Abstract: Provided is a data processing device with which, when a temporary network congestion occurs, it is possible to avoid a buffer overflow and sustain a process. When a request for retransmission of the same data with respect to a processor element from a buffer occurs continuously a prescribed number of iterations, a data processing device according to the present invention determines that it is possible that a buffer overflow occurs, and suppresses an increase in the volume of data which is accumulated in the buffer (see FIG. 1).

Abstract: Provided is a data processing device with which, when a temporary network congestion occurs, it is possible to avoid a buffer overflow and sustain a process. When a request for retransmission of the same data with respect to a processor element from a buffer occurs continuously a prescribed number of iterations, a data processing device according to the present invention determines that it is possible that a buffer overflow occurs, and suppresses an increase in the volume of data which is accumulated in the buffer (see FIG. 1).

Abstract: A semiconductor inspecting apparatus which is provided with an inspecting unit, a detecting unit, and a processing unit, which processes an image on the basis of reflection light detected by the detecting unit, and which inspects the surface of the subject to be inspected. The processing unit is provided with an image distribution control unit, which distributes the image, and an image processing unit, which processes the image distributed by the image distribution control unit. The image distribution control unit has and image buffer counter, which counts the input image quantity of the image; a distribution control table, which stores information relating to the image; and a distribution timing control circuit, which determines distribution start timing of the image on the basis of the input image quantity and the information relating to the image obtained from the distribution control table.

Abstract: In an electron-beam lithography system for performing a pattern drawing by causing electron beams to be switched ON/OFF at a high speed in an exposure/non-exposure portion, non-straight line property of beam shot dosage relative to beam ON time worsens dimension accuracy of the drawing pattern formed on a sample. In order to avoid this drawback, the characteristic of the beam shot dosage relative to the beam ON time is measured in advance, thereby creating correction data for the beam ON time beforehand. Then, at the time of performing the pattern drawing, the beam ON time is corrected based on the correction data so that desired beam shot dosage becomes acquirable.