Abstract: In an optical filter, a thin film is formed by laminating low refractive index layers alternatingly from a substrate side with high refractive index layers. The thin film is provided with first, second, and third laminated portions. In the first laminated portion, the refractive indices of the high refractive index layers become gradually higher. In the second laminated portion, the refractive indices of the high refractive index layers are substantially equal to the highest refractive index of the high refractive index layers constituting the first laminated portion. In the third laminated portion, the refractive indices of the high refractive index layers become gradually lower, and the refractive indices of the low refractive index layers are substantially equal to the lowest refractive index of the low refractive index layers constituting the second laminated portion.

Abstract: In an optical filter, a thin film is formed by laminating low refractive index layers alternatingly from a substrate side with high refractive index layers. The thin film is provided with first, second, and third laminated portions. In the first laminated portion, the refractive indices of the high refractive index layers become gradually higher. In the second laminated portion, the refractive indices of the high refractive index layers are substantially equal to the highest refractive index of the high refractive index layers constituting the first laminated portion. In the third laminated portion, the refractive indices of the high refractive index layers become gradually lower, and the refractive indices of the low refractive index layers are substantially equal to the lowest refractive index of the low refractive index layers constituting the second laminated portion.

Abstract: In an optical filter, a thin film is formed by laminating low refractive index layers alternatingly from a substrate side with high refractive index layers. The thin film is provided with first, second, and third laminated portions. In the first laminated portion, the refractive indices of the high refractive index layers become gradually higher. In the second laminated portion, the refractive indices of the high refractive index layers are substantially equal to the highest refractive index of the high refractive index layers constituting the first laminated portion. In the third laminated portion, the refractive indices of the high refractive index layers become gradually lower, and the refractive indices of the low refractive index layers are substantially equal to the lowest refractive index of the low refractive index layers constituting the second laminated portion.

Abstract: An imaging apparatus comprises an optical system including a plurality of optical elements having finite refractive power and an electronic imaging device disposed at an image side of the optical system. At least one of the plurality of optical elements is made of resin, and an infrared-cut coating is applied to at least one face of the optical element that is made of resin.

Abstract: A microscope includes an optical element provided with an anti-reflection film applied thereto. The anti-reflection film has the following layered structure: having first to sixth layers of films, in order from the surface of the optical element, formed of a high-refractive-index material for each of the first, third and fifth layers, a low-refractive-index material or a middle-refractive-index material for each of the second and fourth layers, and a low-refractive-index material for the sixth layer, with a range of the optical film-thickness nd of each layer in reference to the design wavelength ? being “(0.13˜0.35)×?/4” for the first layer, “(0.18˜0.75)×?/4” for the second layer, “(0.28˜2.31)×?/4” for the third layer, “(0.26˜0.92)×?/4” for the fourth layer, “(0.20˜0.37)×?/4” for the fifth layer, and “(1.09˜1.18)×?/4” for the sixth layer.

Abstract: A microscope includes an optical element provided with an anti-reflection film applied thereto. The anti-reflection film has the following layered structure: having first to sixth layers of films, in order from the surface of the optical element, formed of a high-refractive-index material for each of the first, third and fifth layers, a low-refractive-index material or a middle-refractive-index material for each of the second and fourth layers, and a low-refractive-index material for the sixth layer, with a range of the optical film-thickness nd of each layer in reference to the design wavelength ? being “(0.13˜0.35)×?/4” for the first layer, “(0.18˜0.75)×?/4” for the second layer, “(0.28˜2.31)×?/4” for the third layer, “(0.26˜0.92)×60 /4” for the fourth layer, “(0.20˜0.37)×?/4” for the fifth layer, and “(1.09˜1.18)×?/4” for the sixth layer.

Abstract: A microscope includes an optical element provided with an anti-reflection film applied thereto. The anti-reflection film has the following layered structure: having first to sixth layers of films, in order from the surface of the optical element, formed of a high-refractive-index material for each of the first, third and fifth layers, a low-refractive-index material or a middle-refractive-index material for each of the second and fourth layers, and a low-refractive-index material for the sixth layer, with a range of the optical film-thickness nd of each layer in reference to the design wavelength ? being “(0.13˜0.35)×?/4” for the first layer, “(0.18˜0.75)×?/4” for the second layer, “(0.28˜2.31)×?/4” for the third layer, “(0.26˜0.92)×?/4” for the fourth layer, “(0.20˜0.37)×?/4” for the fifth layer, and “(1.09˜1.18)×?/4” for the sixth layer.

