Patents by Inventor Keng-Ying Liao
Keng-Ying Liao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240136383Abstract: A semiconductor device includes a single-layered dielectric layer, a conductive line, a conductive via and a conductive pad. The conductive line and the conductive via are disposed in the single-layered dielectric layer. The conductive pad is extended into the single-layered dielectric layer to electrically connected to the conductive line.Type: ApplicationFiled: January 3, 2024Publication date: April 25, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yu-Chien Ku, Huai-Jen Tung, Keng-Ying Liao, Yi-Hung Chen, Shih-Hsun Hsu, Yi-Fang Yang
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Publication number: 20240136444Abstract: A flash memory device and method of making the same are disclosed. The flash memory device is located on a substrate and includes a floating gate electrode, a tunnel dielectric layer located between the substrate and the floating gate electrode, a smaller length control gate electrode and a control gate dielectric layer located between the floating gate electrode and the smaller length control gate electrode. The length of a major axis of the smaller length control gate electrode is less than a length of a major axis of the floating gate electrode.Type: ApplicationFiled: December 22, 2023Publication date: April 25, 2024Inventors: Yu-Chu Lin, Chi-Chung Jen, Wen-Chih Chiang, Yi-Ling Liu, Huai-Jen Tung, Keng-Ying Liao
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Publication number: 20240096998Abstract: The present disclosure describes a method for forming metallization layers that include a ruthenium metal liner and a cobalt metal fill. The method includes depositing a first dielectric on a substrate having a gate structure and source/drain (S/D) structures, forming an opening in the first dielectric to expose the S/D structures, and depositing a ruthenium metal on bottom and sidewall surfaces of the opening. The method further includes depositing a cobalt metal on the ruthenium metal to fill the opening, reflowing the cobalt metal, and planarizing the cobalt and ruthenium metals to form S/D conductive structures with a top surface coplanar with a top surface of the first dielectric.Type: ApplicationFiled: November 21, 2023Publication date: March 21, 2024Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Shuen-Shin LIANG, Chij-chien CHI, Yi-Ying LIU, Chia-Hung CHU, Hsu-Kai CHANG, Cheng-Wei CHANG, Chein-Shun LIAO, Keng-chu LIN, KAi-Ting HUANG
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Patent number: 11903193Abstract: A MOSFET device and method of making, the device including a floating gate layer formed within a trench in a substrate, a tunnel dielectric layer located on sidewalls and a bottom of the trench, a control gate dielectric layer located on a top surface of the floating gate layer, a control gate layer located on a top surface of the control gate dielectric layer and sidewall spacers located on sidewalls of the control gate dielectric layer and the control gate layer.Type: GrantFiled: July 13, 2022Date of Patent: February 13, 2024Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Chi-Chung Jen, Yu-Chu Lin, Y. C. Kuo, Wen-Chih Chiang, Keng-Ying Liao, Huai-Jen Tung
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Patent number: 11901390Abstract: A semiconductor device includes a substrate, a dielectric layer, a plurality of dielectric patterns and a conductive pad. The substrate includes a first surface and a second surface opposite to the first surface. The dielectric layer is disposed at the first surface of the substrate, and the substrate is disposed between the dielectric layer and the second surface of the substrate. The dielectric patterns are disposed on the dielectric layer and between the first surface and the second surface of the substrate. The conductive pad is inserted between the plurality of dielectric patterns and extended into the dielectric layer.Type: GrantFiled: November 15, 2021Date of Patent: February 13, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yu-Chien Ku, Huai-Jen Tung, Keng-Ying Liao, Yi-Hung Chen, Shih-Hsun Hsu, Yi-Fang Yang
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Publication number: 20240047496Abstract: An image sensor includes a substrate, a grid, and a color filter. The grid is over the substrate. From a cross-sectional view, the grid includes a first grid and a second grid over the first grid, the first grid has lower portion that has a first sidewall and a second sidewall opposing the first sidewall, the second grid has a third sidewall and a fourth sidewall opposing the third sidewall, and a width between the third sidewall and the fourth sidewall is less than a width between the first sidewall and the second sidewall. The color filter extends through the grid structure.Type: ApplicationFiled: October 17, 2023Publication date: February 8, 2024Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chin-Yu LIN, Keng-Ying LIAO, Su-Yu YEH, Po-Zen CHEN, Huai-Jen TUNG, Hsien-Li CHEN
