Patents by Inventor Keith R. Pope
Keith R. Pope has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8828143Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: GrantFiled: October 2, 2007Date of Patent: September 9, 2014Assignee: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
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Publication number: 20130210235Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: ApplicationFiled: October 2, 2007Publication date: August 15, 2013Applicant: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
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Patent number: 8388758Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: GrantFiled: October 2, 2007Date of Patent: March 5, 2013Assignee: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
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Publication number: 20090235955Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: ApplicationFiled: October 2, 2007Publication date: September 24, 2009Applicant: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
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Patent number: 7332436Abstract: A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.Type: GrantFiled: October 15, 2004Date of Patent: February 19, 2008Assignee: International Business Machines CorporationInventors: John Michael Cotte, Dario L. Goldfarb, Pamela Jones, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
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Patent number: 7288155Abstract: A method for cleaning a semiconductor structure including providing a chamber for holding the semiconductor structure and a dense phase fluid, providing a thermal transfer device having a thermal transfer surface, connecting the thermal transfer device to the chamber, placing the semiconductor structure in the chamber in contact with the thermal transfer surface and thermally cycling the thermal transfer surface.Type: GrantFiled: May 12, 2005Date of Patent: October 30, 2007Assignee: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario Goldfarb
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Patent number: 7081208Abstract: Methods are provided for making microfilters by subtractive techniques which remove a component or part of a filter material to form pores in the filter material and additive techniques which deposit a filter material onto a porous underlying substrate. All the methods employ a supercritical fluid or mixture which have very high solvency properties and low viscosity and CO2 is the preferred supercritical fluid.Type: GrantFiled: December 16, 2002Date of Patent: July 25, 2006Assignee: International Business Machines CorporationInventors: Kenneth J McCullough, Wayne M Moreau, Keith R Pope, Robert J Purtell, John P Simons, William A Syverson, Charles J Taft
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Patent number: 6997197Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: GrantFiled: December 13, 2002Date of Patent: February 14, 2006Assignee: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
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Patent number: 6927393Abstract: A method and apparatus are provided for in situ monitoring and analyzing of process parameters for semiconductor fabrication processes including cleaning semiconductor wafers utilizing a supercritical fluid or a high pressure liquid such as CO2. The method and apparatus utilize a spectrometer having a reflective mirror proximate the vessel holding the high pressure fluid. NIR radiation transmitted into the vessel through a window and out of the vessel through an opposed window is reflected and detected and measured and the composition of the fluid in the pressure vessel is determined allowing the user to control process parameters based on the measured composition.Type: GrantFiled: December 16, 2002Date of Patent: August 9, 2005Assignee: International Business Machines CorporationInventors: John M. Cotte, Kenneth J. McCullough, Wayne M. Moreau, Keith R. Pope, Robert J. Purtell, John P. Simons, Charles J. Taft
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Patent number: 6890855Abstract: A process of removing residue from an etched precision surface. In this process the etched precision surface is contacted with a composition which includes liquid or supercritical carbon dioxide and a fluoride-generating species.Type: GrantFiled: June 27, 2001Date of Patent: May 10, 2005Assignee: International Business Machines CorporationInventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
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Patent number: 6838015Abstract: A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.Type: GrantFiled: September 4, 2001Date of Patent: January 4, 2005Assignee: International Business Machines CorporationInventors: John Michael Cotte, Dario L. Goldfarb, Pamela Jones, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
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Publication number: 20040112865Abstract: Methods are provided for making microfilters by subtractive techniques which remove a component or part of a filter material to form pores in the filter material and additive techniques which deposit a filter material onto a porous underlying substrate. All the methods employ a supercritical fluid or mixture which have very high solvency properties and low viscosity and CO2 is the preferred supercritical fluid.Type: ApplicationFiled: December 16, 2002Publication date: June 17, 2004Applicant: International Business Machines CorporationInventors: Kenneth J. McCullough, Wayne M. Moreau, Keith R. Pope, Robert J. Purtell, John P. Simons, William A. Syverson, Charles J. Taft
