Patents by Inventor Ken-ichi Mizusawa

Ken-ichi Mizusawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Halogenated anti-reflective coatings
    Publication number: 20020192594
    Abstract: Anti-reflective coatings formed from new polymers and having high etch rates are provided. Broadly, the coatings are formed from a polymer binder and a light attenuating compound. The polymer binder has halogen atoms bonded thereto, preferably to functional groups on the polymer binder rather than to the polymer backbone. Preferred polymer binders comprise acrylic polymers while it is preferred that the halogenated functional groups of the polymer binders be dihalogenated, and more preferably trihalogenated, with chlorine, fluorine, or bromine atoms.
    Type: Application
    Filed: June 28, 2002
    Publication date: December 19, 2002
    Inventors: Tomoyuki Enomoto, Ken-Ichi Mizusawa, Shin-Ya Arase, Rama Puligadda
  • Halogenated anti-reflective coatings
    Patent number: 6495305
    Abstract: Anti-reflective coatings formed from new polymers and having high etch rates are provided. Broadly, the coatings are formed from a polymer binder and a light attenuating compound. The polymer binder has halogen atoms bonded thereto, preferably to functional groups on the polymer binder rather than to the polymer backbone. Preferred polymer binders comprise acrylic polymers while it is preferred that the halogenated functional groups of the polymer binders be dihalogenated, and more preferably trihalogenated, with chlorine, fluorine, or bromine atoms.
    Type: Grant
    Filed: October 4, 2000
    Date of Patent: December 17, 2002
    Inventors: Tomoyuki Enomoto, Ken-Ichi Mizusawa, Shin-Ya Arase, Rama Puligadda
  • Bottom anti-reflective coat forming composition for lithography
    Publication number: 20020156148
    Abstract: The present invention relates to a bottom anti-reflective coat forming composition having the resin with the structural unit comprising maleimide or maleimide derivative for the lithography process in the preparation of semiconductor device. The resin comprises maleimide or derivative thereof in the principal chain or the side chain and its weight-average molecular weight is 700-1000000. The invention offers the bottom anti-reflective coating for lithography showing high anti-reflective effect, no intermixing with resist layer, excellent resist pattern, and large dry etching rate in comparison to resist.
    Type: Application
    Filed: February 20, 2002
    Publication date: October 24, 2002
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Shinya Arase, Takahiro Kishioka, Ken-ichi Mizusawa
  • Thermosetting anti-reflective coatings for full-fill dual damascene process
    Publication number: 20020132123
    Abstract: New polymers and anti-reflective or fill compositions including those polymers are provided.
    Type: Application
    Filed: January 8, 2001
    Publication date: September 19, 2002
    Inventors: Satoshi Takei, Yasuhisa Sone, Ken-Ichi Mizusawa
  • Thermosetting anti-reflective coatings for full-fill dual damascene process
    Patent number: 6444320
    Abstract: New polymers and anti-reflective or fill compositions including those polymers are provided. The polymer comprises recurring monomers according to the formula wherein R comprises a light attenuating compound. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process.
    Type: Grant
    Filed: January 8, 2001
    Date of Patent: September 3, 2002
    Assignee: Brewer Science
    Inventors: Satoshi Takei, Yasuhisa Sone, Ken-Ichi Mizusawa