Patents by Inventor Kenichi Date

Kenichi Date has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methacrylic resin composition and molded article
    Patent number: 8969468
    Abstract: The invention is a methacrylic resin composition which includes a methacrylic resin (A) and a saponified polymer (B) that is an alkaline-saponified product of an ethylene-unsaturated carboxylic acid ester copolymer, and the methacrylic resin composition has a concentration of alkali ions of from 0.03 mol/kg to 2.8 mol/kg.
    Type: Grant
    Filed: May 23, 2012
    Date of Patent: March 3, 2015
    Assignee: Du Pont-Mitsui Polychemicals Co., Ltd.
    Inventors: Masataka Aoyama, Toshiyuki Ishii, Youichi Shinya, Kenichi Date
  • METHACRYLIC RESIN COMPOSITION AND MOLDED ARTICLE
    Publication number: 20140100322
    Abstract: The invention is a methacrylic resin composition which includes a methacrylic resin (A) and a saponified polymer (B) that is an alkaline-saponified product of an ethylene-unsaturated carboxylic acid ester copolymer, and the methacrylic resin composition has a concentration of alkali ions of from 0.03 mol/kg to 2.8 mol/kg.
    Type: Application
    Filed: May 23, 2012
    Publication date: April 10, 2014
    Applicant: DU PONT-MITSUI POLYCHEMICALS CO., LTD.
    Inventors: Masataka Aoyama, Toshiyuki Ishii, Youichi Shinya, Kenichi Date
  • SAPONIFIED POLYMER COMPOSITION, POLYMER-TYPE ANTISTATIC AGENT, THERMOPLASTIC STYRENE-BASED RESIN COMPOSITION, FORMED BODIES, AND PROCESS FOR PRODUCTION THEREOF
    Publication number: 20130046047
    Abstract: Disclosed is a saponified polymer-containing composition containing a saponified polymer (A), which is obtained by alkaline saponification of an ethylene-unsaturated carboxylic acid random copolymer, and a dimer acid (B).
    Type: Application
    Filed: April 19, 2011
    Publication date: February 21, 2013
    Applicant: DU PONT-MITSUI POLYCHEMICALS CO., LTD.
    Inventors: Kenichi Date, Yoichi Shinya, Tadashi Kimura
  • STYRENE-BASED RESIN-CONTAINING COMPOSITION AND FORMED ARTICLE
    Publication number: 20110130519
    Abstract: Provided is a styrene-based resin-containing composition including (A) a polymer saponified product which is obtained by saponifying an ethylene-unsaturated carboxylic acid ester copolymer with potassium and has a potassium ion concentration in the range of 0.1 to 5.8 mol/kg, in an amount of 2 parts by mass or more and less than 100 parts by mass, and (B) a styrene-based resin, in an amount of more than 0 parts by mass and 98 parts by mass or less, the composition having a potassium ion concentration of 0.002 to 5.8 mol/kg.
    Type: Application
    Filed: July 31, 2009
    Publication date: June 2, 2011
    Applicant: DU PONT-MITSUI POLYCHEMICALS CO., LTD.
    Inventors: Youichi Shinya, Kenichi Date, Toshiyuki Ishii, Toru Fukada