Patents by Inventor Kellie L. Dutra

Kellie L. Dutra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Measurement to determine plasma leakage
    Patent number: 7115210
    Abstract: Disclosed is a method and system for detecting abnormal plasma discharge that is useful in, for example, detecting plasma leakage in a reactive ion etching (RIE) chamber. The system includes electrical contacts connected to the chamber that provide an input signal to the chamber. This input signal can be generated by a radio frequency (RF) generator that is connected to the electrical contacts. A variable power controller connected to the RF generator gradually increases (ramps) the power of the input signal being supplied to the chamber.
    Type: Grant
    Filed: February 2, 2004
    Date of Patent: October 3, 2006
    Assignee: International Business Machines Corporation
    Inventors: Robert A. Calderoni, June Cline, Kellie L. Dutra, Ronald G. Meunier, Joseph P. Walko, Justin Wai-chow Wong
  • Method of stabilizing oxide etch and chamber performance using seasoning
    Patent number: 6899785
    Abstract: Undesirable reactions (such as formation of volatile compounds or complexes) are recognized to occur during production processes (such as etching with fluorine) at interior surfaces of a reactor chamber (such as a silicon-based reactor chamber). These undesirable reactions may be minimized and controlled by priming the chamber surface by incorporating seasoning atoms and/or molecules.
    Type: Grant
    Filed: November 5, 2001
    Date of Patent: May 31, 2005
    Assignee: International Business Machines Corporation
    Inventors: Kellie L. Dutra, Margaret L. Gibson, Ronald G. Meunier, Jason W. Silbergleit
  • Method of stabilizing oxide etch and chamber performance using seasoning
    Publication number: 20030092272
    Abstract: Undesirable reactions (such as formation of volatile compounds or complexes) are recognized to occur during production processes (such as etching with fluorine) at interior surfaces of a reactor chamber (such as a silicon-based reactor chamber). These undesirable reactions may be minimized and controlled by priming the chamber surface by incorporating seasoning atoms and/or molecules.
    Type: Application
    Filed: November 5, 2001
    Publication date: May 15, 2003
    Inventors: Kellie L. Dutra, Margaret L. Gibson, Ronald G. Meunier, Jason W. Silbergleit