Abstract: At least one exemplary embodiment is directed to an exposure apparatus configured to expose a substrate through a liquid comprising a projection optical and a nozzle unit. The nozzle unit has a liquid recovery port recovering the liquid and a liquid supply port arranged between a final lens and the liquid recovery port and supplying the liquid. A static contact angle of an outer-side second portion of the nozzle unit surface than the liquid recovery port with respect to the liquid is larger than that of an inner-side first portion of the nozzle unit surface than the liquid recovery port by 20° or more. A sliding angle of the second portion with respect to the liquid is 20° or less.

Abstract: An exposure apparatus includes a projection optical system that projects light from an original to a substrate, and a supply device that supplies liquid containing a hydrocarbon compound to a gap between the final surface of the projection optical system and the substrate. The exposure apparatus exposes the substrate to light via the liquid filling the gap. The exposure apparatus further includes an adding device that adds water to the liquid to be supplied by the supply device.

Abstract: An exposure apparatus exposes a substrate to exposure light via an organic liquid. The exposure apparatus includes an oxidation reaction device and a filter. The oxidation reaction device generates oxide by causing reaction between the organic liquid and at least one of oxygen and water in the organic liquid through the application of illumination light onto the organic liquid. The filter removes the oxide generated by the oxidation reaction device from the organic liquid. The organic liquid is supplied onto the substrate via the oxidation reaction device and the filter.

Abstract: A method for manufacturing calcium fluoride single crystal includes the step of cooling the calcium fluoride single crystal so that maximum shear stress inside the calcium fluoride single crystal caused by thermal stress is approximately equal to or smaller than critical resolved shear stress (?c) in a <1 1 0> direction of on a {0 0 1} plane of the calcium fluoride single crystal.

Abstract: At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate. The exposure apparatus includes a movable substrate stage, a projection optical system configured to project light from an original and including a final optical element, and a nozzle member provided around the final optical element and including an opposing surface opposing the substrate. The substrate is exposed via liquid filled between a final surface of the projection optical system and the substrate, the projection optical system, and the original. The opposing surface includes a supply port, a first recovery port provided farther from an optical axis of the final optical element than the supply port, and a first portion and a second portion provided between the supply port and the first recovery port. The distance between the first portion and the substrate is longer than the distance between the supply port and the substrate.

Abstract: At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate. The exposure apparatus includes a movable substrate stage, a projection optical system configured to project light from an original and including a final optical element, and a nozzle member provided around the final optical element and including an opposing surface opposing the substrate. The substrate is exposed via liquid filled between a final surface of the projection optical system and the substrate, the projection optical system, and the original. The opposing surface includes a supply port, a first recovery port provided farther from an optical axis of the final optical element than the supply port, and a first portion and a second portion provided between the supply port and the first recovery port. The distance between the first portion and the substrate is longer than the distance between the supply port and the substrate.

Abstract: At least one exemplary embodiment is directed to an exposure apparatus configured to expose a substrate through a liquid comprising a projection optical and a nozzle unit. The nozzle unit has a liquid recovery port recovering the liquid and a liquid supply port arranged between a final lens and the liquid recovery port and supplying the liquid. A static contact angle of an outer-side second portion of the nozzle unit surface than the liquid recovery port with respect to the liquid is larger than that of an inner-side first portion of the nozzle unit surface than the liquid recovery port by 20° or more. A sliding angle of the second portion with respect to the liquid is 20° or less.

Abstract: An exposure apparatus has a projection optical system configured to project an image of a reticle pattern onto a substrate, and exposes the substrate via liquid supplied to a space between the substrate and the projection optical system. The exposure apparatus includes an oxygen removal unit configured to reduce dissolved oxygen in the liquid by bringing the liquid into contact with a gas other than oxygen, and a degassing unit configured to reduce a dissolved gas in the liquid.

Abstract: A calcium fluoride single crystal for photolithography, wherein a critical resolved shear stress (?c) in a <1 1 0> direction on a {0 0 1 } plane of the calcium fluoride single crystal is approximately equal to or larger than a shear stress (?) expressed by ?=1.5E?2·exp(3E3·T?1), where r is shear stress (MPa) and T is average temperature (K) of the calcium fluoride.

Abstract: A method for manufacturing calcium fluoride single crystal includes the step of cooling the calcium fluoride single crystal so that maximum shear stress inside the calcium fluoride single crystal caused by thermal stress is approximately equal to or smaller than critical resolved shear stress (?c) in a <1 1 0> direction of on a {0 0 1} plane of the calcium fluoride single crystal.

