Abstract: Wireless user device probe data can be used to infer or determine an attribute of a user. The probe data can be captured by a sensor device from probes from the user device. The probe data can include network addresses of the wireless access points to which the user device has wirelessly connected prior to attempting a current connection to a wireless access point. The probe data can also include connection information about wireless links between the user device and the wireless access points to which the user device has connected prior to attempting the current connection. The probe data and a user device identifier can be provided for comparing the probe data to access point network addresses associated with attributes to determine an attribute for a user of the user device.

Abstract: Wireless user device probe data can be used to infer or determine an attribute of a user. The probe data can be captured by a sensor device from probes from the user device. The probe data can include network addresses of the wireless access points to which the user device has wirelessly connected prior to attempting a current connection to a wireless access point. The probe data can also include connection information about wireless links between the user device and the wireless access points to which the user device has connected prior to attempting the current connection. The probe data and a user device identifier can be provided for comparing the probe data to access point network addresses associated with attributes to determine an attribute for a user of the user device.

Abstract: Wireless user device probe data can be used to infer or determine an attribute of a user. The probe data can be captured by a sensor device from probes wirelessly transmitted by the user device to search for wireless access points. The probe data can include network addresses of the wireless access points to which the user device has wirelessly connected. The probe data can also include connection information about wireless links between the user device and the wireless access points. The probe data and a user device identifier can be transmitted to a computing device that can compare the probe data to access point network addresses associated with attributes in an electronic data store to determine an attribute for a user of the user device.

Abstract: Wireless user device probe data can be used to infer or determine an attribute of a user. The probe data can be captured by a sensor device from probes wirelessly transmitted by the user device to search for wireless access points. The probe data can include network addresses of the wireless access points to which the user device has wirelessly connected. The probe data can also include connection information about wireless links between the user device and the wireless access points. The probe data and a user device identifier can be transmitted to a computing device that can compare the probe data to access point network addresses associated with attributes in an electronic data store to determine an attribute for a user of the user device.

Abstract: An elevated pressure and temperature fluid processing system providing a pressurized fluid delivery system including a process fluid supply system and pump for supplying a process fluid at a process pressure, and a process fluid heater for heating the process fluid; a process chamber with a process chamber heater; and a process discharge collection system. The system also provides a process chamber inflow valve for connecting the pressurized fluid delivery system to the process chamber for fluid flow, and a process chamber outflow valve for connecting the process chamber to the collection system for fluid flow. A process chamber bypass valve connects the pressurized fluid delivery system to the process discharge collection system so as to bypass the process chamber. A computer control system controls the pump, the process fluid heater, the chamber heater, and the valves.

Abstract: A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating speed and direction sensors and a home position locator facilitate motor control. Impellers add further agitation of the fluid in the chamber, faster processing, and greater uniformity of supercritical fluid components and increase mass transfer of fluid to the processed surface. Centrifugal operated clips and cassettes hold wafers and impellers. Non-contact, fluid operated rotating mechanisms reduce contamination. Physical, rotational, and shear affects are enhanced through centrifugal forces which can induce the separation of films localized deposits or molecular products of the reaction from the surface. There is a concomitant agitation of fluid, and continuous angular acceleration imparted to the processed surface features.

Abstract: Device for fluidic support and bi-directional rotation of an item in a process chamber where the operating fluid is compatible with the process. The device has a rotable load bearing platform with a load bearing interface between it and a base in the chamber. Fluid, which may be supercritical fluid, is applied through load bearing ports into the interface to fluidly support the weight and create rotational forces on the load platform. A turbine on the load platform is actuated by fluid flow directed from turbine ports in the chamber connected to the fluid source. Markers on the load platform and sensors in the chamber provide speed and direction sensing. An electromagnetic source in the chamber reacts with a permanent magnet in the rotable platform to provide an electromagnetic force for moving, or changing or holding the relative position of the load platform.

Abstract: A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.

Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.

Abstract: A method is disclosed for the introduction of at least one additive to a processes chamber, that method comprising: supplying a process fluid to the process chamber; introducing at least one co-solvent to the process fluid thereby forming a mixture of process fluid and co-solvent without the additive; allowing a concentration of the co-solvent relative to the process fluid at least within the process chamber to reach a level at which the sparingly soluble additive is soluble; adding a solution of the additive to the mixture of the process fluid and the co-solvent, and processing a workpiece in the fluid.

Abstract: A process of removing impurities from a cured low dielectric constant organic polymeric film disposed on a semiconductor device. The process involves disposing a low dielectric constant curable organic polymeric film on an electrically conductive surface of a semiconductor device. The organic polymeric film is cured on the semiconductor device and thereupon contacted with supercritical carbon dioxide, optionally in the presence of at least one cosolvent.

Abstract: A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating speed and direction sensors and a home position locator facilitate motor control. Impellers add further agitation of the fluid in the chamber, faster processing, and greater uniformity of supercritical fluid components and increase mass transfer of fluid to the processed surface. Centrifugal operated clips and cassettes hold wafers and impellers. Non-contact, fluid operated rotating mechanisms reduce contamination. Physical, rotational, and shear affects are enhanced through centrifugal forces which can induce the separation of films localized deposits or molecular products of the reaction from the surface. There is a concomitant agitation of fluid, and continuous angular acceleration imparted to the processed surface features.

Abstract: An elevated pressure and temperature fluid processing system providing a pressurized fluid delivery system including a process fluid supply system and pump for supplying a process fluid at a process pressure, and a process fluid heater for heating the process fluid; a process chamber with a process chamber heater; and a process discharge collection system. The system also provides a process chamber inflow valve for connecting the pressurized fluid delivery system to the process chamber for fluid flow, and a process chamber outflow valve for connecting the process chamber to the collection system for fluid flow. A process chamber bypass valve connects the pressurized fluid delivery system to the process discharge collection system so as to bypass the process chamber. A computer control system controls the pump, the process fluid heater, the chamber heater, and the valves.

Abstract: An apparatus and process for cleaning residual matter, photoresist and other foreign materials off wafers, substrates and semiconductor work pieces including photomasks, compact discs, flat panel displays using megasonic acoustic wave action techniques in conjunction with supercritical fluid cleaning processes, and in particular, for coupling megasonics techniques with supercritical carbon dioxide processing with co-solvents and surfactants, using cycles of soak, rapid decompression and flushing, to improve cleaning capability and to remove submicron particles from the surfaces of wafers.

Abstract: A CMP semiconductor wafer planarization method is provided employing an aqueous solution of a trialkanol amine as a wafer cleaning solution. Wafers are produced exhibiting a substantial reduction in semiconductor device failures as shown by a significant decrease in m.sub.1- m.sub.1 (metal to metal) shorts.

Abstract: An apparatus for connecting an integrated circuit, IC, device to a test system has a first circuit board on which the IC device is mounted. The circuit board has an analog transmission line interposed between and electrically isolated from digital transmission lines on opposed surfaces of the circuit board. The first circuit board is electrically connected to a second circuit board via coaxial probe assemblies disposed within apertures formed in a frame member mounted on the second circuit board. Each coaxial probe assembly has a connector disposed within one end of the aperture and a coaxial probe disposed with the other end. The connector and the probe head each have a cylindrical outer conductor electrically isolated from a central conductor. The cylindrical conductor and the central conductor of the connector are electrically connected to conductive runs on the second circuit board.