Abstract: According to one embodiment, a recipe management apparatus for comparing recipes prescribing process conditions of processing apparatuses between a plurality of the processing apparatuses having the same type. The recipe management apparatus includes a recipe reading unit, a mask unit, and a determination unit. The recipe reading unit is configured to read binary-format recipes of the plurality of processing apparatuses. The mask unit is configured to apply masks to data of the recipes based on mask position information prescribing positions which are applied with the masks in binary-format data of the recipes. The determination unit is configured to compare the plurality of recipes applied with the masks, and configured to determine whether there is a difference.

Abstract: According to one embodiment, a control method for an exposure apparatus is disclosed. The method can include retrieving, from a database, a correction amount of alignment correction at a time of exposure of a wafer and an inclination amount of a wafer stage with respect to an optical axis of an exposure optical system at the time of exposure. The method can include making a determination on the inclination amount based on a predetermined condition. The method can include making a determination on the correction amount based on the predetermined condition. In addition, the method can include issuing an alarm when the inclination amount and the correction amount both satisfy the condition.

Abstract: According to one embodiment, there is provided a recipe management apparatus for comparing recipes prescribing process conditions of processing apparatuses between a plurality of the processing apparatuses having the same type. The recipe management apparatus includes a recipe reading unit, a mask unit, and a determination unit. The recipe reading unit is configured to read binary-format recipes of the plurality of processing apparatuses. The mask unit is configured to apply masks to data of the recipes based on mask position information prescribing positions which are applied with the masks in binary-format data of the recipes. The determination unit is configured to compare the plurality of recipes applied with the masks, and configured to determine whether there is a difference.

Abstract: According to one embodiment, a control method for an exposure apparatus is disclosed. The method can include retrieving, from a database, a correction amount of alignment correction at a time of exposure of a wafer and an inclination amount of a wafer stage with respect to an optical axis of an exposure optical system at the time of exposure. The method can include making a determination on the inclination amount based on a predetermined condition. The method can include making a determination on the correction amount based on the predetermined condition. In addition, the method can include issuing an alarm when the inclination amount and the correction amount both satisfy the condition.