Abstract: A fluorescence observing apparatus has an excitation filter unit for transmitting only exciting light with particular wavelengths, of illuminating light, and an absorption filter unit for transmitting only fluorescent light produced from a specimen by irradiating the specimen with the exciting light to block the exciting light. In this case, the space between the half-value wavelength on the long-wavelength side of the excitation filter unit and the half-value wavelength on the short-wavelength side of the absorption filter unit is in the range of 6–12 nm, and variations in the half-value wavelengths of the excitation filter unit and the absorption filter unit where humidity is changed from 10% to 95% are within 0.5 nm. Whereby, faint fluorescent light is efficiently taken out and the observation can be made.

Abstract: An apparatus for fluorescence observation includes an excitation filter which transmits only exciting light of an specific wavelength among illumination light, and an absorption filter which blocks the exciting light and transmits only fluorescence generated from a specimen when the exciting light is irradiated to the specimen. Here, an interval of a half-value wavelength at a long-wavelength side of the excitation filter and a half-value wavelength at a short-wavelength side of the absorption filter is in a width between 1 nm to 6 nm, and change of the half-value wavelength of the excitation filter and the absorption filter when humidity changes from 10% to 95%, is 0.5 nm or less.

Abstract: An optical filter is provided with a thin film having: a first laminated portion that is constructed by alternately laminating low refractive index layers that have a relatively low refractive index with high refractive index layers that have a relatively high refractive index, and in which the refractive index of the high refractive index layers gradually increases from the substrate side; a second laminated portion in which the refractive indices of the high refractive index layers are equal to or higher than the highest refractive index from among the high refractive index layers constituting the first laminated portion; and a third laminated portion in which the refractive indices of the high refractive index layers gradually decrease from the second laminated portion side.

Abstract: A microscope includes an optical element provided with an anti-reflection film applied thereto. The anti-reflection film has the following layered structure: having first to sixth layers of films, in order from the surface of the optical element, formed of a high-refractive-index material for each of the first, third and fifth layers, a low-refractive-index material or a middle-refractive-index material for each of the second and fourth layers, and a low-refractive-index material for the sixth layer, with a range of the optical film-thickness nd of each layer in reference to the design wavelength ? being “(0.13˜0.35)×?/4” for the first layer, “(0.18˜0.75)×?/4” for the second layer, “(0.28˜2.31)×?/4” for the third layer, “(0.26˜0.92)×?/4” for the fourth layer, “(0.20˜0.37)×?/4” for the fifth layer, and “(1.09˜1.18)×?/4” for the sixth layer.

Abstract: A fluorescence observing apparatus has an excitation filter unit for transmitting only exciting light with particular wavelengths, of illuminating light, and an absorption filter unit for transmitting only fluorescent light produced from a specimen by irradiating the specimen with the exciting light to block the exciting light. In this case, the space between the half-value wavelength on the long-wavelength side of the excitation filter unit and the half-value wavelength on the short-wavelength side of the absorption filter unit is in the range of 6-12 nm, and variations in the half-value wavelengths of the excitation filter unit and the absorption filter unit where humidity is changed from 10% to 95% are within 0.5 nm. Whereby, faint fluorescent light is efficiently taken out and the observation can be made.

Abstract: In an optical filter, a thin film is formed by laminating low refractive index layers alternatingly from a substrate side with high refractive index layers. The thin film is provided with first, second, and third laminated portions. In the first laminated portion, the refractive indices of the high refractive index layers become gradually higher. In the second laminated portion, the refractive indices of the high refractive index layers are substantially equal to the highest refractive index of the high refractive index layers constituting the first laminated portion. In the third laminated portion, the refractive indices of the high refractive index layers become gradually lower, and the refractive indices of the low refractive index layers are substantially equal to the lowest refractive index of the low refractive index layers constituting the second laminated portion.

Abstract: An optical filter is provided with a thin film having: a first laminated portion that is constructed by alternately laminating low refractive index layers that have a relatively low refractive index with high refractive index layers that have a relatively high refractive index, and in which the refractive index of the high refractive index layers gradually increases from the substrate side; a second laminated portion in which the refractive indices of the high refractive index layers are equal to or higher than the highest refractive index from among the high refractive index layers constituting the first laminated portion; and a third laminated portion in which the refractive indices of the high refractive index layers gradually decrease from the second laminated portion side.

