Abstract: The present invention provides an expansion-deflection coupling which allows for higher angular deflection, as well as greater axial expansion and compression with increased parallel offset movements. The coupling includes a pair of identical hubs adapted to accommodate conduits within, and a flexible hollow cylinder extending between the hubs. At least one mid-coupling is located within the cylinder, and at least two plastic funneled tubes, each of which extends securely within the cylinder between the mid-coupling and one of the hubs. One of the hubs is secured to a union coupling.

Abstract: A reactor for use in electrochemical processing of a microelectronic workpiece is set forth and described herein. The apparatus comprises one or more walls defining a processing space therebetween for containing a processing fluid. The processing space includes at least a first fluid flow region and a second fluid flow region. A first electrode is disposed in the processing fluid of the first fluid flow region while a second electrode, comprising at least a portion of the microelectronic workpiece, is disposed in the processing fluid of the second fluid flow region. Fluid flow within the first fluid flow region is generally directed toward the first electrode and away from the second electrode while fluid flow within the second fluid flow region is generally directed toward the second electrode and away from the first electrode.

Abstract: A reactor for use in electrochemical processing of a microelectronic workpiece is set forth and described herein. The apparatus comprises one or more walls defining a processing space therebetween for containing a processing fluid. The processing space includes at least a first fluid flow region and a second fluid flow region. A first electrode is disposed in the processing fluid of the first fluid flow region while a second electrode, comprising at least a portion of the microelectronic workpiece, is disposed in the processing fluid of the second fluid flow region. Fluid flow within the first fluid flow region is generally directed toward the first electrode and away from the second electrode while fluid flow within the second fluid flow region is generally directed toward the second electrode and away from the first electrode.

Abstract: The present invention provides an expansion-deflection coupling which allows for higher angular deflection, as well as greater axial expansion and compression with increased parallel offset movements. The coupling includes a pair of identical hubs adapted to accommodate conduits within, and a flexible hollow cylinder extending between the hubs. At least one mid-coupling is located within the cylinder, and at least two plastic funneled tubes, each of which extends securely within the cylinder between the mid-coupling and one of the hubs. One of the hubs is secured to a union coupling.

Abstract: A reactor for use in electrochemical processing of a microelectronic workpiece is set forth and described herein. The apparatus comprises one or more walls defining a processing space therebetween for containing a processing fluid The processing space includes at least a first fluid flow region and a second fluid flow region A first electrode is disposed in the processing fluid of the first fluid flow region while a second electrode, comprising at least a portion of the microelectronic workpiece, is disposed in the processing fluid of the second fluid flow region.

Abstract: A reactor for use in electrochemical processing of a microelectronic workpiece is set forth and described herein. The apparatus comprises one or more walls defining a processing space therebetween for containing a processing fluid. The processing space includes at least a first fluid flow region and a second fluid flow region. A first electrode is disposed in the processing fluid of the first fluid flow region while a second electrode, comprising at least a portion of the microelectronic workpiece, is disposed in the processing fluid of the second fluid flow region. Fluid flow within the first fluid flow region is generally directed toward the first electrode and away from the second electrode while fluid flow within the second fluid flow region is generally directed toward the second electrode and away from the first electrode.