Abstract: An image generation apparatus provides interpolation and distortion correction. The interpolation and distortion correction may be provided in one or two dimensions. Nonlinear image scan trajectories, such as sinusoidal and bi-sinusoidal trajectories are accommodated. Horizontal and vertical scan positions are determined using a linear pixel clock, and displayed pixel intensities are determined using interpolation techniques.

Abstract: Devices are formed on a semiconductor wafer in an interdigitated relationship and are released by deep reactive ion etching. MEMS scanners are formed without a surrounding frame. Mounting pads extend outward from torsion arms. Neighboring MEMS scanners are formed with their mounting pads interdigitated such that a regular polygon cannot be formed around a device without also intersecting a portion of one or more neighboring devices. MEMS scanners may be held in their outlines by a metal layer, by small semiconductor bridges, or a combination.