Patents by Inventor Ken K. Chin
Ken K. Chin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10090431Abstract: The present disclosure provides improved thin film photovoltaic devices and related methods of fabrication. More particularly, the present disclosure provides improved CdTe photovoltaic devices and related fabrication methods. Disclosed is a novel thin film photovoltaic device and means for its fabrication. An exemplary device includes a metal oxide layer between the absorber layer and the rear electrode, resulting in an ohmic back contact and having improved device stability. The metal oxide layer can include at least one of silver oxide or copper oxide, and may additionally contain nickel oxide, molybdenum oxide, and/or vanadium oxide. The present disclosure is directed towards formation of a ohmic back contact for solar cells, the back contact having improved stability. In certain embodiments, the present disclosure provides for an ohmic contact to p-type II-VI semiconductors, and to the fabrication of solar cells having improved stability, and to solar panels incorporating such back contact schemes.Type: GrantFiled: March 12, 2014Date of Patent: October 2, 2018Assignee: New Jersey Institute of TechnologyInventors: Zimeng Cheng, Ken K. Chin, Alan E. Delahoy
-
Publication number: 20160027954Abstract: The present disclosure provides improved thin film photovoltaic devices and related methods of fabrication. More particularly, the present disclosure provides improved CdTe photovoltaic devices and related fabrication methods. Disclosed is a novel thin film photovoltaic device and means for its fabrication. An exemplary device includes a metal oxide layer between the absorber layer and the rear electrode, resulting in an ohmic back contact and having improved device stability. The metal oxide layer can include at least one of silver oxide or copper oxide, and may additionally contain nickel oxide, molybdenum oxide, and/or vanadium oxide. The present disclosure is directed towards formation of a ohmic back contact for solar cells, the back contact having improved stability. In certain embodiments, the present disclosure provides for an ohmic contact to p-type II-VI semiconductors, and to the fabrication of solar cells having improved stability, and to solar panels incorporating such back contact schemes.Type: ApplicationFiled: March 12, 2014Publication date: January 28, 2016Applicant: New Jersey Institute of TechnologyInventors: Zimeng Cheng, Ken K. Chin, Alan E. Delahoy
-
Patent number: 8883549Abstract: Exemplary embodiments of the present disclosure are directed to improve p-type doping (p-doping) of cadmium telluride (CdTe) for CdTe-based solar cells, such as cadmium Sulfide (Cds)/CdTe solar cells. Embodiments can achieve improved p-doping of CdTe by creating a high density of cadmium (Cd) vacancies (VCd) and subsequently substituting a high density of substitutional defects and/or defect complexes for the Cd vacancies that were created. Formation of a high density of substitutional defects and defect complexes as a p-dopant can improve light-to-electricity conversion efficiency, doping levels or hole concentrations, junction band bending, and/or ohmic contact associated with p-type CdTe (p-CdTe) based solar cells.Type: GrantFiled: June 21, 2011Date of Patent: November 11, 2014Assignee: New Jersey Institute of TechnologyInventor: Ken K. Chin
-
Publication number: 20120042950Abstract: Exemplary embodiments of the present disclosure are directed to improve p-type doping (p-doping) of cadmium telluride (CdTe) for CdTe-based solar cells, such as cadmium Sulfide (Cds)/CdTe solar cells. Embodiments can achieve improved p-doping of CdTe by creating a high density of cadmium (Cd) vacancies (VCd) and subsequently substituting a high density of substitutional defects and/or defect complexes for the Cd vacancies that were created. Formation of a high density of substitutional defects and defect complexes as a p-dopant can improve light-to-electricity conversion efficiency, doping levels or hole concentrations, junction band bending, and/or ohmic contact associated with p-type CdTe (p-CdTe) based solar cells.Type: ApplicationFiled: June 21, 2011Publication date: February 23, 2012Applicant: NEW JERSEY INSTITUTE OF TECHNOLOGYInventor: Ken K. Chin
-
Patent number: 7697797Abstract: The present invention is a diaphragm-fiber optic sensor (DFOS), interferometric sensor. This DFOS is based on the principles of Fabry-Perot and Michelson/Mach-Zehnder. The sensor is low cost and is designed with high efficiency, reliability, and Q-point stability, fabricated using MEMS (micro mechanic-electrical system) technology, and has demonstrated excellent performance. A DFOS according to the invention includes a cavity between two surfaces: a diaphragm made of silicon or other material with a rigid body (or boss) at the center and clamped along its edge, and the endface of a single mode optic fiber. By utilizing MEMS technology, the gap width between the diaphragm and the fiber endface is made accurately, ranging from 1 micron to 10 microns.Type: GrantFiled: September 25, 2008Date of Patent: April 13, 2010Assignee: New Jersey Institute of TechnologyInventors: Ken K Chin, Guanhua Feng, Ivan Padron, Harry Roman
