Patents by Inventor Kenichi Shiraishi

Kenichi Shiraishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10330735
    Abstract: A state estimation device includes: a current integration unit configured to integrate a current that flows through the energy storage device; and a first estimation unit configured to estimate a full-charge capacity of the energy storage device. The energy storage device has a correlation characteristic of correlation between a residual capacity C and an open voltage V, the correlation characteristic including a constant region in which a time change in the correlation characteristic is relatively smaller than an other region.
    Type: Grant
    Filed: June 10, 2016
    Date of Patent: June 25, 2019
    Assignee: GS YUASA INTERNATIONAL LTD.
    Inventors: Kenichi Sejima, Takeyuki Shiraishi
  • Patent number: 10309763
    Abstract: A rail position measurement device that measures a three-dimensional position of a rail using a measurement vehicle includes: a position posture measurement device to measure a position and a posture of the measurement vehicle; and a laser scanner that is a sensor installed on the measurement vehicle so as to be capable of irradiating at least a web and a bottom of a side surface of the rail with laser light and used for measuring the three-dimensional position of the rail.
    Type: Grant
    Filed: March 11, 2015
    Date of Patent: June 4, 2019
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Hiroyuki Shiraishi, Katsuyuki Kamei, Kenichi Sugo, Mitsunobu Yoshida, Masashi Watanabe
  • Publication number: 20180364597
    Abstract: An exposure apparatus exposes a substrate using exposure light via a liquid. The exposure apparatus comprises a substrate holding part, which releasably holds and is capable of moving a substrate, a management apparatus, which manages a status of usage of a dummy substrate that the substrate holding part is capable of holding.
    Type: Application
    Filed: August 27, 2018
    Publication date: December 20, 2018
    Applicant: NIKON CORPORATION
    Inventors: Natsuko YAMAKAWA, Katsushi NAKANO, Kenichi SHIRAISHI
  • Patent number: 10061214
    Abstract: An exposure apparatus exposes a substrate using exposure light via a liquid. The exposure apparatus comprises a substrate holding part, which releasably holds and is capable of moving a substrate, a management apparatus, which manages a status of usage of a dummy substrate that the substrate holding part is capable of holding.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: August 28, 2018
    Assignee: NIKON CORPORATION
    Inventors: Natsuko Sagawa, Katsushi Nakano, Kenichi Shiraishi
  • Publication number: 20180004096
    Abstract: An exposure apparatus has a stage having a substrate holder and a plate member around the substrate holder to surround a substrate on the substrate holder. A liquid supply mechanism includes a supply port above the stage at a more outward position than an optical path of light from a projection system and supplies liquid onto the stage from the supply port. A liquid recovery mechanism includes a recovery port above the stage at a more outward position than the supply port and recovers the liquid supplied from the supply port. The liquid supply and recovery mechanisms form a liquid immersion region that includes the optical path on part of the stage with the liquid supplied from the supply port. The stage has a passageway below the plate member and recovers the liquid from the liquid immersion region that infiltrates a gap between the plate member and the substrate.
    Type: Application
    Filed: September 13, 2017
    Publication date: January 4, 2018
    Applicant: NIKON CORPORATION
    Inventors: Yasufumi NISHII, Kenichi SHIRAISHI, Hirotaka KOHNO
  • Patent number: 9846371
    Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: December 19, 2017
    Assignee: NIKON CORPORATION
    Inventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
  • Publication number: 20170329234
    Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
    Type: Application
    Filed: July 31, 2017
    Publication date: November 16, 2017
    Applicant: NIKON CORPORATION
    Inventors: Soichi OWA, Nobutaka MAGOME, Shigeru HIRUKAWA, Yoshihiko KUDO, Jiro INOUE, Hiroyuki NAGASAKA, Hirotaka KOHNO, Masahiro NEI, Motokatsu IMAI, Kenichi SHIRAISHI, Yasufumi NISHII, Hiroaki TAKAIWA
  • Patent number: 9798245
    Abstract: A stage apparatus PST is provided with a holder PH, which has a substrate holding surface 33A that holds a substrate P; a stage 52, which supports and moves the holder PH; and a recovery apparatus 60, which is disposed in the vicinity of the holder PH and has lyophilic parts 3, 5 of which at least a part of each is lyophilic, that uses the lyophilic parts 3, 5 to recover a liquid 1. As a result, the infiltration of liquid into the space between the substrate and the holder is prevented, even if performing an exposure treatment by filling the space between a projection optical system and the substrate with the liquid.
    Type: Grant
    Filed: December 8, 2010
    Date of Patent: October 24, 2017
    Assignee: NIKON CORPORATION
    Inventors: Yasufumi Nishii, Kenichi Shiraishi, Hirotaka Kohno
  • Publication number: 20170235238
    Abstract: An exposure apparatus is capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus, which forms a liquid immersion area of a liquid on an image surface side of a projection optical system, and exposes a substrate via the projection optical system and the liquid of the immersion area, includes a measuring device which measures at least one of a property and composition of the liquid for forming the liquid immersion area. The measuring device includes a resistivity meter to obtain information on a specific resistance value of the immersion liquid.
