Patents by Inventor Keizo Kimura

Keizo Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160291461
    Abstract: There are provided a pattern forming method in which, in self-organization lithography using a graphoepitaxy method, high miniaturization of patterns can be achieved with high quality and high efficiency by a pattern forming method including (i) a step of forming a block copolymer layer containing a specific first block copolymer or a specific second block copolymer on a specific substrate, (ii) a step of phase-separating the block copolymer layer, and (iii) a step of selectively removing at least one phase of a plurality of phases of the block copolymer layer, an electronic device manufacturing method using the pattern forming method and the electronic device, and a block copolymer used in the pattern forming method and the production method thereof.
    Type: Application
    Filed: June 3, 2016
    Publication date: October 6, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Hayato YOSHIDA, Hiroo TAKIZAWA, Keizo KIMURA, Shoichi SAITOH, Eriko MITANI
  • Patent number: 9424998
    Abstract: A dye, having a structure represented by formula (1A): wherein A represents a group of atoms necessary for forming a ring together with the carbon-nitrogen bond; at least one of Y1A and Y2A represents an acidic group, in which when they each represent an acidic group, they may be the same as or different from each other, or when only one of them represents an acidic group, the other represents an electron-withdrawing group; D represents a group to give a dye; n represents an integer of 1 or greater; L represents a single bond or a divalent linking group; and Y3A represents an acidic group.
    Type: Grant
    Filed: December 20, 2013
    Date of Patent: August 23, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Katsumi Kobayashi, Keizo Kimura, Tatsuya Susuki, Hirotaka Satou, Yukio Tani
  • Patent number: 9419318
    Abstract: A method of producing a photoelectric conversion element, which contains an electrically conductive support, a photosensitive layer having porous semiconductor fine particles that have adsorbed a dye formed on the support, a charge transfer layer; and a counter electrode; containing the steps of: applying a dispersion liquid, in which the content of solids excluding semiconductor fine particles is 1% by mass or less based on the total amount of the dispersion liquid, on the support, to form a coating; heating the coating, to obtain porous semiconductor fine particles; and sensitizing the porous semiconductor fine particles by a dye having a structure represented by Formula (1): M(LL1)m1(LL2)m2(X)m3·CI??Formula (1) wherein M represents a metal atom, LL1, LL2, and X each are a ligand, CI represents a counter ion, m1 represents an integer of 1 to 3, m2 and m3 each represent an integer of 0 to 2.
    Type: Grant
    Filed: March 22, 2011
    Date of Patent: August 16, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Katsumi Kobayashi, Keizo Kimura
  • Patent number: 8975314
    Abstract: There is provided a new triazine-based compound which is useful as an ultraviolet absorber having excellent light resistance, heat resistance and ultraviolet ray shielding effect. A compound represented by the following general formula (1), in the general formula (1), L1 represents a divalent to decavalent aromatic ring residue or a divalent to decavalent heterocycle residue, n1 represents an integer of 2 to 10, X1 represents a hydrogen atom or a substituent, R1a, R1b, R1c and R1d each independently represent a hydrogen atom or a substituent and may be bonded to each other to form a ring.
    Type: Grant
    Filed: March 28, 2014
    Date of Patent: March 10, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Ichiro Amasaki, Keizo Kimura
  • Patent number: 8957140
    Abstract: To provide a novel triazine-based compound exhibiting an ultraviolet blocking effect even in the long-wavelength region and being useful as an ultraviolet absorber with excellent light resistance, and to provide an ultraviolet absorber and a resin composition, which can maintain a long-wavelength ultraviolet-blocking effect for a long period of time. A compound represented by the following formula (1): wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent excluding OH, provided that at least one substituent represents a substituent having a Hammett's ?p value of 0.3 or more and substituents may combine with each other to form a ring, and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, provided that substituents may combine with each other to form a ring.
    Type: Grant
    Filed: July 28, 2010
    Date of Patent: February 17, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Ichiro Amasaki, Keizo Kimura, Yukie Watanabe, Kyosuke Tsumura, Hiroshi Yokoyama, Takumi Nakamura
  • Publication number: 20140213704
    Abstract: A compound represented by the following general formula (1), in the general formula (1), X1a and X1b represent a hydrogen atom or a substituent, Y1 represents a substituent having a dissociative proton, Z1a and Z1b each independently represent heteroatom or a carbon atom, Q1 represents an atomic group which is required to form an aromatic heterocycle together with Z1a and Z1b.
    Type: Application
    Filed: March 28, 2014
    Publication date: July 31, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Ichiro AMASAKI, Keizo KIMURA
  • Publication number: 20140213703
    Abstract: There is provided a new triazine-based compound which is useful as an ultraviolet absorber having excellent light resistance, heat resistance and ultraviolet ray shielding effect. A compound represented by the following general formula (1), in the general formula (1), L1 represents a divalent to decavalent aromatic ring residue or a divalent to decavalent heterocycle residue, n1 represents an integer of 2 to 10, X1 represents a hydrogen atom or a substituent, R1a, R1b, R1c and R1d each independently represent a hydrogen atom or a substituent and may be bonded to each other to form a ring.