Abstract: A substrate 2 is autorotatably installed in a vacuum chamber 1 at an upper part thereof. MgF2 granules 3 as a film source material are put in a quartz boat 4 and mounted on a magnetron cathode 5. The magnetron cathode 5 is connected through a matching box 6 to a 13.56 MHz radio frequency power source 7. Cooling water 8 for holding the temperature of the magnetron cathode 5 constant flows on a lower face of the magnetron cathode 5. A side face of the vacuum chamber 1 is provided with gas introduction ports 9, 10 for introducing gas in the vacuum chamber 1. A shutter 11 is placed between the magetron cathode 5 and the substrate 2. This structure provides a process enabling forming a thin film at a high speed by sputtering, especially, a high speed sputtering enabling forming a thin fluoride film free of light absorption.

Abstract: A substrate 2 is autorotatably installed in a vacuum chamber 1 at an upper part thereof. MgF2 granules 3 as a film source material are put in a quartz boat 4 and mounted on a magnetron cathode 5. The magnetron cathode 5 is connected through a matching box 6 to a 13.56 MHz radio frequency power source 7. Cooling water 8 for holding the temperature of the magnetron cathode 5 constant flows on a lower face of the magnetron cathode 5. A side face of the vacuum chamber 1 is provided with gas introduction ports 9, 10 for introducing gas in the vacuum chamber 1. A shutter 11 is placed between the magetron cathode 5 and the substrate 2. This structure provides a process enabling forming a thin film at a high speed by sputtering, especially, a high speed sputtering enabling forming a thin fluoride film free of light absorption.

Abstract: A substrate 2 is autorotatably installed in a vacuum chamber 1 at an upper part thereof. MgF2 granules 3 as a film source material are put in a quartz boat 4 and mounted on a magnetron cathode 5. The magnetron cathode 5 is connected through a matching box 6 to a 13.56 MHz radio frequency power source 7. Cooling water 8 for holding the temperature of the magnetron cathode 5 constant flows on a lower face of the magnetron cathode 5. A side face of the vacuum chamber 1 is provided with gas introduction ports 9, 10 for introducing gas in the vacuum chamber 1. A shutter 11 is placed between the magnetron cathode 5 and the substrate 2. This structure provides a process enabling forming a thin film at a high speed by sputtering, especially, a high speed sputtering process enabling forming a thin fluoride film free of light absorption.

Abstract: A substrate 2 is autorotatably installed in a vacuum chamber 1 at an upper part thereof. MgF2 granules 3 as a film source material are put in a quartz boat 4 and mounted on a magnetron cathode 5. The magnetron cathode 5 is connected through a matching box 6 to a 13.56 MHz radio frequency power source 7. Cooling water 8 for holding the temperature of the magnetron cathode 5 constant flows on a lower face of the magnetron cathode 5. A side face of the vacuum chamber 1 is provided with gas introduction ports 9, 10 for introducing gas in the vacuum chamber 1. A shutter 11 is placed between the magnetron cathode 5 and the substrate 2. This structure provides a process enabling forming a thin film at a high speed by sputtering, especially, a high speed sputtering process enabling forming a thin fluoride film free of light absorption in a high speed by sputtering.

Abstract: A substrate (2) is rotatably installed in a vacuum chamber (1) at an upper part thereof MgF.sub.2 granules (3) as a film source material are placed in a quartz boat (4) and mounted on a magnetron cathode (5). The magnetron cathode (5) is connected through a matching box (6) to a 13.56 MHz radio frequency power source (7). Cooling water (8) for holding the temperature of the magnetron cathode (5) constant flows against a lower face of the magnetron cathode (5). A side wall of the vacuum chamber (1) is provided with gas introduction ports (9), (10) for introducing gas in the vacuum chamber (1). A shutter (11) is placed between the magnetron cathode (5) and the substrate (2). This structure provides a process enabling forming a thin film at a high speed by sputtering, especially a high speed sputtering process enabling forming a thin fluoride film free of light absorption.

Abstract: An optical thin film for an optical element is disclosed, which includes at least one layer containing at least one compound selected from the group consisting of MoO.sub.3 and WO.sub.3. A material for use in evaporation coating to prepare a thin film includes a mixture of at least one compound selected from the group consisting of MoO.sub.3 and WO.sub.3 and another dielectric. A further optical thin film includes a substrate and superimposed thereon are alternate layers. One such alternative layer having a high refractive index, and composed of a material containing at least one compound selected from the group consisting of MoO.sub.3 and WO.sub.3. Another of such alternative layers having a low refractive index, and composed of SiO.sub.2. Another thin film includes a substrate and, superimposed thereon, at least one dielectric layer. The at least one dielectric layer being at least one layer containing at least one compound selected from the group consisting of MoO.sub.3 and WO.sub.