Patents by Inventor Ken Yeh

Ken Yeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7666702
    Abstract: A method for fabricating a microstructure is to form at least one insulation layer including a micro-electro-mechanical structure therein over an upper surface of a silicon substrate. The micro-electro-mechanical structure includes at least one microstructure and a metal sacrificial structure that are independent with each other. In the metal sacrificial structure are formed a plurality of metal layers and a plurality of metal via layers connected to the respective metal layers. A barrier layer is formed over an upper surface of the insulation layer, and an etching stop layer is subsequently formed over a lower surface of the silicon substrate. An etching operation is carried out from the lower surface of the silicon substrate to form a space corresponding to the micro-electro-mechanical structure, and then the metal sacrificial structure is etched, thus achieving a microstructure suspension.
    Type: Grant
    Filed: November 28, 2007
    Date of Patent: February 23, 2010
    Assignee: MEMSmart Semiconductor Corp.
    Inventors: Sheng-Hung Li, Siew-Seong Tan, Cheng-Yen Liu, Li-Ken Yeh
  • Publication number: 20090137113
    Abstract: A method for fabricating a microstructure is to form at least one insulation layer including a micro-electro-mechanical structure therein over an upper surface of a silicon substrate. The micro-electro-mechanical structure includes at least one microstructure and a metal sacrificial structure that are independent with each other. In the metal sacrificial structure are formed a plurality of metal layers and a plurality of metal via layers connected to the respective metal layers. A barrier layer is formed over an upper surface of the insulation layer, and an etching stop layer is subsequently formed over a lower surface of the silicon substrate. An etching operation is carried out from the lower surface of the silicon substrate to form a space corresponding to the micro-electro-mechanical structure, and then the metal sacrificial structure is etched, thus achieving a microstructure suspension.
    Type: Application
    Filed: November 28, 2007
    Publication date: May 28, 2009
    Inventors: Sheng Hung Li, Siew-Seong Tan, Cheng-Yen Liu, Li-Ken Yeh
  • Publication number: 20090057817
    Abstract: A micro electromechanical system and a fabrication method thereof, which has trenches formed on a substrate to prevent circuits from interfering each other, and to prevent over-etching of the substrate when releasing a microstructure.
    Type: Application
    Filed: August 27, 2007
    Publication date: March 5, 2009
    Inventors: Li-Ken YEH, I-Hsiang CHIU