Patents by Inventor Ken Tsutsui
Ken Tsutsui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120025196Abstract: An organic thin film transistor includes an organic semiconductor layer, a source electrode and a drain electrode which are separated from each other and are individually in contact with the organic semiconductor layer, a gate insulating film which is in contact with the organic semiconductor layer between the source and drain electrodes, and a gate electrode which is opposed to the organic semiconductor layer and is in contact with the gate insulating film. In the organic thin film transistor, a high-concentration region of the organic semiconductor layer which is located near the source electrode has an impurity concentration set higher than an impurity concentration of a low-concentration region of the organic semiconductor layer, the low-concentration region being located near the gate electrode in the thickness direction of the organic semiconductor layer between the source and drain electrodes.Type: ApplicationFiled: January 18, 2010Publication date: February 2, 2012Applicant: TOYO UNIVERSITYInventors: Yasuo Wada, Toru Toyabe, Ken Tsutsui
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Patent number: 7272450Abstract: A development aid device for development of a ladder program for a programmable controller has a program memory for storing the ladder program and an outline data generating part for sequentially scanning constituent elements of this stored ladder program to extract specified elements including output commands and generating outline data by assigning individual index numbers to these extracted elements sequentially in the order of their appearance on the ladder program. An outline data memory stores the generated outline data. A cross-reference data generating part generates cross-reference data by extracting commands having a same operand from the ladder program, and a cross-reference data memory stores the generated cross-reference data.Type: GrantFiled: March 29, 2005Date of Patent: September 18, 2007Assignee: OMRON CorporationInventors: Makoto Inoue, Ken Tsutsui, Takashi Miyake
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Patent number: 7272825Abstract: A development aid device for development of a ladder program such as a user program for a programmable controller has a program memory for storing the user program and an outline data generating part for sequentially scanning constituent elements of this stored user program to extract specified elements including output commands and generating outline data by assigning individual index numbers to these extracted elements sequentially in the order of their appearance on the user program. An outline data memory stores the generated outline data. A cross-reference data generating part generates cross-reference data by extracting commands having a same operand from the user program, and a cross-reference data memory stores the generated cross-reference data.Type: GrantFiled: June 26, 2006Date of Patent: September 18, 2007Assignee: OMRON CorporationInventors: Makoto Inoue, Ken Tsutsui, Takashi Miyake
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Publication number: 20070078538Abstract: The present invention aims to provide a debug device for efficiently and smoothly performing the debugging process of the control program including function blocks. In the debug device for executing each step configuring the control program including the function blocks one step at a time, a step-over function for continuously executing the program in the function block, and moving the executing position to the step after the execution of the function program in the control program when the next executing position is the function block (FIG. A); a step-in function for having the head position of the program in the function block as the next executing position when the next executing position is the function block; and a step-out function for continuously executing from the next executing position to the end of the function block and moving the executing position to the step after the execution of the function block when the next executing position is the step of the program in the function block are provided.Type: ApplicationFiled: September 29, 2006Publication date: April 5, 2007Inventors: Yukihiro Kawakami, Yutaka Abe, Ken Tsutsui, Koji Yaoita, Takahisa Hasegawa
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Publication number: 20060247806Abstract: A development aid device for development of a ladder program such as a user program for a programmable controller has a program memory for storing the user program and an outline data generating part for sequentially scanning constituent elements of this stored user program to extract specified elements including output commands and generating outline data by assigning individual index numbers to these extracted elements sequentially in the order of their appearance on the user program. An outline data memory stores the generated outline data. A cross-reference data generating part generates cross-reference data by extracting commands having a same operand from the user program, and a cross-reference data memory stores the generated cross-reference data.Type: ApplicationFiled: June 26, 2006Publication date: November 2, 2006Inventors: Makoto Inoue, Ken Tsutsui, Takashi Miyake
