Patents by Inventor Kejun WU

Kejun WU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240109895
    Abstract: An oxaspiro substituted pyrrolopyrazole derivative, an intermediate thereof, and a preparation method therefor.
    Type: Application
    Filed: December 29, 2021
    Publication date: April 4, 2024
    Applicants: SHANGHAI HAIYAN PHARMACEUTICAL TECHNOLOGY CO., LTD., YANGTZE RIVER PHARMACEUTICAL GROUP CO., LTD.
    Inventors: Zhenya ZENG, Chao KAN, Qingfu GAO, Yixiao FENG, Bo WU, Xingsong ZHANG, Youhong MA, Kejun SUN
  • Publication number: 20240087185
    Abstract: A virtual view drawing method, a rendering method and apparatus, and a decoding method are provided. A first visibility map and a first texture map of a target view are generated. Region segmentation is performed on the first texture map to obtain a region segmentation result. A parameter representing segmentation performance is determined according to the region segmentation result. Region re-segmentation is performed on the first texture map when the parameter representing segmentation performance does not satisfy a first condition, to obtain a final region segmentation of the first texture map. Pixels to-be-updated in a region in the first visibility map are updated according to the final region segmentation result of the first texture map, to obtain a second visibility map. The second visibility map is shaded to obtain a second texture map of the target view.
    Type: Application
    Filed: November 14, 2023
    Publication date: March 14, 2024
    Inventors: You YANG, Yongquan SU, Qiong LIU, Kejun WU
  • Publication number: 20240077880
    Abstract: A slope location correction method, comprising the following steps: measuring location data, in a predetermined area, of a robot by using an inertial measurement element of the robot, and calculating a pose of the robot in the predetermined area according to the location data: determining whether there is a slope in the predetermined area by means of the pose of the robot; and if it is determined that there is a slope in the predetermined area, compensating for a location error at the slope by using the pose corresponding to the slope. The present application further relates to a slope location correction apparatus, a robot and a readable storage medium.
    Type: Application
    Filed: January 21, 2022
    Publication date: March 7, 2024
    Inventors: Jinlong WU, Tao ZHANG, Kejun HE, Meiwen CHEN
  • Publication number: 20230343017
    Abstract: A method for generating a virtual view includes generating an initial visibility map of a target view according to a depth map of a source view; segmenting the initial visibility map to obtain segmentation regions; identifying target pixels in the segmentation region according to a quantity relationship of two categories of pixels in the segmentation region of the initial visibility map; updating pixel values of the target pixels in the segmentation region of the initial visibility map to obtain a first visibility map of the target view; and processing the first visibility map of the target view to obtain a target texture map of the target view.
    Type: Application
    Filed: June 30, 2023
    Publication date: October 26, 2023
    Inventors: You YANG, Yongquan SU, Qiong LIU, Kejun WU, Ruichen ZHANG
  • Publication number: 20230316464
    Abstract: A virtual view drawing method and apparatus, a rendering method and apparatus, and a decoding method and apparatus, and devices and a storage medium are provided. The virtual view drawing method comprises: generating an initial visibility map of a target view according to reconstructed depth maps of source views; performing quality improvement processing on the initial visibility map to obtain a target visibility map of the target view; and coloring the target visibility map of the target view to obtain a target texture map of the target view.
    Type: Application
    Filed: June 9, 2023
    Publication date: October 5, 2023
    Inventors: You YANG, Yongquan SU, Qiong LIU, Kejun WU, Ze CHEN
  • Publication number: 20230019023
    Abstract: A sulfur-containing compound and a halogenated aromatic compound are used as raw materials, with an alkaline compound and a fatty acid as polycondensation aids to carry out a polycondensation reaction. After purification treatment, a primary polyphenylene sulfide is obtained which then reacts with a chain extender at high temperature to form a high molecular weight polyphenylene sulfide resin. A preparation method has the advantages of being high yield, low cost, and capable of selectively and controllably preparing polyphenylene sulfide resins with different melt viscosities and molecular weights, and the obtained polyphenylene sulfide resins have excellent heat resistance.
    Type: Application
    Filed: September 26, 2022
    Publication date: January 19, 2023
    Inventors: Zhirong CHEN, Woyuan LI, Hong YIN, Baishan HU, Guiyang ZHOU, Ming LIAN, Guangde QIN, Hangjun DENG, Xiongwei ZHANG, Guisheng QIU, Kejun WU
  • Publication number: 20210047471
    Abstract: The disclosure relates to a high molecular weight polyphenylene sulfide resin and a preparation method and application thereof. The disclosure uses a sulfur-containing compound and a halogenated aromatic compound as raw materials, an alkaline compound and a fatty acid as polycondensation aids to carry out a polycondensation reaction. After purification treatment, a primary polyphenylene sulfide is obtained. Then, the primary polyphenylene sulfide reacts with a chain extender at a high temperature to form a high molecular weight polyphenylene sulfide resin. The preparation method of the disclosure has the advantages of high yield, low cost, and is capable of selectively and controllably preparing polyphenylene sulfide resins with different melt viscosities and molecular weights, and the obtained polyphenylene sulfide resins have excellent heat resistance.
    Type: Application
    Filed: August 23, 2019
    Publication date: February 18, 2021
    Inventors: Zhirong CHEN, Woyuan LI, Hong YIN, Baishan HU, Guiyang ZHOU, Ming LIAN, Guangde QIN, Hangjun DENG, Xiongwei ZHANG, Guisheng QIU, Kejun WU