Patents by Inventor Ken Tze-Kin Chan

Ken Tze-Kin Chan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Registration and alignment technique for X-ray mask fabrication
    Patent number: 5570405
    Abstract: An X-ray mask includes one or more X-ray transparent mask windows and at least one pattern-to-mask alignment mark etched into the mask substrate from the same side as the mask windows. The pattern-to-mask alignment marks can be etched at the same time as the mask windows and are detectable from the front surface of the mask substrate by an electron beam lithography system prior to creating the circuit pattern. The alignment marks are detected by the absence of backscattered electrons at the pattern-to-mask alignment marks.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: October 29, 1996
    Assignee: International Business Machines Corporation
    Inventors: Ken Tze-Kin Chan, William A. Enichen, John G. Hartley, Maris A. Sturans