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Patent number: 11888074Abstract: A flash memory device and method of making the same are disclosed. The flash memory device is located on a substrate and includes a floating gate electrode, a tunnel dielectric layer located between the substrate and the floating gate electrode, a smaller length control gate electrode and a control gate dielectric layer located between the floating gate electrode and the smaller length control gate electrode. The length of a major axis of the smaller length control gate electrode is less than a length of a major axis of the floating gate electrode.Type: GrantFiled: July 19, 2022Date of Patent: January 30, 2024Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Yu-Chu Lin, Chi-Chung Jen, Yi-Ling Liu, Wen-Chih Chiang, Keng-Ying Liao, Huai-Jen Tung
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Publication number: 20230389309Abstract: The present disclosure describes a patterning process for a strap region in a memory cell for the removal of material between polysilicon lines. The patterning process includes depositing a first hard mask layer in a divot formed on a top portion of a polysilicon layer interposed between a first polysilicon gate structure and a second polysilicon gate; depositing a second hard mask layer on the first hard mask layer. The patterning process also includes performing a first etch to remove the second hard mask layer and a portion of the second hard mask layer from the divot; performing a second etch to remove the second hard mask layer from the divot; and performing a third etch to remove the polysilicon layer not covered by the first and second hard mask layers to form a separation between the first polysilicon gate structure and the second polysilicon structure.Type: ApplicationFiled: August 10, 2023Publication date: November 30, 2023Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yen-Jou WU, Hsin-Hui Lin, Yu-Liang Wang, Chih-Ming Lee, Keng-Ying Liao, Ping-Pang Hsieh, Su-Yu Yeh
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Publication number: 20230369430Abstract: A method includes sequentially depositing a floating gate layer, a dielectric structure stack, and a control gate layer over a substrate. A first etching process is performed to pattern the control gate layer, the dielectric structure stack, and a top portion of the floating gate layer to form a control gate, a dielectric structure, and a top portion of a floating gate over a bottom portion of the floating gate layer. A sidewall of the top portion of the floating gate is concave. A first spacer structure is formed on the sidewall of the top portion of the floating gate, a sidewall of the dielectric structure, and a sidewall of the control gate. A second etching process is performed to pattern the bottom portion of the floating gate layer to form a bottom portion of the floating gate after forming the first spacer structure.Type: ApplicationFiled: July 25, 2023Publication date: November 16, 2023Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yu-Chu LIN, Chi-Chung JEN, Chia-Ming PAN, Su-Yu YEH, Keng-Ying LIAO, Chih-Wei SUNG
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Patent number: 11804529Abstract: A method includes depositing a gate dielectric film over a substrate. A floating gate layer and a control gate layer are deposited over the gate dielectric film. The control gate layer is patterned to form a control gate over the floating gate layer. A top portion of the floating gate layer is patterned. A spacer structure is formed on a sidewall of the control gate and over a remaining portion of the floating gate layer. The remaining portion of the floating gate layer is patterned to form a bottom portion of a floating gate. A ratio of the bottom width of the bottom portion to the middle width of the bottom portion is in a range between about 103% and about 108%. The gate dielectric film is patterned form a gate dielectric layer.Type: GrantFiled: March 18, 2022Date of Patent: October 31, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yu-Chu Lin, Chi-Chung Jen, Chia-Ming Pan, Su-Yu Yeh, Keng-Ying Liao, Chih-Wei Sung
