Patents by Inventor Ken Horiuchi

Ken Horiuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9880471
    Abstract: The purpose of the present invention is to provide a developing solution processing device and processing method that solve problems that accompany the occurrence of scum, improve product defect rate, increase the utilization ratio of manufacturing devices, and contribute considerably to reduced manufacturing costs and other factors through highly efficient recovery of noble metals. The present invention provides a developing solution processing device provided with: a centrifuge for separating a clarified liquid and a residue by centrifugally separating out developing solution after development processing; and a defoaming device for defoaming and discharging the clarified liquid.
    Type: Grant
    Filed: July 2, 2013
    Date of Patent: January 30, 2018
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Ken Horiuchi, Atsushi Kondo
  • Patent number: 9732909
    Abstract: A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed includes: a processing gas supply unit; a processing gas supply line; a first and a second branch line; a branch flow control unit; an additional gas supply unit; an additional gas supply line; and a control unit. The control unit performs, before processing the substrate to be processed, a processing gas supply control and an additional gas supply control by using the processing gas supply unit and the additional gas supply unit, respectively, wherein the additional gas supply control includes a control that supplies the additional gas at an initial flow rate greater than a set flow rate and then at the set flow rate after a lapse of a period of time.
    Type: Grant
    Filed: July 24, 2014
    Date of Patent: August 15, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Shinichiro Hayasaka, Ken Horiuchi, Fumiko Yokouchi, Takeshi Yokouchi
  • Patent number: 9613837
    Abstract: A substrate processing apparatus includes: a first processing chamber; a second processing chamber; a transfer chamber; a frame structure; and an elevating part. Each of the first and the second processing chamber has a main body part and a lid part. The transfer chamber is connected to the first and the second processing chamber and accommodates a transfer unit for transferring the substrate. The frame structure has a pair of column parts and a beam part supported at top portions of the column parts. The elevating part is coupled to the beam part to be moved in a horizontal direction and moves the lid part in the vertical direction. The beam part extends above the first and the second processing chamber and the transfer chamber.
    Type: Grant
    Filed: April 1, 2013
    Date of Patent: April 4, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Shigeru Senzaki, Michishige Saito, Daiki Satoh, Ken Horiuchi, Koji Ando, Shingo Koiwa
  • Publication number: 20150177622
    Abstract: The purpose of the present invention is to provide a developing solution processing device and processing method that solve problems that accompany the occurrence of scum, improve product defect rate, increase the utilization ratio of manufacturing devices, and contribute considerably to reduced manufacturing costs and other factors through highly efficient recovery of noble metals. The present invention provides a developing solution processing device provided with: a centrifuge for separating a clarified liquid and a residue by centrifugally separating out developing solution after development processing; and a defoaming device for defoaming and discharging the clarified liquid.
    Type: Application
    Filed: July 2, 2013
    Publication date: June 25, 2015
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Ken Horiuchi, Atsushi Kondo
  • Publication number: 20150086302
    Abstract: A substrate processing apparatus includes: a first processing chamber; a second processing chamber; a transfer chamber; a frame structure; and an elevating part. Each of the first and the second processing chamber has a main body part and a lid part. The transfer chamber is connected to the first and the second processing chamber and accommodates a transfer unit for transferring the substrate. The frame structure has a pair of column parts and a beam part supported at top portions of the column parts. The elevating part is coupled to the beam part to be moved in a horizontal direction and moves the lid part in the vertical direction. The beam part extends above the first and the second processing chamber and the transfer chamber.
    Type: Application
    Filed: April 1, 2013
    Publication date: March 26, 2015
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shigeru Senzaki, Michishige Saito, Daiki Satoh, Ken Horiuchi, Koji Ando, Shingo Koiwa
  • Publication number: 20140332100
    Abstract: A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed includes: a processing gas supply unit; a processing gas supply line; a first and a second branch line; a branch flow control unit; an additional gas supply unit; an additional gas supply line; and a control unit. The control unit performs, before processing the substrate to be processed, a processing gas supply control and an additional gas supply control by using the processing gas supply unit and the additional gas supply unit, respectively, wherein the additional gas supply control includes a control that supplies the additional gas at an initial flow rate greater than a set flow rate and then at the set flow rate after a lapse of a period of time.
