Patents by Inventor Keizo Ogihara

Keizo Ogihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Functional polymers derived from polyamines and process for producing the same
    Patent number: 4778725
    Abstract: A functional resin derived from a polyallylamine or polyvinylamine and having unsaturated C.dbd.C bonds such as allyl groups at terminals of side chains has good coating properties and strong adhesiveness to a substrate, thus can be used as protective films for various substrates, coating compositions and adhesives.
    Type: Grant
    Filed: April 27, 1987
    Date of Patent: October 18, 1988
    Assignee: Nitto Boseki Co., Ltd.
    Inventors: Hajime Serizawa, Koichi Ojima, Keizo Ogihara, Kiyoshi Shimizu
  • Process for producing novel photosensitive resins
    Patent number: 4701497
    Abstract: A process for producing a novel photosensitive resin having cinnamic groups, comprising reacting a polyallylamine represented by the general formula (I) ##STR1## (wherein n is at least 10) or an inorganic acid salt thereof with a compound having a cinnamic group in the presence of a solvent. The process is free from drawbacks as experienced in the production of a conventional photosensitive resin (e.g. polyvinyl cinnamate), such as formation of by-products during the polymerization of a monomer (e.g. vinyl cinnamate).
    Type: Grant
    Filed: July 3, 1986
    Date of Patent: October 20, 1987
    Assignee: Nitto Boseki Co., Limited
    Inventors: Hajime Serizawa, Keizo Ogihara, Kiyoshi Shimizu, Susumu Harada
  • Process for acylation with novel acylating agent
    Patent number: 4559172
    Abstract: This invention relates to a novel acylation process which comprises using as the acylating agent an o-hydroxy-substituted aromatic oxime ester represented by the general formula (I) ##STR1## and mixing said acylating agent with an amine substance represented by the general formula (III) ##STR2## to form a compound represented by the general formula (IV) ##STR3##
    Type: Grant
    Filed: May 1, 1984
    Date of Patent: December 17, 1985
    Assignee: Nitto Boseki
    Inventors: Ikuo Hayashi, Keizo Ogihara, Tadao Itikawa, Kiyoshi Shimizu
  • Process for producing sequential polyamino acid resin
    Patent number: 4525576
    Abstract: A sequential polyamino acid resin having a remarkably high molecular weight and special amino acid sequence as repeating unit in the resin can be produced by conducting polycondensation of a dipeptide active ester acid salt in an aprotic polar solvent in the presence of a tertiary amine and phosphorus pentoxide.
    Type: Grant
    Filed: October 15, 1984
    Date of Patent: June 25, 1985
    Assignee: Nitto Boseki Co. Ltd.
    Inventors: Ikuo Hayashi, Tadao Itikawa, Keizo Ogihara, Kiyoshi Shimizu