Patents by Inventor Kejian Huang

Kejian Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RETROREFLECTIVE SHEETING
    Publication number: 20070071932
    Abstract: Retroreflective sheeting (10) comprising a retroreflecting layer (12), which has an array of retroreflective elements (34) formed thereon, and a divergence-enhancing layer (14) which is positioned in front of the retroreflecting layer (12). The divergence-enhancing layer (14) has localized aberration regions (42) which change the divergence of light traveling therethrough. The placement of the localized aberration regions (42) relative to the retroreflective elements (34) broadens the divergence range of the sheeting (10).
    Type: Application
    Filed: July 20, 2006
    Publication date: March 29, 2007
    Inventor: Kejian Huang
  • Retroreflector with controlled divergence made by the method of localized substrate stress
    Patent number: 7168814
    Abstract: A cube corner array with minute modifications of the dihedral angles of some of the cube corners is produced by introducing a stress or change via the opposite side of the substrate. The array having aberrated elements can be replicated for use in the manufacture of a tool, and the tool can be used in the manufacture of retroreflective products of broader divergence.
    Type: Grant
    Filed: February 8, 2006
    Date of Patent: January 30, 2007
    Assignee: Avery Dennison Corporation
    Inventors: Dennis I. Couzin, Steven R. Chapman, Kejian Huang
  • Retroreflector with controlled divergence made by the method of localized substrate stress
    Publication number: 20060132918
    Abstract: A cube corner array with minute modifications of the dihedral angles of some of the cube corners is produced by introducing a stress or change via the opposite side of the substrate. The array having aberrated elements can be replicated for use in the manufacture of a tool, and the tool can be used in the manufacture of retroreflective products of broader divergence.
    Type: Application
    Filed: February 8, 2006
    Publication date: June 22, 2006
    Inventors: Dennis Couzin, Steven Chapman, Kejian Huang
  • Retroreflector with controlled divergence made by the method of localized substrate stress
    Patent number: 7029134
    Abstract: A cube corner array with minute modifications of the dihedral angles of some of the cube corners is produced by introducing a stress or change via the opposite side of the substrate. The array having aberrated elements can be replicated for use in the manufacture of a tool, and the tool can be used in the manufacture of retroreflective products of broader divergence.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: April 18, 2006
    Assignee: Avery Dennison Corporation
    Inventors: Dennis I. Couzin, Steven R. Chapman, Kejian Huang
  • Retroreflector with controlled divergence made by the method of localized substrate stress
    Publication number: 20050243419
    Abstract: A cube corner array with minute modifications of the dihedral angles of some of the cube corners is produced by introducing a stress or change via the opposite side of the substrate. The array having aberrated elements can be replicated for use in the manufacture of a tool, and the tool can be used in the manufacture of retroreflective products of broader divergence.
    Type: Application
    Filed: March 29, 2005
    Publication date: November 3, 2005
    Inventors: Dennis Couzin, Steven Chapman, Kejian Huang
  • Method of making microneedles
    Publication number: 20050178760
    Abstract: A method of making a microneedle array structure (20) comprising a plurality of simultaneously formed microneedles (24), each microneedle (24) having a protrusion (32) and a passageway (34) extending therethrough. The method comprises the steps of pressing an embossable sheet material between a complimentary tools and radiantly heating the sheet material using radiant energy from a radiant energy source. One tool is relatively-radiantly-transparent, and another tool and/or the sheet material is relatively-radiantly-absorptive.
    Type: Application
    Filed: February 3, 2005
    Publication date: August 18, 2005
    Inventors: Eng-Pi Chang, Philip Chu, Hsiao Chuang, Kejian Huang, Michael Lang, Reza Mehrabi, Ronald Sieloff, Karen Spilizewski, Mark Wisniewski
  • Retroreflector with controlled divergence made by the method of localized substrate stress
    Patent number: 6871966
    Abstract: A cube corner array with minute modifications of the dihedral angles of some of the cube corners is produced by introducing a stress or change via the opposite side of the substrate. The array having aberrated elements can be replicated for use in the manufacture of a tool, and the tool can be used in the manufacture of retroreflective products of broader divergence.
    Type: Grant
    Filed: December 12, 2002
    Date of Patent: March 29, 2005
    Assignee: Avery Dennison Corporation
    Inventors: Dennis I. Couzin, Steven R. Chapman, Kejian Huang
  • Retroreflector with controlled divergence made by the method of localized substrate stress
    Publication number: 20040114243
    Abstract: A cube corner array with minute modifications of the dihedral angles of some of the cube corners is produced by introducing a stress or change via the opposite side of the substrate. The array having aberrated elements can be replicated for use in the manufacture of a tool, and the tool can be used in the manufacture of retroreflective products of broader divergence.
    Type: Application
    Filed: December 12, 2002
    Publication date: June 17, 2004
    Inventors: Dennis I. Couzin, Steven R. Chapman, Kejian Huang