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Microsystem, microopening film, and system and method for analizing interaction between biomolecules
Publication number: 20060021666Abstract: A micro system capable of setting an appropriate amount of stimulation being applied in order to control liquid flow in a channel. The micro system comprises micro-heaters (5b, 5c) for applying stimulation to liquid flowing through liquid channels (2b, 2c) formed in a plate (1) and controlling liquid flow by the stimulation from the micro-heaters (5b, 5c), and a means for electrically controlling the amount of stimulation being applied to the liquid from the micro-heaters (5b, 5c). An appropriate amount of stimulation can be set by electrically controlling the amount of stimulation being applied to the liquid from the micro-heaters (5b, 5c) through the control means.Type: ApplicationFiled: October 30, 2003Publication date: February 2, 2006Applicant: Waseda UniversityInventors: Takashi Funatsu, Shuichi Shoji, Yasuo Wada, Ken Tsutsui, Jun Mizuno, Yoshitaka Shirasaki -
Publication number: 20050222697Abstract: A development aid device for development of a ladder program for a programmable controller has a program memory for storing the ladder program and an outline data generating part for sequentially scanning constituent elements of this stored ladder program to extract specified elements including output commands and generating outline data by assigning individual index numbers to these extracted elements sequentially in the order of their appearance on the ladder program. An outline data memory stores the generated outline data. A cross-reference data generating part generates cross-reference data by extracting commands having a same operand from the ladder program, and a cross-reference data memory stores the generated cross-reference data.Type: ApplicationFiled: March 29, 2005Publication date: October 6, 2005Inventors: Makoto Inoue, Ken Tsutsui, Takashi Miyake
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Publication number: 20030132498Abstract: The prevention of the deterioration of the minority carrier lifetime of a semiconductor substrate can be achieved by patterning the material of an impurity diffusion protecting layer on the surface of a semiconductor substrate by a making except a thermal oxidation process of the semiconductor substrate, for example by printing and firing paste material or by depositing paste material using a mask by CVD and forming a diffusion layer in the shape of an inverted pattern of the impurity diffusion protecting layer. Also, a low-priced photovoltaic device the photo-electric conversion efficiency of which is high can be manufactured by patterning and forming them.Type: ApplicationFiled: July 15, 2002Publication date: July 17, 2003Applicant: Hitachi, Ltd.Inventors: Tsuyoshi Uematsu, Ken Tsutsui, Toshio Johge
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Patent number: 6461947Abstract: To form an impurity diffusion layer on only one side of a semiconductor substrate at least one semiconductor substrate and at least one diffusion protecting plate are put close to each other and a first impurity diffusion is perfomed on them, or at least one semiconductor substrate and at least one diffusion protecting plate are put close to each other and a first impurity diffusion is performed on them and then the semiconductor substrate and the diffusion protecting plate are arranged such that those sides on which the impurity diffusion has been performed face each other and a second impurity diffusion is performed. The diffusion protecting plate may be replaced by a semiconductor substrate. The first and second impurity diffusions may be performed using an impurity of the same conductivity type.Type: GrantFiled: September 7, 2000Date of Patent: October 8, 2002Assignee: Hitachi, Ltd.Inventors: Tsuyoshi Uematsu, Yoshiaki Yazawa, Hiroyuki Ohtsuka, Ken Tsutsui
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Publication number: 20020046765Abstract: A photovoltaic cell produced by adhering a material for masking layer to a surface of a semiconductor substrate in pattern state to form the masking layer, and forming a dopant layer on the portion having no masking layer by gas phase diffusion or solid phase diffusion is high in photoelectric conversion efficiency and is effective for preventing lowering of minority carrier lifetime of the semiconductor substrate.Type: ApplicationFiled: March 20, 2001Publication date: April 25, 2002Inventors: Tsuyoshi Uematsu, Yoshiaki Yazawa, Hiroyuki Ohtsuka, Ken Tsutsui
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Patent number: 6323415Abstract: A light concentrator photovoltaic module includes a medium having a light receiving plane, a plurality of photovoltaic elements arranged in a spaced relationship with the light receiving plane, and a light reflecting plane for conducting light incident upon the light receiving plane but is not directly received by the photovoltaic elements to the photovoltaic elements.Type: GrantFiled: September 17, 1999Date of Patent: November 27, 2001Assignee: Hitachi, Ltd.Inventors: Tsuyoshi Uematsu, Terunori Warabisako, Yoshiaki Yazawa, Yoshinori Miyamura, Ken Tsutsui, Shin-ichi Muramatsu, Hiroyuki Ohtsuka, Junko Minemura