    Type: Application
    Filed: July 24, 2014
    Publication date: November 13, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shinichiro HAYASAKA, Ken HORIUCHI, Fumiko YOKOUCHI, Takeshi YOKOUCHI
  • Patent number: 8790529
    Abstract: A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed includes: a processing gas supply unit; a processing gas supply line; a first and a second branch line; a branch flow control unit; an additional gas supply unit; an additional gas supply line; and a control unit. The control unit performs, before processing the substrate to be processed, a processing gas supply control and an additional gas supply control by using the processing gas supply unit and the additional gas supply unit, respectively, wherein the additional gas supply control includes a control that supplies the additional gas at an initial flow rate greater than a set flow rate and then at the set flow rate after a lapse of a period of time.
    Type: Grant
    Filed: January 24, 2011
    Date of Patent: July 29, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Shinichiro Hayasaka, Ken Horiuchi, Fumiko Yagi, Takeshi Yokouchi
  • Patent number: 8178077
    Abstract: The present invention provides novel target proteins and target genes for drug discovery, and the means that enable the development of novel drugs using the same. More particularly, the present invention provides NCS proteins and genes thereof; screening methods for drug (for example, anti-central nervous disease drug); agents for regulating disease (for example, central nervous disease); production methods of a drug derivative; a complex comprising a drug and NCS protein, and a method of producing the complex; a kits comprising a drug or a salt thereof; determination methods for the onset or risk of onset of a specified disease, determination methods for susceptibility to a drug, and determination kits used for the determination methods; and the like.
    Type: Grant
    Filed: October 19, 2005
    Date of Patent: May 15, 2012
    Assignee: Reverse Proteomics Research Institute Co., Ltd.
    Inventors: Tadakazu Yamauchi, Hideaki Sueoka, Kouichi Tsuchiya, Katsuhisa Murayama, Ken Horiuchi, Kazuo Komiya, Morikazu Kito, Takeshi Tsutsumi, Yuko Isono, Yorimasa Suwa
  • Publication number: 20110120563
    Abstract: A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed includes: a processing gas supply unit; a processing gas supply line; a first and a second branch line; a branch flow control unit; an additional gas supply unit; an additional gas supply line; and a control unit. The control unit performs, before processing the substrate to be processed, a processing gas supply control and an additional gas supply control by using the processing gas supply unit and the additional gas supply unit, respectively, wherein the additional gas supply control includes a control that supplies the additional gas at an initial flow rate greater than a set flow rate and then at the set flow rate after a lapse of a period of time.
    Type: Application
    Filed: January 24, 2011
    Publication date: May 26, 2011
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shinichiro HAYASAKA, Ken Horiuchi, Fumiko Yagi, Takeshi Yokouchi
  • Patent number: 7896967
    Abstract: A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed includes: a processing gas supply unit; a processing gas supply line; a first and a second branch line; a branch flow control unit; an additional gas supply unit; an additional gas supply line; and a control unit. The control unit performs, before processing the substrate to be processed, a processing gas supply control and an additional gas supply control by using the processing gas supply unit and the additional gas supply unit, respectively, wherein the additional gas supply control includes a control that supplies the additional gas at an initial flow rate greater than a set flow rate and then at the set flow rate after a lapse of a period of time.
    Type: Grant
    Filed: February 5, 2007
    Date of Patent: March 1, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Shinichiro Hayasaka, Ken Horiuchi, Fumiko Yagi, Takeshi Yokouchi
  • Publication number: 20090233274
    Abstract: The present invention provides novel target proteins and target genes for drug discovery, and the means that enable the development of novel drugs using the same. More particularly, the present invention provides NCS proteins and genes thereof; screening methods for drug (for example, anti-central nervous disease drug); agents for regulating disease (for example, central nervous disease); production methods of a drug derivative; a complex comprising a drug and NCS protein, and a method of producing the complex; a kits comprising a drug or a salt thereof; determination methods for the onset or risk of onset of a specified disease, determination methods for susceptibility to a drug, and determination kits used for the determination methods; and the like.
