Abstract: There have been cases where transistors formed using oxide semiconductors are inferior in reliability to transistors formed using amorphous silicon. Thus, in the present invention, a semiconductor device including a highly reliable transistor formed using an oxide semiconductor is manufactured. An oxide semiconductor film is deposited by a sputtering method, using a sputtering target including an oxide semiconductor having crystallinity, and in which the direction of the c-axis of a crystal is parallel to a normal vector of the top surface of the oxide semiconductor. The target is formed by mixing raw materials so that its composition ratio can obtain a crystal structure.

Abstract: According to one embodiment, a display device includes a first substrate having a display area where a plurality of pixels are arranged, a second substrate opposed to the first substrate, a liquid crystal layer arranged between the first substrate and the second substrate, and spacers holding a gap between the first substrate and the second substrate. The spacers are arranged in the display area. The display area includes a first display area including a center of the display area and a second display area around the first display area. An arrangement density of the spacers in the first display area is smaller than an arrangement density of the spacers in the second display area.

Abstract: A fin part (21e) is provided on a side opposite to a wiping surface side of a rubber holder (21) to press a blade rubber (22) toward the wiping surface side by receiving a wind (W) flowing along a moving car, and covering parts (23) protrude from both lengthwise ends of the blade rubber (22) toward the wiping surface side so as to partially cover lateral parts of the blade rubber (22). Owing to the fin part (21e), liftoff of a wiper blade (20) can be prevented. A wind (W) flowing from the front side to the rear side at an end part of a swing center side of the blade rubber (22) can be rectified by the covering part (23), and the wind (W) can flow along the rear side of the wiper blade (20) in the length direction of the wiper blade (20).

Abstract: An interval between an inner face 31c1 of a back wall 31c in a rubber holder 31 and a blade rubber 32 is formed so as to become gradually expanded with respect to an interval between an inner face 31b1 of a front wall 31b and the blade rubber 32 as being directed toward a center portion from both longitudinal-directional end portions of the rubber holder 31. Also, an interval between an inner face of each back wall in a pair of covers coupled to the both longitudinal-directional end portions of the rubber holder 31 and the blade rubber is formed so as to become gradually expanded with respect to an interval between the inner face of the front wall and the blade rubber as being directed toward the center portion from both longitudinal-directional end portions of the cover. Accordingly, a flow of travel wind during a travel of a vehicle is facilitated between the rubber holder 31 and the blade rubber 32 or between the covers and the blade rubber 32.

Abstract: An interval between an inner face 31c1 of a back wall 31c in a rubber holder 31 and a blade rubber 32 is formed so as to become gradually expanded with respect to an interval between an inner face 31b1 of a front wall 31b and the blade rubber 32 as being directed toward a center portion from both longitudinal-directional end portions of the rubber holder 31. Also, an interval between an inner face of each back wall in a pair of covers coupled to the both longitudinal-directional end portions of the rubber holder 31 and the blade rubber is formed so as to become gradually expanded with respect to an interval between the inner face of the front wall and the blade rubber as being directed toward the center portion from both longitudinal-directional end portions of the cover. Accordingly, a flow of travel wind during a travel of a vehicle is facilitated between the rubber holder 31 and the blade rubber 32 or between the covers and the blade rubber 32.

Abstract: A manufacturing apparatus has a reel-out mechanism, a processing mechanism, a label bonding mechanism, a reservoir mechanism, a peeling mechanism, a substrate feed mechanism, an attachment mechanism, and a base peeling mechanism. A cooling mechanism is disposed between the attachment mechanism and the base peeling mechanism, for cooling an attached substrate, the attached substrate being made up of a glass substrate and a photosensitive web attached thereto, from which a protective film has been peeled off, together with a heating mechanism for heating a resin layer, for example a cushion layer, inside the cooled attached substrate to within a predetermined temperature range, which is at or below the glass transition temperature.

Abstract: A manufacturing apparatus (20) has first and second reel-out mechanisms (32a, 32b), first and second processing mechanisms (36a, 36b), first and second label bonding mechanisms (40a, 40b), first and second reservoir mechanisms (42a, 42b), first and second peeling mechanisms (44a, 44b), a substrate feed mechanism (45), an attachment mechanism (46), and a base peeling mechanism (186). A cooling mechanism (122) is disposed between the attachment mechanism (46) and the base peeling mechanism (186), for cooling an attached substrate (24a), the attached substrate (24a) being made up of a glass substrate (24) and a photosensitive web (22) attached thereto, from which a protective film (30) has been peeled off, together with a heating mechanism (182) for heating a resin layer, for example a cushion layer (27), inside the cooled attached substrate (24a) to within a predetermined temperature range, which is at or below the glass transition temperature.

Abstract: A manufacturing apparatus (20) has a reel-out mechanism (32), a processing mechanism (36), a label bonding mechanism (40), a reservoir mechanism (42), a peeling mechanism (44), a substrate feed mechanism (45), and a joining mechanism (46). A detecting mechanism (47) for directly detecting a boundary position of a photosensitive web (22) is disposed upstream of and closely to the joining mechanism (46). Based on detected information from the detecting mechanism (47), a relative position of the boundary position and a substrate (24) in a joining position is adjusted.

Abstract: A manufacturing apparatus has first and second reel-out mechanisms, first and second processing mechanisms, first and second label bonding mechanisms, first and second reservoir mechanisms, first and second peeling mechanisms, a substrate feed mechanism, and a joining mechanism. First and second detecting mechanisms for directly detecting boundary positions of photosensitive webs are disposed upstream of and closely to the joining mechanism. Based on detected information from the first and second detecting mechanisms, relative positions of the boundary positions and a substrate in a joining position and relative positions of the boundary positions themselves are adjusted.

Abstract: A supply unit supplies a film strip from a film roll, and a winding unit cuts off a film strip into a fixed-length film and winds the fixed-length film around a spool to produce a wound-film assembly. An assembling unit introduces the wound-film assembly into a one-open-sided cartridge, and mounts and crimps a cap on the one-open-sided cartridge to produce a wound-film-loaded cartridge. After a pullout resistance of the film and a film length to be exposed are inspected, the wound-film-loaded cartridge is unloaded as a product.

Abstract: A supply unit supplies a film strip from a film roll, and a winding unit cuts off a film strip into a fixed-length film and winds the fixed-length film around a spool to produce a wound-film assembly. An assembling unit introduces the wound-film assembly into a one-open-sided cartridge, and mounts and crimps a cap on the one-open-sided cartridge to produce a wound-film-loaded cartridge. After a pullout resistance of the film and a film length to be exposed are inspected, the wound-film-loaded cartridge is unloaded as a product.