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Patent number: 6294723Abstract: Disclosed is a photovoltaic module including a plurality of concentrators each having a light-incident plane and a reflection plane, and photo detectors. Each photo detector is in contact with one of the concentrators. The module is capable of effectively trapping light and effectively generating power throughout the year even if the module is established such that sunlight at the equinoxes is made incident on the light-incident planes not in a perpendicular manner but instead obliquely, for example, in the case where the module is established in contact with a curved plane of a roof, or the like.Type: GrantFiled: February 23, 1999Date of Patent: September 25, 2001Assignee: Hitachi, Ltd.Inventors: Tsuyoshi Uematsu, Terunori Warabisako, Yoshiaki Yazawa, Yoshinori Miyamura, Ken Tsutsui, Shin-ichi Muramatsu, Hiroyuki Ohtsuka, Junko Minemura
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Publication number: 20010008144Abstract: Disclosed is a photovoltaic module including a plurality of concentrators each having a light-incident plane and a reflection plane, and photo detectors each being in contact with one of the concentrators, which is capable of effectively trapping light and effectively generating power throughout the year even if the module is established such that sunlight at the equinoxes is made incident on the light-incident planes not perpendicularly but obliquely from the right, upper side, for example, in the case where the module is established in contact with a curved plane of a roof or the like.Type: ApplicationFiled: February 23, 1999Publication date: July 19, 2001Inventors: TSUYOSHI UEMATSU, TERUNORI WARABISAKO, YOSHIAKI YAZAWA, YOSHINORI MIYAMURA, KEN TSUTSUI, SHIN-ICHI MURAMATSU, HIROYUKI OHTSUKA, JUNKO MINEMURA
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Patent number: 5889573Abstract: The present invention concerns an active-matrix addressed TFT substrate using a thin film transistor, a manufacturing method and an anodic oxidation method thereof, a liquid crystal display panel using the TFT substrate and a liquid crystal display equipment using the liquid crystal display panel and, more in particular, it relates to a structure and a manufacturing method which enables to improve the characteristics thereof.In the present invention, Cr or Ta is used for gate terminals, aluminum or a metal mainly composed of aluminum is used for gate bus-lines extended therefrom, gate electrodes and thin film capacitances (additional capacitance, storage capacitance) and an anodic oxidized film composed of the metal and free from defect is used for at least one of gate insulators, dielectric films of the thin film capacitances and interlayer insulation films for the intersections between the bus-lines.Type: GrantFiled: September 12, 1997Date of Patent: March 30, 1999Assignee: Hitachi, Ltd.Inventors: Hideaki Yamamoto, Haruo Matsumaru, Yasuo Tanaka, Ken Tsutsui, Toshihisa Tsukada, Kazuo Shirahashi, Akira Sasano, Yuka Matsukawa
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Patent number: 5719408Abstract: In the present invention, Cr or Ta is used for gate terminals, aluminum or a metal mainly composed of aluminum is used for gate bus-lines extended therefrom, gate electrodes and thin film capacitances (additional capacitance, storage capacitance) and an anodic oxidized film composed of the metal and free from defect is used for at least one of gate insulators, dielectric films of the thin film capacitances and interlayer insulation films for the intersections between the bus-lines. In a more preferred structure, the anodic oxidized film is used for all of the gate insulators, the dielectric films for the thin film capacitances and the interlayer insulation films for the intersections between the bus lines. The present invention also relates to a method of selectively forming an anodic oxidized film on an aluminum pattern. That is, in a case of forming a selective oxidation mask to a desired region on the aluminum pattern with a positive type photoresist, in the present invention, an angle (.theta.Type: GrantFiled: February 21, 1997Date of Patent: February 17, 1998Assignee: Hitachi, Ltd.Inventors: Hideaki Yamamoto, Haruo Matsumaru, Yasuo Tanaka, Ken Tsutsui, Toshihisa Tsukada, Kazuo Shirahashi, Akira Sasano, Yuka Matsukawa
