Patents by Inventor Kelly Yuji Kimura

Kelly Yuji Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHODS FOR OPTICAL ENDPOINT DETECTION USING AN ENDPOINT BOOSTER
    Publication number: 20180286768
    Abstract: Plasma etching a semiconductor wafer in a vacuum etch chamber includes transmitting an optical signal through an aperture in an endpoint booster that is coupled to a vacuum side of the vacuum etch chamber, analyzing the optical signal to determine an endpoint of the plasma etch process, ending the plasma etch process when the optical signal reaches a first threshold, and cleaning the viewport when the optical signal is below a second threshold. The endpoint booster inhibits process byproducts from accumulating on the viewport during the plasma process, which increases the time between chamber cleanings. The reduction in chamber downtime for cleaning increases production throughput.
    Type: Application
    Filed: March 28, 2018
    Publication date: October 4, 2018
    Inventors: Elena Becerra Woodard, Daniel Kwadwo Amponsah Berkoh, Kelly Yuji Kimura
  • ENDPOINT BOOSTER SYSTEMS
    Publication number: 20180197797
    Abstract: An endpoint booster transports an optical signal from inside of a plasma etch chamber through a viewport to an optical cable outside of the plasma etch chamber. The optical signal is analyzed to determine an endpoint of a plasma process. The endpoint booster inhibits process byproducts from accumulating on the viewport during the plasma process, which increases the time between chamber cleanings. The reduction in chamber downtime for cleaning increases production throughput.
    Type: Application
    Filed: December 8, 2017
    Publication date: July 12, 2018
    Inventors: Elena Becerra Woodard, Daniel Kwadwo Amponsah Berkoh, Kelly Yuji Kimura
  • Endpoint booster systems and methods for optical endpoint detection
    Patent number: 9870963
    Abstract: An endpoint booster transports an optical signal from inside of a plasma etch chamber through a viewport to an optical cable outside of the plasma etch chamber. The optical signal is analyzed to determine an endpoint of a plasma process. The endpoint booster inhibits process byproducts from accumulating on the viewport during the plasma process, which increases the time between chamber cleanings. The reduction in chamber downtime for cleaning increases production throughput.
    Type: Grant
    Filed: May 28, 2015
    Date of Patent: January 16, 2018
    Assignee: Skyworks Solutions, Inc.
    Inventors: Elena Becerra Woodard, Daniel Kwadwo Amponsah Berkoh, Kelly Yuji Kimura
  • ENDPOINT BOOSTER SYSTEMS AND METHODS FOR OPTICAL ENDPOINT DETECTION
    Publication number: 20160005666
    Abstract: An endpoint booster transports an optical signal from inside of a plasma etch chamber through a viewport to an optical cable outside of the plasma etch chamber. The optical signal is analyzed to determine an endpoint of a plasma process. The endpoint booster inhibits process byproducts from accumulating on the viewport during the plasma process, which increases the time between chamber cleanings. The reduction in chamber downtime for cleaning increases production throughput.
    Type: Application
    Filed: May 28, 2015
    Publication date: January 7, 2016
    Inventors: Elena Becerra Woodard, Daniel Kwadwo Amponsah Berkoh, Kelly Yuji Kimura