Patents by Inventor Keizo Ishii

Keizo Ishii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8785865
    Abstract: A semiconductor 2D position detector for two-dimensionally detecting positions of radiation is a Schottky diode comprising: a semiconductor substrate 2; a first to an nth (n is an integer of 2 or higher) stripe electrodes 3 arranged on the surface 2A of the semiconductor substrate 2 at given intervals in the X direction and in parallel to the Y direction; and an electrode 15 formed on the rear surface 2B of the semiconductor substrate 2. The top and the bottom ends of each of the stripe electrodes 3 are sequentially connected via a resistor 4, 5, and signals V1 to V4 output from the radiation 16 applied to the semiconductor substrate 2 are obtained from each of the both ends of the first and the nth stripe electrodes placed far left and right.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: July 22, 2014
    Assignee: Tohoku University
    Inventors: Keizo Ishii, Youhei Kikuchi
  • Publication number: 20110284754
    Abstract: A semiconductor 2D position detector for two-dimensionally detecting positions of radiation is a Schottky diode comprising: a semiconductor substrate 2; a first to an nth (n is an integer of 2 or higher) stripe electrodes 3 arranged on the surface 2A of the semiconductor substrate 2 at given intervals in the X direction and in parallel to the Y direction; and an electrode 15 formed on the rear surface 2B of the semiconductor substrate 2. The top and the bottom ends of each of the stripe electrodes 3 are sequentially connected via a resistor 4, 5, and signals V1 to V4 output from the radiation 16 applied to the semiconductor substrate 2 are obtained from each of the both ends of the first and the nth stripe electrodes placed far left and right.
    Type: Application
    Filed: December 3, 2009
    Publication date: November 24, 2011
    Applicant: TOHOKU UNIVERSITY
    Inventors: Keizo Ishii, Youhei Kikuchi
  • Publication number: 20110042575
    Abstract: A disclosed semiconductor detector block includes a plurality of semiconductor plates each configured to have a front surface on which an electrically resistive electrode is formed and a back surface on which an electrically conductive electrode is formed and to detect a two-dimensional detection position of gamma rays on the semiconductor plates using a ratio of electric signals from four corners of the electrically resistive electrode, wherein the plurality of semiconductor plates are piled up and a three-dimensional detection position of the gamma rays is detectable using a ratio of the electric signals from the four corners of the electrically resistive electrodes.
    Type: Application
    Filed: April 24, 2008
    Publication date: February 24, 2011
    Applicant: SUMITOMO HEAVY INDUSTRIES, LTD.
    Inventors: Keizo Ishii, Youhei Kikuchi, Shigeo Matsuyama, Hiromichi Yamazaki
  • Publication number: 20080167425
    Abstract: It is an object of the present invention to provide a composition containing a hydrolysate of organosilicate which can be stored stably for long term in spite of containing a large amount of water. A composition containing a hydrolysate of organosilicate, a water-soluble and volatile stabilizer and water, wherein the content of water is 30% by weight or more of the whole composition.
    Type: Application
    Filed: June 10, 2005
    Publication date: July 10, 2008
    Applicant: NIPPON PAINT CO., LTD.
    Inventors: Hiroshi Tominaga, Isamu Onishi, Naoki Yamamori, Keizo Ishii
  • Patent number: 5302654
    Abstract: Polymer microparticles having immobilized therein a water-insoluble substance such as oil-soluble dyes or pigments are produced by a method which includes the steps of forming droplets of a solution of a self-emulsifiable resin in a nonaqueous solvent containing the water-insoluble substance and an ethylenically unsaturated monomer suspended in an aqueous medium, and then allowing the monomer in the droplets to polymerize in situ.
    Type: Grant
    Filed: March 2, 1993
    Date of Patent: April 12, 1994
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Keizo Ishii, Hidetsumu Okada, Masanori Oiwa, Hisaichi Muramoto, Shinichi Ishikura
  • Patent number: 4403065
    Abstract: An aqueous emulsion comprising a polymeric resin prepared by polymerizing (a) at least one amino acid of either one of the formula: ##STR1## and the formula: ##STR2## with (b) at least one other polymerizable monomer in an aqueous medium, the component (a) and at least a portion of the component (b) being introduced separately into the reaction system.
    Type: Grant
    Filed: October 15, 1980
    Date of Patent: September 6, 1983
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Tamotsu Yoshioka, Ryuzo Mizuguchi, Shinichi Ishikura, Keizo Ishii
  • Patent number: 4322324
    Abstract: An alkyd resin containing ampho-ionic groups of the formula: ##STR1## wherein A is a C.sub.1 -C.sub.6 alkylene or a phenylene group, is disclosed. Said resin is prepared by reacting a polyol, a polybasic acid and an ampho-ionic compound of the formula: ##STR2## wherein A is as defined above, R.sub.1 is a hydroxyalkyl, R.sub.2 and R.sub.3 are H or alkyl optionally containing sulfo and/or hydroxyl group.
    Type: Grant
    Filed: November 20, 1980
    Date of Patent: March 30, 1982
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Ryuzo Mizuguchi, Shin-ichi Ishikura, Keizo Ishii