Patents by Inventor Kenichi Nishimura

Kenichi Nishimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240077772
    Abstract: A display device includes: a first substrate, a second substrate, a light-blocking portion, a pixel, and a wiring line. The second substrate has a main face opposite a main face of the first substrate. The light-blocking portion is disposed on the main face of the first substrate, including an opening, and blocking light. The pixel is disposed on the main faces of the first substrate and the second substrate and delimited by at least a part of the opening. The wiring line is disposed on the main face of the second substrate and at least partially overlapping the opening. The wiring line has a projection protruding toward a first substrate side. The projection has a surface including a curved surface and comprises a plurality of projections disposed at intervals in locations overlapping at least the opening.
    Type: Application
    Filed: April 27, 2023
    Publication date: March 7, 2024
    Inventors: Hiroaki WADA, Junichi MORI, Takumi TOMITA, Kenichi NISHIMURA, Hiroto AKIYAMA
  • Patent number: 11252307
    Abstract: A first lateral surface, a second lateral surface, an upper surface, and a bottom surface of a housing of an imaging device is formed of metal and at least two surfaces among the first lateral surface, the second lateral surface, the upper surface, and the bottom surface include a groove region formed of a plurality of grooves.
    Type: Grant
    Filed: August 27, 2019
    Date of Patent: February 15, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Satoru Shingai, Kenichi Nishimura, Takeru Ohya
  • Patent number: 11078086
    Abstract: The object of the present invention is to improve production efficiency of lithium hydroxide anhydride in a method for producing lithium hydroxide anhydride from lithium hydroxide hydrate by using a rotary kiln. The method for producing lithium hydroxide anhydride comprises steps of: supplying the lithium hydroxide hydrate to a region between a heating part which is the part of the furnace core tube surrounded by the heating furnace and one end of the furnace core tube; delivering the supplied lithium hydroxide hydrate toward the other end of the furnace core tube; feeding a drying gas with a temperature of 100° C. or higher to the region between the one end and the heating part of the furnace core tube, when the lithium hydroxide hydrate is supplied; and heating and dehydrating the lithium hydroxide hydrate by the heating furnace which is set to 230-450° C. during the lithium hydroxide delivering step, to form lithium hydroxide anhydride.
    Type: Grant
    Filed: October 31, 2017
    Date of Patent: August 3, 2021
    Assignees: BASF TODA BATTERY MATERIALS LLC, TANABE CORPORATION
    Inventors: Manabu Yamamoto, Osamu Sasaki, Noriyasu Kimura, Kenichi Nishimura, Wataru Koyanagi, Toru Kuwahara
  • Patent number: 11070734
    Abstract: An image pickup apparatus that is capable of taking and editing a content with satisfactory operability while holding a grip. The image pickup apparatus includes a display unit, a grip, an operation unit including a touch operation member extending in a slide direction for a slide operation that designates one of taken contents, a first instruction member to take, and a second instruction member to retake, and a controller that changes a display content on the display unit according to a slide operation to the touch operation member. The operation unit is provided between the grip and the display unit in a perpendicular direction to the slide direction. The first and second instruction members are provided between the touch operation member and the grip in the perpendicular direction. The first and second instruction members are respectively provided near one end and the other end of the touch operation member.
    Type: Grant
    Filed: April 6, 2020
    Date of Patent: July 20, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Kazuhiro Watanabe, Harry Vermeulen, Kenichi Nishimura, Takeshi Nakata
  • Publication number: 20200344422
    Abstract: An image pickup apparatus that is capable of taking and editing a content with satisfactory operability while holding a grip. The image pickup apparatus includes a display unit, a grip, an operation unit including a touch operation member extending in a slide direction for a slide operation that designates one of taken contents, a first instruction member to take, and a second instruction member to retake, and a controller that changes a display content on the display unit according to a slide operation to the touch operation member. The operation unit is provided between the grip and the display unit in a perpendicular direction to the slide direction. The first and second instruction members are provided between the touch operation member and the grip in the perpendicular direction. The first and second instruction members are respectively provided near one end and the other end of the touch operation member.
    Type: Application
    Filed: April 6, 2020
    Publication date: October 29, 2020
    Inventors: Kazuhiro Watanabe, Harry Vermeulen, Kenichi Nishimura, Takeshi Nakata
  • Publication number: 20200076993
    Abstract: A first lateral surface, a second lateral surface, an upper surface, and a bottom surface of a housing of an imaging device is formed of metal and at least two surfaces among the first lateral surface, the second lateral surface, the upper surface, and the bottom surface include a groove region formed of a plurality of grooves.
