Patents by Inventor Keneth Lin

Keneth Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Devices for controlling electron emission in plasma flood system
    Patent number: 6822395
    Abstract: A device for controlling emission of electrons from an arc chamber of a plasma flood system into an ion beam in an ion implanter for implanting ions into a substrate. In one embodiment, the invention comprises a mechanical shutter disposed in a discharge opening between the arc chamber and the plasma guide tube of the implanter. The bore size of the shutter can be selectively varied in order to control the emission of electrons from the arc chamber into the ion beam in the plasma guide tube. In another embodiment, the invention comprises an electron-attracting probe which is disposed in the discharge opening.
    Type: Grant
    Filed: September 3, 2002
    Date of Patent: November 23, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Ming-Hsing Li, Min-Tsung Lee, Keneth Lin, Yow-Te Tsai, Huang-Ta Huang, Chao-Chun Chen, Huei-Mei Jao