Patents by Inventor Keita ISHIBA

Keita ISHIBA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240100227
    Abstract: Provided is a novel device or a novel implantation device. The implantation device is one of the following: (1) an implantation device comprising a material (A) having a density of 12 mg/cm3 or more and a dissolution rate of 80% or less as determined after immersion of the material (A) in physiological saline at 37° C. for 24 hours; and (2) an implantation device comprising a material (A) having a dissolution rate of 80% or less as determined after immersion of the material (A) in physiological saline at 37° C. for 24 hours and a ratio of X/Y of 0.24 or more wherein X is a density (mg/cm3) of the material (A) and Y is a degree of swelling of the material (A) expressed in terms of fold increase as determined after immersion of the material (A) in physiological saline at 37° C. for 60 minutes.
    Type: Application
    Filed: February 8, 2022
    Publication date: March 28, 2024
    Applicants: Shin-Etsu Chemical Co., Ltd., JAPAN VAM & POVAL CO., LTD., TOHOKU UNIVERSITY
    Inventors: Shuhei KANESATO, Yoshihiro KIMURA, Akinobu OHARUDA, Keita ISHIBA, Masafumi GOTO