Patents by Inventor Keith R. Miller

Keith R. Miller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200381815
    Abstract: In embodiments of the present disclosure, a housing for an antenna system having a plurality of antenna elements defining an antenna aperture includes: a chassis portion; and a radome portion configured for coupling to the chassis portion to define an inner chassis chamber. In some embodiments, the radome portion has a planar top surface. In other embodiments, the chassis portion has an internal support portion for internal components. In other embodiments, an antenna apparatus includes a mounting system for tiltably mounting the housing relative to a horizontal plane.
    Type: Application
    Filed: June 4, 2020
    Publication date: December 3, 2020
    Inventors: David Milroy, Duncan E. Adams, Keith R. Miller, Ersin Yetisir, Anthony Sims, Trevor Cameron, Andrea Papi
  • Patent number: 7786012
    Abstract: A semiconductor wafer edge exposure process as described herein employs a photoresist exposure step that exposes photoresist material to radiation having a gradient intensity profile near the outer edge of the wafer. The gradient intensity profile creates a tapered outer edge in the developed photoresist material, which in turn creates a tapered outer edge in the underlying target material after etching. Different gradient intensity profiles can also be used for subsequent layers of material. The resulting tapered edge profile of the wafer is resistant to edge peeling and flaking.
    Type: Grant
    Filed: March 12, 2007
    Date of Patent: August 31, 2010
    Assignee: GlobalFoundries Inc.
    Inventor: Keith R. Miller
  • Publication number: 20080227299
    Abstract: A semiconductor wafer edge exposure process as described herein employs a photoresist exposure step that exposes photoresist material to radiation having a gradient intensity profile near the outer edge of the wafer. The gradient intensity profile creates a tapered outer edge in the developed photoresist material, which in turn creates a tapered outer edge in the underlying target material after etching. Different gradient intensity profiles can also be used for subsequent layers of material. The resulting tapered edge profile of the wafer is resistant to edge peeling and flaking.
    Type: Application
    Filed: March 12, 2007
    Publication date: September 18, 2008
    Applicant: ADVANCED MICRO DEVICES, INC.
    Inventor: Keith R. MILLER
  • Patent number: 4953727
    Abstract: This invention concerns an end-of-car hydraulic cushioning device for use on rail cars and a method of repairing such devices. The cushioning device has a piston and shaft assembly which is subject to train action forces. The piston and shaft are connected by means of a threaded engagement which prevents relative axial movements between the two parts. Rotational movement of the piston on the shaft is prevented by a hardened steel pin disposed in aligned, radial holes formed in the piston and shaft. The pin and holes are sized to provide clearance between the piston and pin. This permits piston metal deformation to occur during high speed impacts without catastrophically stressing the steel pin. A filler rod retains the pin in the radial holes.
    Type: Grant
    Filed: July 3, 1989
    Date of Patent: September 4, 1990
    Assignee: Co-Ordinated Railway Services, Inc,
    Inventors: Howard E. Tonn, Robert Davidson, David B. Shultz, Keith R. Miller