    Type: Application
    Filed: October 9, 2005
    Publication date: September 17, 2009
    Applicant: Reverse Proteomics Research Institute Co.
    Inventors: Tadakazu Yamauchi, Hideaki Sueoka, Koichi Tsuchiya, Katsuhisa Murayama, Ken Horiuchi, Kazuo Komiya, Morikazu Kito, Takeshi Kito, Takeshi Tsutsumi, Yuko Isono, Yorimasa Suwa
  • Publication number: 20090143285
    Abstract: The present invention provides target proteins and target genes for bioactive substances such as drugs, and means that enable the development of novel bioactive substances using the same. More specifically, the present invention provides target proteins and target genes for bioactive substances; screening methods for substances capable of regulating bioactivities; bioactivity regulators; a bioactive substance derivative production method; a complex comprising a bioactive substance and a target protein, and a method of producing the complex; and kits comprising a bioactive substance or a salt thereof; determination methods for the onset or risk of onset of a specified disease or condition, determination methods for susceptibility to a bioactive substance, and determination kits used for the determination methods, and the like.
    Type: Application
    Filed: March 24, 2006
    Publication date: June 4, 2009
    Applicant: REVERSE PROTEOMICS RESEARCH INSTITUTE CO., LTD.
    Inventors: Hideaki Sueoka, Tadakazu Yamauchi, Kouichi Tsuchiya, Katsuhisa Murayama, Morikazu Kito, Takeshi Tsutsumi, Yuko Isono, Kazuo Komiya, Noriyuki Inomata, Yorimasa Suwa, Ken Horiuchi
  • Patent number: 7471198
    Abstract: To provide a machine component with an IC tag affixed thereto, in which with the IC tag having an increased storage capacity, the IC tag can be mounted with no difficulty and, also, reading or writing of information from or in the IC tag, respectively, can be facilitated. A plurality of IC tags 2 are attached to a machine component, which forms a part of a rolling bearing assembly 1, or to a machine component and an accessory with division made therebetween. Those plural IC tags 2 have different information stored therein. Where the machine component is a retainer incorporated rolling bearing assembly 1, those plural IC tags are attached to a roller retainer 5 at respective locations symmetrical with each other about the axis O of rotation thereof.
    Type: Grant
    Filed: September 7, 2004
    Date of Patent: December 30, 2008
    Assignee: NTN Corporation
    Inventors: Naota Yamamoto, Ken Horiuchi, Koushirou Fujimoto, Yoshihisa Shibuya, Makoto Muramatsu
  • Publication number: 20070181255
    Abstract: A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed includes: a processing gas supply unit; a processing gas supply line; a first and a second branch line; a branch flow control unit; an additional gas supply unit; an additional gas supply line; and a control unit. The control unit performs, before processing the substrate to be processed, a processing gas supply control and an additional gas supply control by using the processing gas supply unit and the additional gas supply unit, respectively, wherein the additional gas supply control includes a control that supplies the additional gas at an initial flow rate greater than a set flow rate and then at the set flow rate after a lapse of a period of time.
    Type: Application
    Filed: February 5, 2007
    Publication date: August 9, 2007
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shinichiro HAYASAKA, Ken Horiuchi, Fumiko Yagi, Takeshi Yokouchi
  • Publication number: 20060289620
    Abstract: To provide a machine component with an IC tag affixed thereto, in which with the IC tag having an increased storage capacity, the IC tag can be mounted with no difficulty and, also, reading or writing of information from or in the IC tag, respectively, can be facilitated. A plurality of IC tags 2 are attached to a machine component, which forms a part of a rolling bearing assembly 1, or to a machine component and an accessory with division made therebetween. Those plural IC tags 2 have different information stored therein. Where the machine component is a retainer incorporated rolling bearing assembly 1, those plural IC tags are attached to a roller retainer 5 at respective locations symmetrical with each other about the axis O of rotation thereof.