Abstract: A crystallization method includes the steps of producing a purified article made of a material as crystalloid by mixing with scavenger, melting, and then solidifying the material, inspecting an amount of remaining oxygen contained in the purified article, and melting the purified article selected by the inspecting step, and then growing crystal from the purified article.

Abstract: A method for manufacturing calcium fluoride single crystal includes the step of cooling the calcium fluoride single crystal so that maximum shear stress inside the calcium fluoride single crystal caused by thermal stress is approximately equal to or smaller than critical resolved shear stress (&tgr;c) in a <1 1 0> direction of on a {0 0 1} plane of the calcium fluoride single crystal.

Abstract: The present invention relates to a thermal line printer for a small recording terminals such as a terminal for POS (point of sales), a handy terminal, a measuring apparatus or the like, and also relates to a driving device for the thermal line printer. In the structure of a conventional thermal line printer, there is a limitation to the ability to decrease the dimension of depth in a situation where the downsizing of an apparatus is desired. By installing the thermal line printer in an upright state, the dimension of the depth can be decreased. However, in this configuration, the user cannot see the state of the printing because the recording paper falls down toward the user's side, due to the gravity, when the paper is ejected after printing.

Abstract: There is provided a photosensitive resin having at least three moieties in the backbone chain, two moieties of which moieties are an alicyclic group moiety and a sulfonyl moiety. The photosensitive resin has a superior solubility in solvents and a superior dry-etching resistance, and enables easy fabrication of highly integrated semiconductor devices.

Abstract: The present invention relates to a thermal line printer for a small recording terminals such as a terminal for POS (point of sales), a handy terminal, a measuring apparatus or the like, and also relates to a driving device for the thermal line printer. In the structure of a conventional thermal line printer, there is a limitation to the ability to decrease the dimension of depth in a situation where the downsizing of an apparatus is desired. By installing the thermal line printer in an upright state, the dimension of the depth can be decreased. However, in this configuration, the user cannot see the state of the printing because the recording paper falls down toward the user's side, due to the gravity, when the paper is ejected after printing.

Abstract: A photosensitive composition comprising a photoacid generator for forming an acid by exposing to far ultraviolet light, a pH indicator coloring so as to exhibit an absorption band at the i-line wavelength region in the presence of the acid, and an i-line photosensitizer chemically changing by exposing to the i-line; and methods for patterning and for manufacturing a semiconductor device using such a photosensitive composition. The photosensitive composition enables etching, fine pattern formation and semiconductor device manufacturing to simplify.

Abstract: The present invention relates to a thermal line printer for a small recording terminals such as a terminal for POS (point of sales), a handy terminal, a measuring apparatus or the like, and also relates to a driving device for the thermal line printer. In the structure of a conventional thermal line printer, there is a limitation to the ability to decrease the dimension of depth in a situation where the downsizing of an apparatus is desired. By installing the thermal line printer in an upright state, the dimension of the depth can be decreased. However, in this configuration, the user cannot see the state of the printing because the recording paper falls down toward the user's side, due to the gravity, when the paper is ejected after printing.

Abstract: A printing apparatus has a small size that facilitates replacement of rolled paper, removal of jammed paper, etc., and alleviates the likelihood of a paper jam with a considerably simple structure. The printing apparatus comprises a rolled-paper holder (2), which is provided with a first holder (2b) for use in carrying out printing on rolled paper (1), and a second holder (2a) for use in setting the rolled paper (1). The rolled paper (1) is moved from the second holder (2a) to the first holder (2b) as a main body of the apparatus is shifted from a paper setting position to a printing work position, thereby facilitating the setting of the rolled paper (1) and removal of jammed paper, since the rolled paper (1) can be temporarily supported by the second holder (2a) in order to provide sufficient work space when replacing the rolled paper (1) or removing jammed paper.

Abstract: A printing apparatus has a small size that facilitates replacement of rolled paper, removal of jammed paper, etc., and alleviates the likelihood of a paper jam with a considerably simple structure. The printing apparatus comprises a rolled-paper holder (2), which is provided with a first holder (2b) for use in carrying out printing on rolled paper (1), and a second holder (2a) for use in setting the rolled paper (1). The rolled paper (1) is moved from the second holder (2a) to the first holder (2b) as a main body of the apparatus is shifted from a paper setting position to a printing work position, thereby facilitating the setting of the rolled paper (1) and removal of jammed paper, since the rolled paper (1) can be temporarily supported by the second holder (2a) in order to provide sufficient work space when replacing the rolled paper (1) or removing jammed paper.

Abstract: Provided is a photosensitive resin with high sensitivity to exposure light. The photosensitive resin comprises a vinyl monomer moiety having an alicyclic group in a side chain thereof, and a sulfonyl moiety.