-
Patent number: 7561277Abstract: The theory, design, fabrication, and characterization of MEMS (micro electrical mechanical system) Fabry-Perot diaphragm-fiber optic microphone are described in the present invention. By using MEMS technology in processing and packaging, a square 1.9 mm×1.9 mm, 2 ? thick SiO2 diaphragm with a 350 ? square embossed center of silicon is mechanically clamped to the ferrule of a single mode fiber to keep its closeness (5 ?) and perpendicular orientation with respect to the diaphragm. Static measurement of optical output power versus the pressure on membrane reveals more than one period of Fabry-Perot interference, thereby generating a Fabry-Perot diaphragm-fiber interferometer device accurately reproducing audible acoustic wave.Type: GrantFiled: May 18, 2007Date of Patent: July 14, 2009Assignee: New Jersey Institute of TechnologyInventors: Ken K. Chin, Guanhua Feng, Harry Roman
-
Publication number: 20090086214Abstract: The present invention is a diaphragm-fiber optic sensor (DFOS), interferometric sensor. This DFOS is based on the principles of Fabry-Perot and Michelson/Mach-Zehnder. The sensor is low cost and is designed with high efficiency, reliability, and Q-point stability, fabricated using MEMS (micro mechanic-electrical system) technology, and has demonstrated excellent performance. A DFOS according to the invention includes a cavity between two surfaces: a diaphragm made of silicon or other material with a rigid body (or boss) at the center and clamped along its edge, and the endface of a single mode optic fiber. By utilizing MEMS technology, the gap width between the diaphragm and the fiber endface is made accurately, ranging from 1 micron to 10 microns.Type: ApplicationFiled: September 25, 2008Publication date: April 2, 2009Applicant: New Jersey Institute of TechnologyInventors: Ken K. Chin, Guanhua Feng, Ivan Pardon, Harry Roman
-
Publication number: 20090015239Abstract: A system and method in which an overhead high voltage transmission line sensor system is able to measure one or more of temperature, current, and line sag for a conductor within a high voltage transmission line system. The sensor system may be able to clamp to a transmission conductor or splice, harvest power from the transmission line, and/or transmit data corresponding to measurements of current, temperature, and line sag.Type: ApplicationFiled: March 3, 2008Publication date: January 15, 2009Inventors: George E. Georgiou, Ken K. Chin, Raymond Ferraro, Guanhua Feng, Karen Gail Noe
-
Publication number: 20040011962Abstract: The present invention comprises the principle, theory, circuit design, computer simulation, and experimental demonstration of a new type of electronic device—the multi-cycle integration focal plane array (MIFPA)—for lock-in and/or gated imaging, spectroscopy, and/or spectroscopic imaging of extremely weak signals buried in strong background. Particularly, the MIFPA can operate in three modes—the lock-in (LI), gated (G), and gated lock-in (GLI) modes. Particularly, one MIFPA circuitry was demonstrated by simulation and experiment. Particularly, the circuitry was capable to perform the LI-, G-, and GLI-modes.Type: ApplicationFiled: July 18, 2002Publication date: January 22, 2004Inventors: Ken K. Chin, Haijiang Ou
-
Patent number: 6630669Abstract: In the present invention of Correlated Modulation Imaging (CMI), the weak optical image signal (and therefore the signal current) is modulated, and the signal integration direction is correlated to the modulation. Therefore, the dark and/or background current, which are not modulated, are cancelled, while the signal current is integrated. As a result, the total integration time of the signal of each pixel is increased, and its signal to noise ratio and dynamic range are improved. Besides, the CMI noise spectrum peaks at the modulation frequency, and therefore, the detector's 1/f and other low frequency noises can be suppressed. In the present invention, the method and theory of CMI, as well as the means and steps for the realization of CMI, are explicitly developed. Two versions of CMOS devices (CMI unit pre-amplifier version 1 and 3), with their circuitry design and testing data are presented as the critical component for correlated modulation imaging.Type: GrantFiled: March 28, 2000Date of Patent: October 7, 2003Assignee: CF Technologies, Inc.Inventors: Ken K. Chin, Haijiang Ou