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Patent number: 5672523Abstract: The present invention concerns an active-matrix addressed TFT substrate using a thin film transistor, a manufacturing method and an anodic oxidation method thereof, a liquid crystal display panel using the TFT substrate and a liquid crystal display equipment using the liquid crystal display panel. Cr or Ta is used for gate terminals; aluminum or a metal composed mainly of aluminum is used for gate bus-lines extended therefrom, gate electrodes and thin film capacitances (additional capacitance, storage capacitance); and an anodic oxidized film composed of the metal and free from defect is used for at least one of gate insulators, dielectric films of the thin film capacitances and interlayer insulation films for the intersections between the bus-lines. In forming a selective oxidation mask to a desired region on the aluminum pattern with a positive type photoresist, for the anodic oxidation, an angle (.theta.) formed between the selective oxidation mask and the aluminum pattern is made as: .beta..gtoreq.Type: GrantFiled: May 26, 1995Date of Patent: September 30, 1997Assignee: Hitachi, Ltd.Inventors: Hideaki Yamamoto, Haruo Matsumaru, Yasuo Tanaka, Ken Tsutsui, Toshihisa Tsukada, Kazuo Shirahashi, Akira Sasano, Yuka Matsukawa
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Patent number: 5585290Abstract: The present invention concerns an active-matrix addressed TFT substrate using a thin film transistor, a manufacturing method and an anodic oxidation method thereof, a liquid crystal display panel using the TFT substrate and a liquid crystal display equipment using the liquid crystal display panel and, more in particular, it relates to a structure and a manufacturing method which enables to improve the characteristics thereof. In the present invention, Cr or Ta is used for gate terminals, aluminum or a metal mainly composed of aluminum is used for gate bus-lines extended therefrom, gate electrodes and thin film capacitances (additional capacitance, storage capacitance) and an anodic oxidized film composed of the metal and free from defect is used for at least one of gate insulators, dielectric films of the thin film capacitances and interlayer insulation films for the intersections between the bus-lines.Type: GrantFiled: November 29, 1993Date of Patent: December 17, 1996Assignee: Hitachi, Ltd.Inventors: Hideaki Yamamoto, Haruo Matsumaru, Yasuo Tanaka, Ken Tsutsui, Toshihisa Tsukada, Kazuo Shirahashi, Akira Sasano, Yuka Matsukawa
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Patent number: 5359206Abstract: Disclosed is an active-matrix addressed TFT substrate using a thin film transistor, a manufacturing method and an anodic oxidation method thereof, a liquid crystal display panel using the TFT substrate and a liquid crystal display equipment using the liquid crystal display panel. In the TFT substrate, Cr or Ta is used for gate terminals, aluminum or a metal mainly composed of aluminum is used for gate bus-lines extending therefrom, for gate electrodes, and for electrodes of thin film capacitors (additional capacitance, storage capacitance), and an anodic oxidized film composed of the metal and free from defect is used for at least one of gate insulators, dielectric films of the thin film capacitances and interlayer insulating films for the intersections between the bus-lines. Also disclosed is a method of selectively forming an anodic oxidized film on an aluminum pattern.Type: GrantFiled: April 15, 1991Date of Patent: October 25, 1994Assignee: Hitachi, Ltd.Inventors: Hideaki Yamamoto, Haruo Matsumaru, Yasuo Tanaka, Ken Tsutsui, Toshihisa Tsukada, Kazuo Shirahashi, Akira Sasano, Yuka Matsukawa
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Patent number: 5200634Abstract: A thin film phototransistor is provided having a field effect transistor structure where at least one end of the gate electrode is not overlapped with an electrode neighboring the end. Such a thin film phototransistor has: (1) a function as a photosensor and a switching function; (2) a high input impedance; (3) a voltage control function; and (4) a high photocurrent ON/OFF ratio. This thin film phototransistor can be used independently or together with a thin film transistor for picture elements of a one-dimensional or two-dimensional photosensor array, producing satisfactory results.Type: GrantFiled: December 9, 1991Date of Patent: April 6, 1993Assignee: Hitachi, Ltd.Inventors: Toshihisa Tsukada, Yoshiyuki Kaneko, Hideaki Yamamoto, Norio Koike, Ken Tsutsui, Haruo Matsumaru, Yasuo Tanaka
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Patent number: 5032531Abstract: In a first manufacturing step of an active matrix liquid-crystal panel, a transparent conductor film and a metal film are sequentially accumulated on a substrate in this order so as to form a two-layer film. The two-layer film including the transparent conductor film and the metal film is subjected to photoetching to simultaneously form at least a pixel electrode (transparent conductor film) and a gate electrode (metal film) of a thin-film transistor according to a predetermined pattern. In a fabrication process near the end of the fabrication, when the source and drain electrodes of the thin-film transistors are formed, the metal film on the pixel electrode is simultaneously removed. Since the removal of the metal film protecting the pixel electrode is simultaneously achieved at a point near the final process, protection of the pixel electrode is guaranteed, thereby realizing improvement of the yielding and reduction of the production process.Type: GrantFiled: July 7, 1989Date of Patent: July 16, 1991Assignee: Hitachi, Ltd.Inventors: Ken Tsutsui, Toshihisa Tsukada, Hideaki Yamamoto, Yasuo Tanaka, Haruo Matsumaru