Patents by Inventor Kenichi Takeyama

Kenichi Takeyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5275750
    Abstract: A method of manufacturing a solid polymer electrolyte which comprises polymerizing an ester polymethoxyoxyalkylene, a diester polyoxyalkylene, an oxycompound having a double bond, and an inorganic salt, and the solid polymer electrolyte thus obtained. The electrolyte is suitable for application in electrochemical devices such as primary or secondary battery, condenser or electrochromic display.
    Type: Grant
    Filed: July 20, 1992
    Date of Patent: January 4, 1994
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yoshiko Sato, Hiroshi Uemachi, Teruhisa Kanbara, Tadashi Sotomura, Kenichi Takeyama
  • Patent number: 4745042
    Abstract: This invention relates to a composition of a water-soluble photopolymer which is synthesized from a water-soluble organic matter, which matter is a base polymer produced and refined particularly by bacterial culture biotechnically and contains at least one of polysaccharides, protein, gelatin, casein, polyvinyl pyrrolidone and polyvinyl alcohol, in particular pullulan which is a natural polysaccharide, and chemicals to add functions to aqueous solution of the base polymer, for example, water-soluble radiation sensitive chemical, crosslinking agent, catalyst, epoxy compound, and a compound possessing bleaching or fading action with respect to radiation.The water-soluble photopolymer can be developed in water, and is high in safety and small in aging, and is expected to be used as the material of single-layer resist or multi-layer resist of high resolution and high resistance, or as the material for contrast enhanced litography.
    Type: Grant
    Filed: April 17, 1985
    Date of Patent: May 17, 1988
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Masaru Sasago, Masayuki Endo, Kenichi Takeyama, Noboru Nomura
  • Patent number: 4346163
    Abstract: 1. A resist for use in forming a positive pattern with a radiation comprising a copolymer composed of methyl methacrylate and methacrylic acid and a cross-linking agent having the following general formula: ##STR1## wherein R is H or CH.sub.3, x is an integer of 1 to 9, and y and z are zero, or an integer of 1 to 3.2. A process for forming a positive pattern on a substrate with a radiation.
    Type: Grant
    Filed: September 22, 1980
    Date of Patent: August 24, 1982
    Assignee: Matsushita Electric Industrial Co. Ltd.
    Inventors: Kenichi Takeyama, Takayoshi Morimoto, Kunio Hibino