Abstract: A method for preparing a 7-quinolynyl-3,5-dihydroxyhept-6-enoate useful as an intermediate for pharmaceuticals, in high yield and in high purity, is presented. It is a method for preparing a 7-quinolinyl-3,5-dihydroxyhept-6-enoate represented by the formula (IV): (wherein R represents an alkyl group or an aryl group), characterized in that a compound represented by the formula (I): (wherein R is as defined above), or a compound represented by the formula (II): (wherein R is as defined above), is reduced by sodium borohydride in the presence of a boron compound represented by the formula (III): R?OBR?2??(III) (wherein R? and R? represent independently an alkyl group), and then the resultant reaction mixture is treated with an aqueous solution of hydrogen peroxide.

Abstract: A method for preparing a 7-quinolynyl-3,5-dihydroxyhept-6-enoate useful as an intermediate for pharmaceuticals, in high yield and in high purity, is presented. It is a method for preparing a 7-quinolinyl-3,5-dihydroxyhept-6-enoate represented by the formula (IV): (wherein R represents an alkyl group or an aryl group), characterized in that a compound represented by the formula (I): (wherein R is as defined above), or a compound represented by the formula (II): (wherein R is as defined above), is reduced by sodium borohydride in the presence of a boron compound represented by the formula (III): R?OBR?2??(III) (wherein R? and R? represent independently an alkyl group), and then the resultant reaction mixture is treated with an aqueous solution of hydrogen peroxide.

Abstract: A disclosed method comprises a step of detecting a plurality of alignment marks A through D on a wafer before a pattern is exposed to obtain a correction factor in order to, based on it, performing alignment, starting pattern exposure to detect an alignment mark A′ again at predetermined timing during a course of exposure, obtaining a positional difference between thus detected position and a position (coordinates) thereof detected before exposure to provide it as an electron-beam positional drift amount, and superimposing this electron-beam positional drift amount onto a deflection amount of an electron-beam, to correct electron-beam exposure position.

Abstract: A disclosed method comprises a step of detecting a plurality of alignment marks A through D on a wafer before a pattern is exposed to obtain a correction factor in order to, based on it, performing alignment, starting pattern exposure to detect an alignment mark A′ again at predetermined timing during a course of exposure, obtaining a positional difference between thus detected position and a position (coordinates) thereof detected before exposure to provide it as an electron-beam positional drift amount, and superimposing this electron-beam positional drift amount onto a deflection amount of an electron-beam, to correct electron-beam exposure position.

Abstract: The invention relates to a process for preparation of 4,6-diaminoresorcinol or salts thereof by reducing 4,6-bis(substituted)phenylazoresorcinol expressed by the formula [1] wherein, R denotes a halogen atom, an alkyl group having 1-5 carbon atoms, a hydroxycarbonyl group or an alkoxy group having 1-5 carbon atoms, n denotes 0 or any integer of 1-5, and two or more groups R may be same or different each other, for example, 4,6-bisphenylazoresorcinol, with hydrogen in the presence of a metal catalyst to obtain 4,6-diaminoresorcinol or salts thereof, characterized in that an aliphatic nitrile compound (for example, acetonitrile) is used as a solvent, or characterized in that the reduction is carried out by using at least one organic solvent selected from aliphatic nitrile compounds, aliphatic alcohols having 3-5 carbon atoms, dioxane and ethylene glycol monomethyl ether, etc. as a solvent and furthermore in the presence of a filter aid (for example, active carbon).

Abstract: A process for producing 4,6-bisphenylazoresorcinol of formula ?2! wherein R represents halogen atom, C.sub.1-5 alkyl group, hydroxycarbonyl or C.sub.1-5 alkoxy group, n represents 0 or an integer of 1 to 5, and two or more Rs are the same or different from each other, which comprises reacting resorcinol with a benzenediazonium salt of formula ?1! wherein R and n are the same as defined in the above formula ?1!, and X represents Cl, Br, OSO.sub.3 H or OPO.sub.3 H.sub.

Abstract: A dialkyl dialkoxycarbonylphenylphosphonate which is useful as a resin modifier, a process for producing the same in high yield at a low cost, and a process for producing a dicarboxyphenylphosphonic acid in high yield at a low cost are described.The process for producing a dialkyl dialkoxycarbonylphenylphosphonate comprises heating and reacting a dialkoxycarbonylphenyl halide with a trialkyl phosphate in the presence of a catalyst comprising an element of group VIII of the periodic table (such as an alumina supported palladium catalyst) and hydrolyzing the obtained dialkyl dialkoxycarbonylphenylphosphonate in the presence of an acid or base to produce a dicarboxyphenylphosphonic acid.

Abstract: To provide 2,5-dicarboxyphenyl phosphonic acid and a process for the preparation thereof, comprising the steps of: forming a reaction liquid phase by supplying a 2,5-dialkylphenyl phosphonic acid, a solvent, a cobalt salt, a manganese salt and/or a cerium salt, and bromine or a bromine compound into a reaction zone; and supplying oxygen into the reaction liquid phase by bringing an oxygen-containing gas into contact with the reaction liquid phase by supplying an oxygen-containing gas into the above-mentioned reaction zone.