    Type: Application
    Filed: March 28, 2014
    Publication date: July 31, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Ichiro AMASAKI, Keizo KIMURA
  • Patent number: 8779126
    Abstract: A dye, having a structure represented by formula (1A): wherein A represents a group of atoms necessary for forming a ring together with the carbon-nitrogen bond; at least one of Y1A and Y2A represents an acidic group, in which when they each represent an acidic group, they may be the same as or different from each other, or when only one of them represents an acidic group, the other represents an electron-withdrawing group; D represents a group to give a dye; n represents an integer of 1 or greater; L represents a single bond or a divalent linking group; and Y3A represents an acidic group.
    Type: Grant
    Filed: October 29, 2009
    Date of Patent: July 15, 2014
    Assignee: Fujifilm Corporation
    Inventors: Katsumi Kobayashi, Keizo Kimura, Tatsuya Susuki, Hirotaka Satou, Yukio Tani
  • Patent number: 8748520
    Abstract: A polycarbonate resin composition comprising a compound represented by the following formula (1): wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent provided that OH is excluded, at least one of the substituents represents a substituent having a Hammett's ?p value of 0.3 or more, and the substituents may be combined each other to form a ring; and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, and the substituents may be combined each other to form a ring.
    Type: Grant
    Filed: September 27, 2010
    Date of Patent: June 10, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Takashi Kitagawa, Ichiro Amasaki, Yukie Watanabe, Keizo Kimura
  • Patent number: 8742108
    Abstract: A light-emitting material comprises iridium and at least one ligand represented by the following formula: wherein R11 and R12 each represents an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, a cyano group or a cyclic structure obtained by connection of one of a plurality of R11s to another of said plurality of R11s, or one of a plurality of R12s to another of said plurality of R12s, or one of the R11s to one of the R12s; m1 represents an integer from 0 to 4; m2 represents an integer from 0 to 6.
    Type: Grant
    Filed: August 10, 2012
    Date of Patent: June 3, 2014
    Assignee: UDC Ireland Limited
    Inventors: Tatsuya Igarashi, Keizo Kimura, Kazumi Nii
  • Publication number: 20140102540
    Abstract: A dye, having a structure represented by formula (1A): wherein A represents a group of atoms necessary for forming a ring together with the carbon-nitrogen bond; at least one of Y1A and Y2A represents an acidic group, in which when they each represent an acidic group, they may be the same as or different from each other, or when only one of them represents an acidic group, the other represents an electron-withdrawing group; D represents a group to give a dye; n represents an integer of 1 or greater; L represents a single bond or a divalent linking group; and Y3A represents an acidic group.
    Type: Application
    Filed: December 20, 2013
    Publication date: April 17, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Katsumi KOBAYASHI, Keizo KIMURA, Tatsuya SUSUKI, Hirotaka SATOU, Yukio TANI
  • Patent number: 8647708
    Abstract: A method of producing a photoelectric conversion element, which the element contains an electrically conductive support, a photosensitive layer having porous semiconductor fine particles, a charge transfer layer; and a counter electrode; containing the steps of: applying a semiconductor fine particle dispersion liquid, in which the content of solids excluding semiconductor fine particles is 10% by mass or less based on the total amount of the dispersion liquid, on the support, to form a coating; heating the coating, to obtain porous semiconductor fine particles; and sensitizing the porous particles by adsorption of the following dye: wherein X represents a group of non-metallic atoms necessary for forming a 7-membered ring; Y represents a dye residue; n represents an integer of 1 or more; Z represents a substituent; m represents 0 or a positive integer; and R1 represents a hydrogen atom or a specific substituent.
    Type: Grant
    Filed: September 24, 2010
    Date of Patent: February 11, 2014
    Assignee: Fujifilm Corporation
    Inventors: Katsumi Kobayashi, Hirotaka Satou, Keizo Kimura
  • Patent number: 8623990
    Abstract: To provide a polyester resin composition being able to maintain a long-wavelength ultraviolet-blocking effect for a long period of time, ensuring high solubility for a solvent, and having excellent light resistance. A polyester resin composition comprising a compound represented by the following formula (1) and a polyester resin: wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent excluding OH, at least one of the substituents represents a substituent having a positive Hammett's ?p value, and the substituents may combine with each other to form a ring; and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, and the substituents may combine with each other to form a ring.
