Abstract: A polishing slurry including a composite including a hydrophilic fullerene and an ionic compound, a method of manufacturing the same, and a method of manufacturing a semiconductor device.

Abstract: A polishing slurry including a composite including a hydrophilic fullerene and an ionic compound, a method of manufacturing the same, and a method of manufacturing a semiconductor device.

Abstract: A hydroxylated-fullerene-containing solution in which a hydroxylated fullerene is evenly nano-dispersed in a solvent removable at low temperature in a subsequent step is provided. The hydroxylated-fullerene-containing solution includes a continuous phase including a mixed solvent consisting essentially of tetrahydrofuran and water or including melted phenol, and at least one of a hydroxylated fullerene and a hydroxylated fullerene derivative that is dispersed as a dispersed phase in the continuous phase, wherein the number-standard average particle diameter of particles in the dispersed phase is 50 nm or less. This solution is applied onto a surface of a resin molding, and then tetrahydrofuran and water, as the mixed solvent, are removed to form a hydroxylated fullerene layer on the surface of the resin molding. Alternatively, this solution is mingled with a resin, and then the mixed solvent is removed to produce a hydroxylated-fullerene-containing resin composition.

Abstract: A hydroxylated-fullerene-containing solution in which a hydroxylated fullerene is evenly nano-dispersed in a solvent removable at low temperature in a subsequent step is provided. The hydroxylated-fullerene-containing solution includes a continuous phase including a mixed solvent consisting essentially of tetrahydrofuran and water or including melted phenol, and at least one of a hydroxylated fullerene and a hydroxylated fullerene derivative that is dispersed as a dispersed phase in the continuous phase, wherein the number-standard average particle diameter of particles in the dispersed phase is 50 nm or less. This solution is applied onto a surface of a resin molding, and then tetrahydrofuran and water, as the mixed solvent, are removed to form a hydroxylated fullerene layer on the surface of the resin molding. Alternatively, this solution is mingled with a resin, and then the mixed solvent is removed to produce a hydroxylated-fullerene-containing resin composition.

Abstract: Provided is a resin composition having excellent heat resistance by virtue of improved compatibility of a fullerene with a resin. Specifically, provided is a long-chain alkyl-etherified fullerene derivative, including: a fullerene skeleton formed of a spherical shell-shaped carbon molecule; and a long-chain alkyl group having 4 or more carbon atoms, which is bonded to the fullerene skeleton through an ether bond.

Abstract: Provided is a resin composition having excellent heat resistance by virtue of improved compatibility of a fullerene with a resin. Specifically, provided is a long-chain alkyl-etherified fullerene derivative, including: a fullerene skeleton formed of a spherical shell-shaped carbon molecule; and a long-chain alkyl group having 4 or more carbon atoms, which is bonded to the fullerene skeleton through an ether bond.

Abstract: Provided are a novel fullerene derivative which can adsorb quickly and efficiently an allergen which may cause a pollen allergy without releasing the allergen again, does not contain a metal or the like which may cause a harmful effect to a human body, and is easily applicable, impregnable, or chemically bondable onto surface of various materials: and a process for producing the same. The fullerene derivative is characterized in that a halogen group and many hydroxyl groups are bonded directly to a fullerene nucleus. In the case that the halogen group is chlorine, the fullerene derivative can be synthesized by a partial hydroxylation of a chlorinated fullerene or a partial chlorination of a hydroxylated fullerene.

Abstract: Provided are a novel fullerene derivative which can adsorb quickly and efficiently an allergen which may cause a pollen allergy without releasing the allergen again, does not contain a metal or the like which may cause a harmful effect to a human body, and is easily applicable, impregnable, or chemically bondable onto surface of various materials; and a process for producing the same. The fullerene derivative is characterized in that a halogen group and many hydroxyl groups are bonded directly to a fullerene nucleus. In the case that the halogen group is chlorine, the fullerene derivative can be synthesized by a partial hydroxylation of a chlorinated fullerene or a partial chlorination of a hydroxylated fullerene.

Abstract: Provided are a novel fullerene derivative which can adsorb quickly and efficiently an allergen which may cause a pollen allergy without releasing the allergen again, does not contain a metal or the like which may cause a harmful effect to a human body, and is easily applicable, impregnable, or chemically bondable onto surface of various materials: and a process for producing the same. The fullerene derivative is characterized in that a halogen group and many hydroxyl groups are bonded directly to a fullerene nucleus. In the case that the halogen group is chlorine, the fullerene derivative can be synthesized by a partial hydroxylation of a chlorinated fullerene or a partial chlorination of a hydroxylated fullerene.

Abstract: Provided are a novel fullerene derivative which can adsorb quickly and efficiently an allergen which may cause a pollen allergy without releasing the allergen again, does not contain a metal or the like which may cause a harmful effect to a human body, and is easily applicable, impregnable, or chemically bondable onto surface of various materials; and a process for producing the same. The fullerene derivative is characterized in that a halogen group and many hydroxyl groups are bonded directly to a fullerene nucleus. In the case that the halogen group is chlorine, the fullerene derivative can be synthesized by a partial hydroxylation of a chlorinated fullerene or a partial chlorination of a hydroxylated fullerene.

Abstract: A fullerene in which a solvent remains is subjected to heat treatment at a temperature higher than the boiling point of the solvent by 150° C. or more under a reduced pressure of 50 Torr or lower to reduce the residual amount of the solvent, and in order to allow the fullerene to be applied to drug products, the biohazardous residual solvent is reduced by a convenient method and removed until its concentration becomes equal to or lower than the regulatory limit.