Abstract: Computer-based systems and methods for programmatically generating code, such as Structure Query Language (SQL) code to perform an operation on a database. A code generation engine, referred to herein as an Alchemy engine, receives a request in a first language, such as an XML-based language, and translates the request into a second language, such as an SQL-based language. The translation process utilizes information stored in a metadata database.

Abstract: Computer-based systems and methods for programmatically generating code, such as Structure Query Language (SQL) code, to perform an operation on a database. A code generation engine, referred to herein as an Alchemy engine, receives a request in a first language, such as an XML-based language, and translates the request into a second language, such as an SQL-based language. The translation process utilizes information stored in a metadata database.

Abstract: A combined hub temperature and wheel speed sensor system comprises a sensor assembly coupled to an axle and a wheel assembly fixedly coupled to the wheel, which in turn is free to rotate with respect to the axle. The wheel assembly includes a ring magnet. The sensor assembly includes a temperature sensor in proximity to the wheel bearing, Hall effect sensors positioned to detect the rotation of the ring magnet, and a circuit for generating and transmitting signals corresponding to the wheel rotation speed, rotation direction, and bearing temperature.

Abstract: A process for bulk micromachining a silicon wafer to form a silicon micromachined structure. The process involves the application of a protective film on one or more surfaces of the silicon wafer to protect metallization and circuitry on the wafer during the bulk micromachining process, during which a wet chemical etchant is employed to remove bulk silicon from a surface of the silicon wafer. The protective film is divinylsiloxane bisbenzocyclobutene (BCB), which has been found to be highly resistant to a wide variety of wet chemical etchants, and retains such resistant at elevated temperatures commonly preferred for bulk silicon etching. The degree to which this material is cured prior to etching is advantageously tailored to promote its resistance to the etchant and promote its adhesion to the silicon wafer.