Patents by Inventor Ken Krieg

Ken Krieg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070076976
    Abstract: Methods for eliminating artifacts in two-dimensional optical metrology utilizing the interline CCD detectors are based on a dark-subtraction principle. The self-dark subtraction method takes advantage of strong correlation between the noise patterns in illuminated and dark regions within the same image. Image artifacts are removed and the S/N ratio is improved significantly by subtraction of selected dark region of the image from the illuminated one within the same frame. The dark-frame subtraction technique reduces a “smear” effect by applying a digital processing based on subtraction of the dark frame images from the normal light frame images. A combination of these methods significantly improves performance of two-dimensional optical metrology systems such as spectrometers, ellipsometers, beam profile reflectometers/ellipsometers, scatterometers and spectroscopic scatterometers.
    Type: Application
    Filed: August 4, 2006
    Publication date: April 5, 2007
    Inventors: Craig Uhrich, Lanhua Wei, Jeffrey Fanton, Ken Krieg