    Type: Application
    Filed: May 3, 2017
    Publication date: August 17, 2017
    Applicant: NIKON CORPORATION
    Inventor: Kenichi SHIRAISHI
  • Patent number: 9645505
    Abstract: An exposure apparatus is capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus, which forms a liquid immersion area of a liquid on an image surface side of a projection optical system, and exposes a substrate via the projection optical system and the liquid of the immersion area, includes a measuring device which measures at least one of a property and composition of the liquid for forming the liquid immersion area.
    Type: Grant
    Filed: July 25, 2013
    Date of Patent: May 9, 2017
    Assignee: NIKON CORPORATION
    Inventor: Kenichi Shiraishi
  • Patent number: 9618854
    Abstract: A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.
    Type: Grant
    Filed: May 3, 2016
    Date of Patent: April 11, 2017
    Assignee: NIKON CORPORATION
    Inventors: Kenichi Shiraishi, Ryuichi Hoshika, Tomoharu Fujiwara
  • Publication number: 20160246184
    Abstract: A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.
    Type: Application
    Filed: May 3, 2016
    Publication date: August 25, 2016
    Applicant: NIKON CORPORATION
    Inventors: Kenichi SHIRAISHI, Ryuichi HOSHIKA, Tomoharu FUJIWARA
  • Patent number: 9335639
    Abstract: A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.
    Type: Grant
    Filed: October 12, 2011
    Date of Patent: May 10, 2016
    Assignee: NIKON CORPORATION
    Inventors: Kenichi Shiraishi, Ryuichi Hoshika, Tomoharu Fujiwara
  • Patent number: 9268237
    Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
    Type: Grant
    Filed: January 30, 2013
    Date of Patent: February 23, 2016
    Assignee: NIKON CORPORATION
    Inventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
  • Patent number: 9235139
    Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
    Type: Grant
    Filed: January 30, 2013
    Date of Patent: January 12, 2016
    Assignee: NIKON CORPORATION
    Inventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
  • Publication number: 20150301457
    Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
    Type: Application
    Filed: April 27, 2015
    Publication date: October 22, 2015
    Applicant: Nikon Corporation
    Inventors: Soichi OWA, Nobutaka MAGOME, Shigeru HIRUKAWA, Yoshihiko KUDO, Jiro INOUE, Hirotaka KOHNO, Masahiro NEI, Motokatsu IMAI, Hiroyuki NAGASAKA, Kenichi SHIRAISHI, Yasufumi NISHII, Hiroaki TAKAIWA
  • Patent number: 9140462
    Abstract: A charged particle emission and air-blowing device includes a communication port biased toward an end portion in a predetermined direction with respect to an air outlet, and a width expander configured to widen a flow path between an air directing plate of the end portion and a second blowing duct wider than a periphery. Emitted light from a light guide plate is reflected by the air directing plate in the delivery direction of an air flow. An air flow passes from a downward direction to an upward direction along a circuit board in an auxiliary suction path, and an opening portion faces the upper portion of the circuit board.
    Type: Grant
    Filed: May 23, 2013
    Date of Patent: September 22, 2015
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Takahiro Hanai, Kenichi Shiraishi, Nobuhiro Iwaki
  • Patent number: 9019467
    Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
    Type: Grant
    Filed: January 30, 2013
    Date of Patent: April 28, 2015
    Assignee: Nikon Corporation
    Inventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
  • Publication number: 20150108364
    Abstract: A charged particle emission and air-blowing device includes a communication port biased toward an end portion in a predetermined direction with respect to an air outlet, and a width expander configured to widen a flow path between an air directing plate of the end portion and a second blowing duct wider than a periphery. Emitted light from a light guide plate is reflected by the air directing plate in the delivery direction of an air flow. An air flow passes from a downward direction to an upward direction along a circuit board in an auxiliary suction path, and an opening portion faces the upper portion of the circuit board.
    Type: Application
    Filed: May 23, 2013
    Publication date: April 23, 2015
    Inventors: Takahiro Hanai, Kenichi Shiraishi, Nobuhiro Iwaki
  • Publication number: 20150041675
    Abstract: An inlet port 4 and an outlet port 5 which are open in a body housing 2, an air-blowing pathway 20 disposed inside the body housing 2, making the inlet port 4 and the outlet port 5 communicate with each other, and also having a plurality of divisional pathways 22 obtained by division with partition plates 21, an air-blowing fan 7 disposed upstream from the divisional pathways 22 inside the air-blowing pathway 20, a removable inner cover 10 covering the divisional pathways 22 and having an inner surface which forms a side wall of the air-blowing pathway 20, and a removable exterior cover 9 covering the inner cover 10 to form an outer surface of the body housing 2 are provided, and the inner cover 10 has marking portions 11 formed on an outer surface along the partition plates 21.
    Type: Application
    Filed: April 2, 2013
    Publication date: February 12, 2015
    Inventors: Masaki Shibata, Kenichi Shiraishi, Nobuhiro Iwaki