    Type: Application
    Filed: September 7, 2004
    Publication date: December 28, 2006
    Applicant: NTN Corporation
    Inventors: Naota Yamamoto, Ken Horiuchi, Koushirou Fujimoto, Yoshihisa Shibuya, Makoto Muramatsu
  • Publication number: 20060287831
    Abstract: One of a plurality of data display formats with different units of correlation data that are prepared in advance is automatically selected depending on the variation of the amount of data in terms of the number of items thereof. One of a plurality of display methods with different summarization levels that are prepared in advance is also automatically selected for information (about correlation data or individual events) regarding individual cells. Information about the correlation data and individual cells is then displayed. The amount of work required to repeat the operation of observing the correlation data as a whole and the detailed observation of a small amount of data is reduced in a method for visualizing correlation data concerning two events in a matrix format.
    Type: Application
    Filed: July 12, 2004
    Publication date: December 21, 2006
    Inventors: Motoi Totiba, Tetsuo Nishikawa, Ken Horiuchi, Masashi Nemoto, Kenji Araki
  • Publication number: 20020141673
    Abstract: A compact rolling bearing with a rotation sensor is proposed which has a shortened axial length of a housing for mounting the rotation sensor. The rolling bearing comprises a rotating bearing ring and a fixed bearing ring, and the rotation sensor comprises a rotating element mounted to the rotating bearing ring and a detecting element mounted on the fixed bearing ring so as to oppose the rotating element, and an electric circuit board. The electric circuit board has a flexibility. With this arrangement, it is possible to mount the electric circuit board in a curved state in a limited space on a peripheral wall of the sensor housing, and thus to shorten the axial length of the sensor housing. This provides a compact rolling bearing with the rotation sensor. Another embodiment has a magnetic encoder, the binder for which is heat-resistant nitrile rubber, fluorine rubber or silicone rubber.
    Type: Application
    Filed: March 26, 2002
    Publication date: October 3, 2002
    Inventors: Hiroyoshi Ito, Shiro Ishikawa, Yasuhiro Shimizu, Ken Horiuchi, Masanori Ueno, Ryusuke Katsumata
  • Patent number: 6184621
    Abstract: The plasma display of the present invention is a plasma display in which a dielectric layer and stripe-shaped barrier ribs are formed on a substrate, and it is characterized in that there are inclined regions at the lengthwise direction ends of said barrier ribs and, furthermore, the height (Y) of the inclined regions and the length (X) of the base of the inclined regions are within the range 0.5≦X/Y≦100. Moreover, the method of the present invention for manufacturing a plasma display is characterized in that the aforesaid stripe-shaped barrier ribs are formed via a process in which a pattern of stripe-shaped barrier ribs having inclined regions at the ends is formed on a substrate using a barrier rib paste comprising inorganic material and organic component, and a process in which said barrier rib pattern is fired.
    Type: Grant
    Filed: April 26, 1999
    Date of Patent: February 6, 2001
    Assignee: Toray Industries, Inc.
    Inventors: Ken Horiuchi, Yuichiro Iguchi, Takaki Masaki, Go Moriya, Yukichi Deguchi, Kiwame Arizumi, Yoshiyuki Kitamura, Yoshinori Tani, Isamu Sakuma
  • Patent number: 6043604
    Abstract: With barrier ribs having a specified form, the strength and the adhesiveness to the substrate board are improved, and a high-resolution plasma display with suppressed meandering, falling and peeling of the barrier rib and wire breakage is provided. In addition, coating uniformity of the phosphor is improved, a high-resolution plasma display with low luminance irregularity is provided. Furthermore, a high-luminance high resolution plasma display with excellent luminance characteristic is provided.
    Type: Grant
    Filed: March 10, 1998
    Date of Patent: March 28, 2000
    Assignee: Toray Industries, Inc.
    Inventors: Ken Horiuchi, Yuichiro Iguchi, Takaki Masaki, Go Moriya
  • Patent number: 4997293
    Abstract: An anti-electrolytic corrosion type rolling bearing of the present invention has an insulation coating layer formed on the outer surface of, or the outer surface and side walls of, the outer ring. The insulation coating layer has an insulating layer sandwiched between metal layers.
    Type: Grant
    Filed: March 22, 1990
    Date of Patent: March 5, 1991
    Assignees: Nippon Sharyo Seizo Kabushiki Kaisha, NTN Corporation
    Inventors: Hidehiko Ono, Ken Horiuchi