    Type: Grant
    Filed: January 13, 2011
    Date of Patent: January 7, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Yukie Watanabe, Ichiro Amasaki, Keizo Kimura, Youichi Nagai
  • Patent number: 8608842
    Abstract: An infrared absorbing composition including a compound that is represented by formula (1) and has solubility of 30 mg/mL or less in toluene at 25° C., an organic solvent having a solubility parameter of from 7.3 to 12.1, and a resin is disclosed. In formula (1), each of R1 to R16 independently represents a hydrogen atom or a substituent group, provided that at least one of R1 to R16 represents an R17—X— group or that the compound represented by formula (1) contains at least one condensed-ring structure in which any adjacent two of R1 to R16 form a ring; X represents —S—, —NH—, —NR18—, or —O—; each of R17 and R18 independently represents an aliphatic group or an aryl group; and M represents two atoms selected from the group consisting of hydrogen atoms and monovalent metal atoms, or a divalent metal atom, or a divalent substituted metal atom moiety including a trivalent or tetravalent metal atom and a substituent group.
    Type: Grant
    Filed: May 12, 2011
    Date of Patent: December 17, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Katsumi Kobayashi, Keizo Kimura
  • Patent number: 8574463
    Abstract: A metal complex dye, containing a ligand LL1 having a structure represented by Formula (I): wherein R1 and R2 represent a specific substituent; L1 and L2 represent a group composed of at least one kind of group selected from the group consisting of an ethenylene group, an ethynylene group and an arylene group, and conjugate with R1 or R2, and the bipyridine; the ethenylene group and the arylene group may be substituted or unsubstituted; R3 and R4 represent a substituent; n1 and n2 represent an integer of 0 to 3; A1 and A2 represent an acidic group or a salt thereof; and n3 and n4 represent an integer of 0 to 3.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: November 5, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Yukio Tani, Tatsuya Susuki, Katsumi Kobayashi, Keizo Kimura
  • Patent number: 8541488
    Abstract: A formed resin article, containing a compound and a polymer substance, wherein the compound has a maximum absorption wavelength in a range of 400 nm or less, measured in a solution of the compound, wherein the compound is contained in the polymer substance in a quantity of 5 g/m2 or less, and wherein a light transmittance of the article at a wavelength of 410 nm is 5% or less.
    Type: Grant
    Filed: March 24, 2009
    Date of Patent: September 24, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Ichiro Amasaki, Keizo Kimura, Youichiro Takeshima
  • Publication number: 20120305905
    Abstract: A method of producing a photoelectric conversion element, which contains an electrically conductive support, a photosensitive layer having porous semiconductor fine particles that have adsorbed a dye formed on the support, a charge transfer layer; and a counter electrode; containing the steps of: applying a dispersion liquid, in which the content of solids excluding semiconductor fine particles is 1% by mass or less based on the total amount of the dispersion liquid, on the support, to form a coating; heating the coating, to obtain porous semiconductor fine particles; and sensitizing the porous semiconductor fine particles by a dye having a structure represented by Formula (1): M(LL1)m1(LL2)m2(X)m3·CI??Formula (1) wherein M represents a metal atom, LL1, LL2, and X each are a ligand, CI represents a counter ion, m1 represents an integer of 1 to 3, m2 and m3 each represent an integer of 0 to 2.
    Type: Application
    Filed: March 21, 2011
    Publication date: December 6, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Katsumi Kobayashi, Keizo Kimura
  • Publication number: 20120309967
    Abstract: A light-emitting material comprises iridium and at least one ligand represented by the following formula: wherein R11 and R12 each represents an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, a cyano group or a cyclic structure obtained by connection of one of a plurality of R11s to another of said plurality of R11s, or one of a plurality of R12s to another of said plurality of R12s, or one of the R11s to one of the R12s; m1 represents an integer from 0 to 4; m2 represents an integer from 0 to 6.
    Type: Application
    Filed: August 10, 2012
    Publication date: December 6, 2012
    Applicant: FUJIFILM Corporation
    Inventors: Tatsuya Igarashi, Keizo Kimura, Kazumi Nii
  • Publication number: 20120301696
    Abstract: To provide a polyester resin composition being able to maintain a long-wavelength ultraviolet-blocking effect for a long period of time, ensuring high solubility for a solvent, and having excellent light resistance. A polyester resin composition comprising a compound represented by the following formula (1) and a polyester resin: wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent excluding OH, at least one of the substituents represents a substituent having a positive Hammett's ?p value, and the substituents may combine with each other to form a ring; and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, and the substituents may combine with each other to form a ring.
    Type: Application
    Filed: January 13, 2011
    Publication date: November 29, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Yukie Watanabe, Ichiro Amasaki, Keizo Kimura, Youichi Nagai
  • Patent number: 8304538
    Abstract: A method of producing a compound represented by Formula (I), which comprises a step A of reacting an anthranilic acid compound with a carboxylic halide in the absence of a base, but does not comprise a step of isolating of an amide intermediate compound represented by Formula (II): wherein R1 represents a substituent; n1 is an integer of 0 to 4; R2 represents an n2-valent substituent or a linking group; and n2 is an integer of 1 to 4.
    Type: Grant
    Filed: September 25, 2008
    Date of Patent: November 6, 2012
    Assignee: FUJIFILM Corporation
    Inventors: Keizo Kimura, Takashi Kitagawa, Osamu Uchida