Abstract: An organic film removing method uses an organic film removing apparatus comprising a processing vessel defining a processing chamber, a wafer support for supporting a semiconductor wafer within the processing chamber, and a mixed gas supplier for supplying a mixed gas consisting of an alcohol or alcohols, and ozone gas or an ozone-containing gas into the processing chamber so that the mixed gas acts on an organic film pattern on the surface of the supported semiconductor wafer.

Abstract: An apparatus and method for surface treatment of a substance to be processed, which are capable of decreasing the number of foreign matters holding on the reverse side of the substance more than prior art like apparatus and method without largely decreasing a surface treating speed as compared with that of the prior art, by supplying ozone gas to the surface of the substance mounted on a supporting base. The supporting base has a heating part and a supporting part. There is provided a supporting material on the surface of the supporting part for partly supporting one side of the substance to be processed so that a required amount of gap may be formed between the substance to be processed and the supporting part. In the heating part is built a heater. And for a member constituting the supporting part is used a material having greater emissivity than a member constituting the heating part.

Abstract: In a surface treatment apparatus, an organic substance is removed through ashing by ultraviolet rays and ozone at atmospheric pressure. A transparent partition plate is provided in closely spaced, opposed relation to a material to be treated, and at least one gas outlet is open to that surface of the partition plate opposed to the material to be treated. With this arrangement, the gas can be directly collected via the gas outlet during the treatment, and the end point of the organic substance removal treatment can be detected by analyzing the collected gas.

Abstract: A high pressure discharge lamp in which discharge between a pair of main electrodes in an arc tube of the discharge lamp is sustained by a D.C. or high frequency current. The circuit comprises discharge mode controller for controlling the discharge such that mainly a low-frequency discharge is produced between the main electrodes at least within a predetermined time from initiation of the discharge within the arc tube, and subsequently transferred to the D.C. or high-frequency discharge.

Abstract: Disclosed is an arc discharge lamp starting device which comprises a starting aid circuit connected in parallel to an arc tube and disposed within an outer envelope. This starting aid circuit comprises a thermal switch, a heater and a resistor. This thermal switch includes contact rods having a high melting point and a small work function and a bimetal plate.In this arc discharge lamp starting device, since the time of duration of the chattering phenomenon caused between the contact rods is very long, the arc discharge lamp can be started assuredly by this starting device.