    Type: Application
    Filed: August 27, 2019
    Publication date: March 5, 2020
    Inventors: Satoru Shingai, Kenichi Nishimura, Takeru Ohya
  • Publication number: 20200055739
    Abstract: The object of the present invention is to improve production efficiency of lithium hydroxide anhydride in a method for producing lithium hydroxide anhydride from lithium hydroxide hydrate by using a rotary kiln. The method for producing lithium hydroxide anhydride comprises steps of: supplying the lithium hydroxide hydrate to a region between a heating part which is the part of the furnace core tube surrounded by the heating furnace and one end of the furnace core tube; delivering the supplied lithium hydroxide hydrate toward the other end of the furnace core tube; feeding a drying gas with a temperature of 100° C. or higher to the region between the one end and the heating part of the furnace core tube, when the lithium hydroxide hydrate is supplied; and heating and dehydrating the lithium hydroxide hydrate by the heating furnace which is set to 230-450° C. during the lithium hydroxide delivering step, to form lithium hydroxide anhydride.
    Type: Application
    Filed: October 31, 2017
    Publication date: February 20, 2020
    Applicants: BASF TODA BATTERY MATERIALS LLC, TANABE CORPORATION
    Inventors: Manabu YAMAMOTO, Osamu SASAKI, Noriyasu KIMURA, Kenichi NISHIMURA, Wataru KOYANAGI, Toru KUWAHARA
  • Publication number: 20170344688
    Abstract: A processor of an information processing apparatus displays a first component in a state in which a first terminal of the first component is located on a second terminal of a second component. The processor displays, along a designated route, a first wiring pattern for connecting the second terminal to the first terminal and moves the first component to a first distal end of the first wiring pattern. The processor determines whether a pattern area of the first wiring pattern or a component area of the first component which is placed at a second distal end of the designated route overlaps any of first areas of already placed components or second areas of already wired wiring patterns. The processor finalizes placement of the first component and the first wiring pattern upon determining that the pattern area and the component area overlap none of the first areas and the second areas.
    Type: Application
    Filed: April 5, 2017
    Publication date: November 30, 2017
    Applicant: FUJITSU LIMITED
    Inventors: Kazuhiro SAKAI, Masato ARIYAMA, Kenichi NISHIMURA, Akira MIMURA, Yusuke KIMURA
  • Publication number: 20170278879
    Abstract: The present invention includes: a multilayer film forming step of forming a multilayer film constituted by a plurality of metal films layered together; after the multilayer film forming step, a resist forming step of forming a resist film having patterned openings on the multilayer film; after the resist forming step, a dry etching step of dry etching the multilayer film to remove at least one metal film located at the top of the multilayer film and exposed by the openings; after the dry etching step, a wet etching step of wet etching the multilayer film to remove at least the metal films exposed by the openings.
    Type: Application
    Filed: August 27, 2015
    Publication date: September 28, 2017
    Applicant: Sharp Kabushiki Kaisha
    Inventors: Yoshinori HARADA, Yohhei SHINZAKI, Masaru SUGATA, Kenichi NISHIMURA
  • Patent number: 9570544
    Abstract: A semiconductor device includes: a silicon substrate that includes a high-concentration layer containing first conductivity type impurities; a low-concentration layer formed on the high-concentration layer and containing first conductivity type impurities; a first electrode and a second electrode formed on the low-concentration layer; a vertical semiconductor element that allows current to flow between the second electrode and the high-concentration layer; and a first trench unit that realizes electric connection between the first electrode and the high-concentration layer. The first trench unit consists of first polysilicon containing first conductivity type impurities, and a diffusion layer configured to surround the first polysilicon in a plan view and to contain first conductivity type impurities. The first polysilicon is configured to reach the high-concentration layer by penetrating the low-concentration layer.
    Type: Grant
    Filed: December 20, 2015
    Date of Patent: February 14, 2017
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Katsushige Yamashita, Kenichi Nishimura, Atsuya Yamamoto, Shigetaka Aoki
  • Patent number: D902972
    Type: Grant
    Filed: August 26, 2019
    Date of Patent: November 24, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kenichi Nishimura
  • Patent number: D903745
    Type: Grant
    Filed: April 9, 2019
    Date of Patent: December 1, 2020
    Inventor: Kenichi Nishimura
  • Patent number: D908154
    Type: Grant
    Filed: March 1, 2019
    Date of Patent: January 19, 2021
    Inventor: Kenichi Nishimura
  • Patent number: D908155
    Type: Grant
    Filed: March 1, 2019
    Date of Patent: January 19, 2021
    Inventor: Kenichi Nishimura
  • Patent number: D949856
    Type: Grant
    Filed: January 10, 2022
    Date of Patent: April 26, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kenichi Nishimura
  • Patent number: D949857
    Type: Grant
    Filed: January 10, 2022
    Date of Patent: April 26, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kenichi Nishimura
  • Patent number: D949858
    Type: Grant
    Filed: January 10, 2022
    Date of Patent: April 26, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kenichi Nishimura, Yoshiyuki Kashiwagi
  • Patent number: D956046
    Type: Grant
    Filed: May 26, 2020
    Date of Patent: June 28, 2022
    Inventors: Kenichi Nishimura, Yoshiyuki Kashiwagi
  • Patent number: D959533
    Type: Grant
    Filed: March 29, 2021
    Date of Patent: August 2, 2022
    Inventor: Kenichi Nishimura
  • Patent number: D983253
    Type: Grant
    Filed: March 9, 2020
    Date of Patent: April 11, 2023
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kenichi Nishimura