Patents by Inventor Keitaro Katabuchi

Keitaro Katabuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for fabricating a semiconductor device
    Patent number: 6787459
    Abstract: There is provided a method of fabricating a semiconductor device whereby fine patterns are formed with high dimensional accuracy by means of multiple exposures, using a phase shift mask and a trim mask. Phases are periodically assigned to shifter patterns within a given range from patterns generated with the phase shift mask, respectively.
    Type: Grant
    Filed: November 15, 2002
    Date of Patent: September 7, 2004
    Assignee: Renesas Technology Corp.
    Inventors: Akemi Moniwa, Takuya Hagiwara, Keitaro Katabuchi, Hiroshi Fukuda, Mineko Adachi
  • Method for fabricating a semiconductor device
    Publication number: 20030106037
    Abstract: There is provided a method of fabricating a semiconductor device whereby fine patterns are formed with high dimensional accuracy by means of multiple exposures, using a phase shift mask and a trim mask. Phases are periodically assigned to shifter patterns within a given range from patterns generated with the phase shift mask, respectively.
    Type: Application
    Filed: November 15, 2002
    Publication date: June 5, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Akemi Moniwa, Takuya Hagiwara, Keitaro Katabuchi, Hiroshi Fukuda, Mineko Adachi