Patents by Inventor KENG-CHIEH CHU

KENG-CHIEH CHU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11955312
    Abstract: A physical analysis method, a sample for physical analysis and a preparing method thereof are provided. The preparing method of the sample for physical analysis includes: providing a sample to be inspected; and forming a contrast enhancement layer on a surface of the sample to be inspected. The contrast enhancement layer includes a plurality of first material layers and a plurality of second material layers stacked upon one another. The first material layer and the second material layer are made of different materials. Each one of the first and second material layers has a thickness that does not exceed 0.1 nm. In an image captured by an electron microscope, a difference between an average grayscale value of a surface layer image of the sample to be inspected and an average grayscale value of an image of the contrast enhancement layer is at least 50.
    Type: Grant
    Filed: December 23, 2021
    Date of Patent: April 9, 2024
    Assignee: MATERIALS ANALYSIS TECHNOLOGY INC.
    Inventors: Chien-Wei Wu, Keng-Chieh Chu, Yung-Sheng Fang, Chun-Wei Wu, Hung-Jen Chen
  • Patent number: 11946945
    Abstract: A sample analyzing method and a sample preparing method are provided. The sample analyzing method includes a sample preparing step, a placing step, and an analyzing step. The sample preparing step includes an obtaining step implemented by obtaining an identification information; and a marking and placing step implemented by placing a sample carrying component having a sample disposed thereon into a marking equipment, allowing the marking equipment to utilize the identification information to form an identification structure on the sample carrying component, and placing the sample carrying component into one of the accommodating slots according to the identification information. The placing step is implemented by taking out the sample carrying component from one of the accommodating slots and placing the sample carrying component into an electron microscope equipment. The analyzing step is implemented by utilizing the electron microscope equipment to photograph the sample to generate an analyzation image.
    Type: Grant
    Filed: July 29, 2021
    Date of Patent: April 2, 2024
    Assignee: MATERIALS ANALYSIS TECHNOLOGY INC.
    Inventors: Keng-Chieh Chu, Tsung-Ju Chan, Chun-Wei Wu, Hung-Jen Chen
  • Publication number: 20220334140
    Abstract: A sample analyzing method and a sample preparing method are provided. The sample analyzing method includes a sample preparing step, a placing step, and an analyzing step. The sample preparing step includes an obtaining step implemented by obtaining an identification information; and a marking and placing step implemented by placing a sample carrying component having a sample disposed thereon into a marking equipment, allowing the marking equipment to utilize the identification information to form an identification structure on the sample carrying component, and placing the sample carrying component into one of the accommodating slots according to the identification information. The placing step is implemented by taking out the sample carrying component from one of the accommodating slots and placing the sample carrying component into an electron microscope equipment. The analyzing step is implemented by utilizing the electron microscope equipment to photograph the sample to generate an analyzation image.
    Type: Application
    Filed: July 29, 2021
    Publication date: October 20, 2022
    Inventors: KENG-CHIEH CHU, TSUNG-JU CHAN, CHUN-WEI WU, HUNG-JEN CHEN
  • Publication number: 20220223373
    Abstract: A physical analysis method, a sample for physical analysis and a preparing method thereof are provided. The preparing method of the sample for physical analysis includes: providing a sample to be inspected; and forming a contrast enhancement layer on a surface of the sample to be inspected. The contrast enhancement layer includes a plurality of first material layers and a plurality of second material layers stacked upon one another. The first material layer and the second material layer are made of different materials. Each one of the first and second material layers has a thickness that does not exceed 0.1 nm. In an image captured by an electron microscope, a difference between an average grayscale value of a surface layer image of the sample to be inspected and an average grayscale value of an image of the contrast enhancement layer is at least 50.
    Type: Application
    Filed: December 23, 2021
    Publication date: July 14, 2022
    Inventors: CHIEN-WEI WU, KENG-CHIEH CHU, YUNG-SHENG FANG, CHUN-WEI WU, HUNG-JEN CHEN