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Publication number: 20040112402Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: ApplicationFiled: December 13, 2002Publication date: June 17, 2004Inventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario Goldfarb
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Publication number: 20040113079Abstract: A method and apparatus are provided for in situ monitoring and analyzing of process parameters for semiconductor fabrication processes including cleaning semiconductor wafers utilizing a supercritical fluid or a high pressure liquid such as CO2. The method and apparatus utilize a spectrometer having a reflective mirror proximate the vessel holding the high pressure fluid. NIR radiation transmitted into the vessel through a window and out of the vessel through an opposed window is reflected and detected and measured and the composition of the fluid in the pressure vessel is determined allowing the user to control process parameters based on the measured composition.Type: ApplicationFiled: December 16, 2002Publication date: June 17, 2004Applicant: International Business Machines CorporationInventors: John M. Cotte, Kenneth J. McCullough, Wayne M. Moreau, Keith R. Pope, Robert J. Purtell, John P. Simons, Charles J. Taft
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Patent number: 6739346Abstract: A process and apparatus for cleaning filters prior to recycling or disposal. In this process and apparatus liquid or supercritical carbon dioxide contacts the plugged pores of a filter under conditions in which carbon dioxide remains in the liquid or supercritical state.Type: GrantFiled: July 29, 2002Date of Patent: May 25, 2004Assignee: International Business Machines CorporationInventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
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Patent number: 6736906Abstract: A workpiece holder for processing a workpiece in a chamber of a liquified fluid. In one embodiment, the workpiece holder includes a cylindrically shaped rotator having an exterior wall and at least one fluid guide on the exterior wall. The rotator is adapted to rotate and provide fluid flow across a first end of the rotator, and is adapted to provide fluid flow and mixing perpendicular to a surface of the first end of the rotator. A fixture is coupled to the first end of the rotator for securing the workpiece to the first end of the rotator.Type: GrantFiled: April 10, 2002Date of Patent: May 18, 2004Assignee: International Business Machines CorporationInventors: John M. Cotte, Matteo Flotta, Kenneth J. McCullough, Wayne M. Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
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Patent number: 6683008Abstract: A process of removing photoresist, previously subjected to ion implantation, from the surface of a workpiece. The process involves contacting the workpiece with a composition which includes liquid or supercritical carbon dioxide and between about 2% and about 20% of an alkanol having the structural formula CxX2x+1OH, where X is fluorine, hydrogen or mixtures thereof; and x is an integer of 1 to 8, said percentages being by volume, based on the total weight of the composition.Type: GrantFiled: November 19, 2002Date of Patent: January 27, 2004Assignee: International Business Machines CorporationInventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
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Patent number: 6653233Abstract: A process of providing a semiconductor device with electrical interconnection capability wherein a sacrificial material is introduced into topographical features of the semiconductor device prior to chemical mechanical polishing so that debris formed during chemical mechanical polishing is incapable of falling into topographical features present on the semiconductor device. The sacrificial material is thereupon removed by liquid or supercritical carbon dioxide.Type: GrantFiled: June 27, 2001Date of Patent: November 25, 2003Assignee: International Business Machines CorporationInventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft, Richard P. Volant
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Process and apparatus for contacting a precision surface with liquid or supercritical carbon dioxide
Publication number: 20030196679Abstract: A process and apparatus for the processing of a precision surface. The process and apparatus includes contacting of a precision surface in a process chamber with liquid or supercritical carbon dioxide in which sonic waves are generated.Type: ApplicationFiled: April 18, 2002Publication date: October 23, 2003Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: John Michael Cotte, Emily E. Fisch, Kenneth John McCullough, Wayne Martin Moreau, Harald Okorn-Schmidt, Keith R. Pope, John P. Simons, William A. Syverson, Charles J. Taft -
Publication number: 20030192575Abstract: A workpiece holder for processing a workpiece in a chamber of a liquified fluid. In one embodiment, the workpiece holder includes a cylindrically shaped rotator having an exterior wall and at least one fluid guide on the exterior wall. The rotator is adapted to rotate and provide fluid flow across a first end of the rotator, and is adapted to provide fluid flow and mixing perpendicular to a surface of the first end of the rotator. A fixture is coupled to the first end of the rotator for securing the workpiece to the first end of the rotator.Type: ApplicationFiled: April 10, 2002Publication date: October 16, 2003Inventors: John M. Cotte, Matteo Flotta, Kenneth J. McCullough, Wayne M. Moreau, Keith R. Pope, John P. Simons, Charles J. Taft