Abstract: A cooling structure includes a cooling target member; a cooling plate including a cooling mechanism, the cooling plate being configured to cool the cooling target member; and a clamp configured to hold the cooling plate. The cooling plate includes a spherical portion having a spherical surface facing the cooling target member and having a center portion that bulges toward the cooling target member with respect to a peripheral edge portion, and a flat portion provided outside the spherical portion so that the spherical portion is thicker than the flat portion. The clamp is configured to apply at least a predetermined pressure only to the spherical portion through a surface of the cooling target member facing the cooling plate.

Abstract: A plasma processing apparatus includes supporting members, connecting members, a rotation member and fixing members. Each of the supporting members is partially disposed in a disc-shaped cooling plate and configured to support an upper electrode provided below the cooling plate. Each of the connecting members is partially disposed in the cooling plate and extends in a diametrical direction of the cooling plate to be engaged with the corresponding supporting member. The rotation member is provided to surround an outer periphery of the cooling plate and has recesses formed to face the cooling plate and engaged with the corresponding connecting members. Each of the fixing members is configured to lift and fix the upper electrode to the cooling plate by applying a torque to the corresponding connecting member.

Abstract: An upper electrode structure includes a first plate, a second plate and an electrostatic attraction unit. The first plate has a first region, a second region and a third region which are concentrically arranged. Each of the regions is provided with a multiple number of gas discharge openings. The electrostatic attraction unit is provided between the first plate and the second plate and is configured to attract the first plate. The electrostatic attraction unit is equipped with a first to third heaters for the first to third regions. The electrostatic attraction unit and the second plate provide a first supply path, a second supply path and a third supply path through which gases are supplied into the first to third regions, respectively. A first gas diffusion space, a second gas diffusion space and a third gas diffusion space are formed in the electrostatic attraction unit.

Abstract: A cooling structure is provided that, includes a cooling target member, a cooling plate including a cooling mechanism and being configured to cool the cooling target member, and a clamp configured to hold the cooling target member to the cooling plate at an outer periphery of the cooling plate. The cooling plate includes a surface facing the cooling target member that is arranged into a spherical shape having a center portion that bulges toward the cooling target member with respect to a peripheral edge portion. The cooling target member includes a surface facing the cooling plate to which at least a predetermined pressure is applied.

Abstract: Disclosed is a plasma processing apparatus including a focus ring installed outside a substrate mounted on a mounting table including a temperature control mechanism. The focus ring is configured to be in contact with the mounting table via a heat transfer sheet. A heat insulating layer having a heat conductivity lower than that of the focus ring is provided on a surface of the focus ring at a side of the heat transfer sheet among surfaces of the focus ring.

Abstract: A plasma processing apparatus includes supporting members, connecting members, a rotation member and fixing members. Each of the supporting members is partially disposed in a disc-shaped cooling plate and configured to support an upper electrode provided below the cooling plate. Each of the connecting members is partially disposed in the cooling plate and extends in a diametrical direction of the cooling plate to be engaged with the corresponding supporting member. The rotation member is provided to surround an outer periphery of the cooling plate and has recesses formed to face the cooling plate and engaged with the corresponding connecting members. Each of the fixing members is configured to lift and fix the upper electrode to the cooling plate by applying a torque to the corresponding connecting member.