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Publication number: 20230343844Abstract: A flash memory device includes a floating gate electrode formed within a substrate semiconductor layer having a doping of a first conductivity type, a pair of active regions formed within the substrate semiconductor layer, having a doping of a second conductivity type, and laterally spaced apart by the floating gate electrode, an erase gate electrode formed within the substrate semiconductor layer and laterally offset from the floating gate electrode, and a control gate electrode that overlies the floating gate electrode. The floating gate electrode may be formed in a first opening in the substrate semiconductor layer, and the erase gate electrode may be formed in a second opening in the substrate semiconductor layer. Multiple instances of the flash memory device may be arranged as a two-dimensional array of flash memory cells.Type: ApplicationFiled: June 19, 2023Publication date: October 26, 2023Inventors: Yu-Chu Lin, Chia-Ming Pan, Chi-Chung Jen, Wen-Chih Chiang, Huai-Jen Tung, Keng-Ying Liao
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Patent number: 11792981Abstract: A MOSFET device and method of making, the device including a floating gate layer formed within a trench in a substrate, a tunnel dielectric layer located on sidewalls and a bottom of the trench, a control gate dielectric layer located on a top surface of the floating gate layer, a control gate layer located on a top surface of the control gate dielectric layer and sidewall spacers located on sidewalls of the control gate dielectric layer and the control gate layer.Type: GrantFiled: August 24, 2020Date of Patent: October 17, 2023Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Chi-Chung Jen, Yu-Chu Lin, Y. C. Kuo, Wen-Chih Chiang, Keng-Ying Liao, Huai-Jen Tung
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Patent number: 11728399Abstract: A flash memory device includes a floating gate electrode formed within a substrate semiconductor layer having a doping of a first conductivity type, a pair of active regions formed within the substrate semiconductor layer, having a doping of a second conductivity type, and laterally spaced apart by the floating gate electrode, an erase gate electrode formed within the substrate semiconductor layer and laterally offset from the floating gate electrode, and a control gate electrode that overlies the floating gate electrode. The floating gate electrode may be formed in a first opening in the substrate semiconductor layer, and the erase gate electrode may be formed in a second opening in the substrate semiconductor layer. Multiple instances of the flash memory device may be arranged as a two-dimensional array of flash memory cells.Type: GrantFiled: October 8, 2021Date of Patent: August 15, 2023Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Yu-Chu Lin, Chia-Ming Pan, Chi-Chung Jen, Wen-Chih Chiang, Keng-Ying Liao, Huai-jen Tung
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Publication number: 20230253433Abstract: A device is disclosed. The device includes a plurality of pixels disposed over a first surface of a semiconductor layer. The device includes a device layer disposed over the first surface. The device includes metallization layers disposed over the device layer. One of the metallization layers, closer to the first surface than any of other ones of the metallization layers, includes at least one conductive structure. The device includes an oxide layer disposed over a second surface of the semiconductor layer, the second surface being opposite to the first surface, the oxide layer also lining a recess that extends through the semiconductor layer. The device includes a spacer layer disposed between inner sidewalls of the recess and the oxide layer. The device includes a pad structure extending through the oxide layer and the device layer to be in physical contact with the at least one conductive structure.Type: ApplicationFiled: April 17, 2023Publication date: August 10, 2023Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Keng-Ying Liao, Yu-Chu Lin, Chih Wei Sung, Shih Sian Wang, Chi-Chung Jen, Yu-chien Ku, Yen-Jou Wu, Huai-jen Tung, Po-Zen Chen
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Publication number: 20230253508Abstract: A flash memory device and method of making the same are disclosed. The flash memory device is located on a substrate and includes a floating gate electrode, a tunnel dielectric layer located between the substrate and the floating gate electrode, a smaller length control gate electrode and a control gate dielectric layer located between the floating gate electrode and the smaller length control gate electrode. The length of a major axis of the smaller length control gate electrode is less than a length of a major axis of the floating gate electrode.Type: ApplicationFiled: April 15, 2023Publication date: August 10, 2023Inventors: Yu-Chu LIN, Chi-Chung JEN, Wen-Chih CHIANG, Yi-Ling LIU, Huai-jen TUNG, Keng-Ying LIAO
