Abstract: A method for manufacturing a forged article, capable of improving the durability of a die for forging is provided. The method, includes forging a steel material, by using a die, by spraying or applying a water-soluble polymer lubricant containing 0.01 to 0.98 mass % of a water-soluble sulfate onto a working surface of the die, the die being made of a raw material having a constituent composition of by mass %, of 0.4 to 0.7% of C, 1.0% or less of Si, 1.0% or less of Mn, 4.0 to 6.0% of Cr, 2.0 to 4.0% of (Mo+½W), 0.5 to 2.5% of (V+Nb), 0 to 1.0% of Ni, 0 to 5.0% of Co, 0.02% or less of N, and a remnant composed of Fe and impurities, and having hardness of 55 to 60 HRC, and the die including a nitrided layer or a nitrosulfidized layer on the working surface thereof.

Abstract: An object is to provide an alloy composition that has a sufficient melting point for casting of an aluminum alloy, also has high hardness, and can suppress an occurrence of galling. The alloy composition of the present invention includes: a Mo—Cr-based dendritic structure 3; and a Ni—Al-based interdendritic structure 5 that fills a periphery of the Mo—Cr-based dendritic structure 3. The alloy composition of the present invention can adopt a chemical composition I in which when Mo+Cr+Ni+Al=100 at. % holds, Ni+Al=15 to 50 at. % and Mo+Cr=50 to 85 at. % hold; or a chemical composition II in which Ni+Al=40 to 70 at. % and Mo+Cr=30 to 60 at. % hold.

Abstract: The present invention relates to photopolymerizable compositions comprising an addition-polymerizable compound which has at least one ethylenically unsaturated double bond; a radical-producing agent and a squarylium compound represented by the formula (I): The compositions are highly sensitive to visible and near infrared lights, particularly He-Ne laser, LED, diode laser, etc. having oscillation wavelengths in a wavelength region of 600 nm or more, and thus are useful as materials for holograms, presensitized plate for laser direct process, dry film resists, digital proofs, photosensitive microcapsules.

Abstract: The present invention relates to photopolymerizable compositions comprising an addition-polymerizable compound which has at least one ethylenically unsaturated double bond; a radical-producing agent and a squarylium compound represented by the formula (I): ##STR1## The compositions are highly sensitive to visible and near infrared lights, particularly He-Ne laser, LED, diode laser, etc. having oscillation wavelengths in a wavelength region of 600 nm or more, and thus are useful as materials for holograms, presentized plates for laser direct process, dry film resists, digital proofs, photosensitive microcapsules.

Abstract: The present invention relates to a photopolymerizable composition comprising squarylium compound represented by the formula (I): ##STR1## wherein R represents lower alkyl having 2 to 8 carbon atoms, a radical generator and an addition-polymerizable compound having at least one ethylenic unsaturated double bond.

Abstract: There is described a chemical amplification resist composition which comprises squarylium compounds represented by the formula (I): ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and represent substituted or unsubstituted aminophenyl, 9-julodidyl, Y.dbd.CH-- (wherein Y represents substituted or unsubstituted heterocyclic group containing nitrogen, or a group: ##STR2## (wherein Z.sup.1 and Z.sup.2 are the same or different and represent substituted or unsubstituted phenyl), photochemical acid generator and binders.

Abstract: A photo polymerization initiator composition is disclosed. The composition is comprised of an organic peroxide and a salt selected from the group consisting of pyrylium salts, thiapyrylium salts and selenopyrylium salts represented by the general formula (I): ##STR1## the substituents are defined within the specification. By utilizing the disclosed photo polymerization initiator composition, it is possible to obtain high sensitivity even in the visible range of light.