRINT METHOD, WIRE GRID POLARIZER, AND METHOD FOR MANUFACTURING WIRE GRID POLARIZER
    Publication number: 20170227696
    Abstract: A configuration including a main pattern region and a measurement pattern region which are set on one surface of a substrate having flexibility, wherein the measurement pattern region has at least a region disposed inside the contour line of the main pattern region, a main pattern, in which a plurality of line-shaped main convex patterns are arrayed with desired intervals, is disposed in the main pattern region, a measurement pattern, in which a plurality of line-shaped unit convex patterns are arrayed with desired intervals, is disposed in the measurement pattern region, and the line direction of the main pattern and the line direction of the measurement pattern are the same.
    Type: Application
    Filed: July 30, 2015
    Publication date: August 10, 2017
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Yasuhiro OOKAWA, Keita IIMURA, Naoko NAKATA