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Patent number: 11658248Abstract: A flash memory device and method of making the same are disclosed. The flash memory device is located on a substrate and includes a floating gate electrode, a tunnel dielectric layer located between the substrate and the floating gate electrode, a smaller length control gate electrode and a control gate dielectric layer located between the floating gate electrode and the smaller length control gate electrode. The length of a major axis of the smaller length control gate electrode is less than a length of a major axis of the floating gate electrode.Type: GrantFiled: March 3, 2021Date of Patent: May 23, 2023Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Yu-Chu Lin, Chi-Chung Jen, Yi-Ling Liu, Wen-Chih Chiang, Keng-Ying Liao, Huai-jen Tung
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Patent number: 11652127Abstract: A device is disclosed. The device includes a plurality of pixels disposed over a first surface of a semiconductor layer. The device includes a device layer disposed over the first surface. The device includes metallization layers disposed over the device layer. One of the metallization layers, closer to the first surface than any of other ones of the metallization layers, includes at least one conductive structure. The device includes an oxide layer disposed over a second surface of the semiconductor layer, the second surface being opposite to the first surface, the oxide layer also lining a recess that extends through the semiconductor layer. The device includes a spacer layer disposed between inner sidewalls of the recess and the oxide layer. The device includes a pad structure extending through the oxide layer and the device layer to be in physical contact with the at least one conductive structure.Type: GrantFiled: April 17, 2020Date of Patent: May 16, 2023Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Keng-Ying Liao, Huai-jen Tung, Chih Wei Sung, Po-zen Chen, Yu-chien Ku, Yu-Chu Lin, Chi-Chung Jen, Yen-Jou Wu, S. S. Wang
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Patent number: 11652133Abstract: In a method for forming a semiconductor device photo-sensing regions are formed over a frontside of a substrate. A first layer is formed over a backside of the substrate and is patterned to form a plurality of grid lines. The grid lines can define a plurality of first areas and a plurality of second areas. A second layer may be formed over exposed portions of the backside, the gridlines, the first areas, and the second areas and a third layer may be formed over the second layer. The second and third layer may have different etch rates and the third layer is pattern so as to remove the third layer from over the plurality of first areas.Type: GrantFiled: July 19, 2021Date of Patent: May 16, 2023Assignee: Taiwan Semiconductor Manufacturing CO.Inventors: H. L. Chen, Huai-jen Tung, Keng-Ying Liao, Po-Zen Chen, Su-Yu Yeh, Chih Wei Sung
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Publication number: 20230120006Abstract: A method incudes forming a plurality of photodiodes in a substrate; forming an interconnect structure on a front-side of the substrate; forming a barrier layer on a back-side of the substrate; depositing a metal layer over the barrier layer; forming an adhesion enhancement layer over the metal layer; forming an oxide layer over the adhesion enhancement layer; etching the oxide layer, the adhesion enhancement layer, the metal layer, and the barrier layer to form an oxide grid, an adhesion enhancement grid, a metal grid, and a barrier grid, respectively, wherein the barrier grid and the adhesion enhancement grid have a same chemical element.Type: ApplicationFiled: December 15, 2022Publication date: April 20, 2023Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chin-Yu LIN, Keng-Ying LIAO, Su-Yu YEH, Po-Zen CHEN, Huai-Jen TUNG, Hsien-Li CHEN
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Patent number: 11532658Abstract: An image sensor structure includes a semiconductor device, a plurality of image sensing elements formed in the semiconductor substrate, an interconnect structure formed on the semiconductor substrate, and a composite grid structure over the semiconductor substrate. The composite grid structure includes a tungsten grid, an oxide grid over the tungsten grid, and an adhesion enhancement grid spacing the tungsten grid from the oxide grid.Type: GrantFiled: January 17, 2020Date of Patent: December 20, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chin-Yu Lin, Keng-Ying Liao, Su-Yu Yeh, Po-Zen Chen, Huai-Jen Tung, Hsien-Li Chen